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    • 96. 发明申请
    • Novel hard bias design for extra high density recording
    • 用于超高密度记录的新型硬偏置设计
    • US20050275975A1
    • 2005-12-15
    • US10868716
    • 2004-06-15
    • Kunliang ZhangYun-Fei LiChyu-Jiuh TorngChen-Jung Chien
    • Kunliang ZhangYun-Fei LiChyu-Jiuh TorngChen-Jung Chien
    • G11B5/127G11B5/33G11B5/39
    • B82Y25/00B82Y10/00G11B5/3912G11B5/3932G11B2005/3996
    • A hard bias structure for biasing a free layer in a MR element within a read head is comprised of a composite hard bias layer having a Co78.6Cr5.2Pt16.2/Co65Cr15Pt20 configuration. The upper Co65Cr15Pt20 layer has a larger Hc value and a thickness about 2 to 10 times greater than that of the Co78.6Cr5.2Pt16.2 layer. The hard bias structure may also include a BCC underlayer such as FeCoMo which enhances the magnetic moment of the hard bias structure. Optionally, the thickness of the Co78.6Cr5.2Pt16.2 layer is zero and the Co65Cr15Pt20 layer is formed on the BCC underlayer. The present invention also encompasses a laminated hard bias structure. The Mrt value for the hard bias structure may be optimized by adjusting the thicknesses of the BCC underlayer and CoCrPt layers. As a result, a larger process window is realized and lower asymmetry output during a read operation is achieved.
    • 用于偏置读取头内的MR元件中的自由层的硬偏置结构包括具有Co ++ 78.6Cr 5.2 Pt 16.2的复合硬偏置层 另一方面,本发明的另一个目的是提供一种用于制造高分子材料的方法。 上部Co 65 N 15 15 Pt 20 O层具有较大的Hc值,并且厚度比Co < 丙烯酸甲酯,丙烯酸甲酯,丙烯酸丁酯,丙烯酸乙酯 硬偏压结构还可以包括诸如FeCoMo的BCC底层,其增强了硬偏压结构的磁矩。 任选地,Co ++ C 26.6 Cr 2 Pt 16.2层的厚度为零,并且Co 65 在BCC底层上形成> 15 20 层。 本发明还包括层压硬偏置结构。 可以通过调整BCC底层和CoCrPt层的厚度来优化硬偏置结构的Mrt值。 结果,实现了更大的处理窗口,并且在读取操作期间实现了较低的不对称输出。
    • 97. 发明授权
    • Narrow track stitched GMR head
    • 窄轨缝合GMR头
    • US06416677B1
    • 2002-07-09
    • US09585785
    • 2000-06-05
    • Hsiang-Yi WeiYi-Ting YaoEiki NarumiChyu-Jiuh TorngCherng-Chyi Han
    • Hsiang-Yi WeiYi-Ting YaoEiki NarumiChyu-Jiuh TorngCherng-Chyi Han
    • B44C122
    • G11B5/37
    • As the read capabilities of magnetic disk systems improve due to advanced GMR heads, it becomes necessary to correspondingly reduce the area of recorded data. This requires a narrowing of the stitched sub-pole at the write gap. This has proved difficult for pole widths less than about 0.4 microns because of problems in filling the mold. In the present invention this is overcome by introducing a layer of PMGI (polydimethylglutarimide) between the planarized positive photoresist layer that comprises the mold and the non-magnetic write gap layer on which the mold rests. This greatly facilitates formation of a high aspect ratio hole with a clean flat bottom and essentially vertical sides as well as the subsequent removal of the photoresist after said hole has been filled through electroplating to form a stitched sub-pole.
    • 由于高级GMR磁头的磁盘系统的读取能力得到改善,所以有必要相应地减少记录数据的面积。 这需要在写入间隙处的缝合子极的变窄。 由于填充模具的问题,对于小于约0.4微米的极宽度来说,这已被证明是困难的。 在本发明中,通过在包括模具的平坦化正性光致抗蚀剂层和模具所在的非磁性写入间隙层之间引入一层PMGI(聚二甲基戊二酰亚胺)来克服这一点。 这大大有利于形成具有干净的平坦底部和基本上垂直的侧面的高纵横比孔,以及随后在通过电镀填充所述孔以形成缝合的子极之后去除光致抗蚀剂。
    • 98. 发明授权
    • High performance MTJ elements for STT-RAM and method for making the same
    • 用于STT-RAM的高性能MTJ元件和制作相同的方法
    • US08436437B2
    • 2013-05-07
    • US12803191
    • 2010-06-21
    • Cheng T. HorngRu-Ying TongChyu-Jiuh TorngWitold Kula
    • Cheng T. HorngRu-Ying TongChyu-Jiuh TorngWitold Kula
    • H01L29/82
    • H01L43/08B82Y25/00B82Y40/00G11C11/161H01F10/3272H01F10/329H01F10/3295H01F41/307H01L43/10H01L43/12
    • A STT-MTJ MRAM cell that utilizes transfer of spin angular momentum as a mechanism for changing the magnetic moment direction of a free layer includes an IrMn pinning layer, a SyAP pinned layer, a naturally oxidized, crystalline MgO tunneling barrier layer that is formed on an Ar-ion plasma smoothed surface of the pinned layer and a free layer that comprises an amorphous layer of Co60Fe20B20 of approximately 20 angstroms thickness or an amorphous ferromagnetic layer of Co40Fe40B20 of approximately 15 angstroms thickness formed between two crystalline layers of Fe of 3 and 6 angstroms thickness respectively. The free layer is characterized by a low Gilbert damping factor and by very strong polarizing action on conduction electrons. The resulting cell has a low critical current, a high dR/R and a plurality of such cells will exhibit a low variation of both resistance and pinned layer magnetization angular dispersion.
    • 利用自旋角度动量的转移作为改变自由层的磁矩方向的机构的STT-MTJ MRAM单元包括IrMn钉扎层,SyAP钉扎层,自然氧化的结晶的MgO隧穿势垒层,其形成于 被钉扎层的Ar离子等离子体平滑表面和包含大约20埃厚度的Co60Fe20B20的非晶层的自由层或者在3和6的Fe的两个结晶层之间形成约15埃厚度的Co40Fe40B20的非晶铁磁层 埃厚度。 自由层的特征在于低吉尔伯特阻尼因子和对传导电子的非常强的偏振作用。 所得到的电池具有低临界电流,高dR / R,并且多个这样的电池将呈现电阻和钉扎层磁化角分散的低变化。