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91. 发明申请

US20080302303A1 METHODS AND APPARATUS FOR DEPOSITING A UNIFORM SILICON FILM WITH FLOW GRADIENT DESIGNS 审中-公开
标题翻译：用流平面设计沉积均匀硅膜的方法和装置
公开(公告)号：US20080302303A1
公开(公告)日：2008-12-11
申请号：US11759599
申请日：2007-06-07
申请人： Soo Young Choi , Tae Kyung Won , John M. White
发明人： Soo Young Choi , Tae Kyung Won , John M. White
IPC分类号： C23C16/00 , B05B1/14
CPC分类号： C23C16/24 , C23C16/45565 , C23C16/5096 , H01J37/32449
摘要： Methods and apparatus having a flow gradient created from a gas distribution plate are provided. In one embodiment, the method and apparatus are particularly useful for, but not limited to, depositing a silicon film for solar cell applications. The apparatus for depositing a uniform film for solar cell applications includes a processing chamber, and a quadrilateral gas distribution plate disposed in the processing chamber and having at least four corners separated by four sides. The gas distribution plate further includes a first plurality of chokes formed through the gas distribution plate, the first plurality of chokes located in the corners, and a second plurality of chokes formed through the gas distribution plate, the second plurality of chokes located along the sides of the gas distribution plate between the corner regions, wherein the first plurality of chokes have a greater flow resistance than that of the second plurality of chokes.
摘要翻译：提供了具有由气体分配板产生的流动梯度的方法和装置。在一个实施例中，该方法和装置特别适用于但不限于沉积太阳能电池应用的硅膜。用于沉积用于太阳能电池应用的均匀膜的设备包括处理室和设置在处理室中的四边形气体分配板，并且具有由四个侧面分开的至少四个角。气体分配板还包括通过气体分配板形成的第一多个扼流圈，位于角部的第一多个扼流圈，以及通过气体分配板形成的第二多个扼流圈，沿着侧面设置的第二多个扼流圈在所述角区域之间的所述气体分配板中，所述第一多个扼流器具有比所述第二多个扼流圈更大的流动阻力。

92. 发明申请

US20080289686A1 METHOD AND APPARATUS FOR DEPOSITING A SILICON LAYER ON A TRANSMITTING CONDUCTIVE OXIDE LAYER SUITABLE FOR USE IN SOLAR CELL APPLICATIONS 审中-公开
标题翻译：用于在太阳能电池应用中使用的发射导电氧化物层上的硅层沉积的方法和装置
公开(公告)号：US20080289686A1
公开(公告)日：2008-11-27
申请号：US11752794
申请日：2007-05-23
申请人： TAE KYUNG WON , Soo Young Choi , Yong Kee Chae , Liwei Li , Shuran Sheng
发明人： TAE KYUNG WON , Soo Young Choi , Yong Kee Chae , Liwei Li , Shuran Sheng
IPC分类号： H01L31/04 , C23C16/00
CPC分类号： H01L31/1884 , H01L31/022466 , H01L31/04 , Y02E10/50
摘要： Methods and apparatus for reducing defects on transmitting conducting oxide (TCO) layer are provided. In one embodiment, a method for depositing a silicon layer on a transmitting conducting oxide (TCO) layer may include providing a substrate having a TCO layer disposed thereon, wherein the TCO layer has a peripheral region and a cell integrated region, the cell integrated region having laser scribing patterns disposed thereon, positioning the substrate on a substrate support assembly disposed in a processing chamber, wherein the substrate support assembly has a roughened surface in contact with the substrate, contacting a shadow frame to the peripheral region of the TCO layer and to the substrate support assembly thereby creating an electrical ground path between the TCO layer and substrate support through the shadow frame, and depositing a silicon containing layer on the TCO layer through an aperture of the shadow frame.
摘要翻译：提供了减少传导导电氧化物（TCO）层缺陷的方法和装置。在一个实施例中，用于在透射导电氧化物（TCO）层上沉积硅层的方法可以包括提供其上设置有TCO层的衬底，其中TCO层具有外围区域和电池集成区域，电池集成区域其具有设置在其上的激光划线图案，将所述基板定位在设置在处理室中的基板支撑组件上，其中所述基板支撑组件具有与所述基板接触的粗糙表面，将阴影框架接触所述TCO层的周边区域，衬底支撑组件，从而通过阴影框架在TCO层和衬底支撑件之间形成电接地路径，并且通过阴影框架的孔口在TCO层上沉积含硅层。

93. 发明申请

US20080280830A1 FUSION PROTEIN COMPRISING FK506 BINDING PROTEIN AND METHOD OF MAKING AND USING THE SAME 有权
标题翻译：包含FK506结合蛋白的融合蛋白及其制备和使用方法
公开(公告)号：US20080280830A1
公开(公告)日：2008-11-13
申请号：US12144890
申请日：2008-06-24
申请人： Soo Young Choi , Jinseu Park , Won Sik Eum , Dae-Won Kim , Jin-Hee Choi , Tae-Yoon Kim , Hyung-Joo Kwon
发明人： Soo Young Choi , Jinseu Park , Won Sik Eum , Dae-Won Kim , Jin-Hee Choi , Tae-Yoon Kim , Hyung-Joo Kwon
IPC分类号： A61K8/64 , C07K14/00 , C07H21/00 , C12N15/63 , A61Q19/00
CPC分类号： C12N9/90 , C07K2319/01
摘要： Disclosed is a fusion protein containing a FK506 binding protein and a cell-transducing domain. Also, disclosed is a method of making the fusion protein and use of the fusion protein in a pharmaceutical or cosmetic composition. The cell-transducing domain is, for example, a PEP-1.
摘要翻译：披露了含有FK506结合蛋白和细胞转导结构域的融合蛋白。此外，还公开了在药物或化妆品组合物中制备融合蛋白并使用融合蛋白的方法。细胞转导结构域是例如PEP-1。

94. 发明申请

US20080118663A1 CONTAMINATION REDUCING LINER FOR INDUCTIVELY COUPLED CHAMBER 审中-公开
标题翻译：污染减少衬板用于电感耦合室
公开(公告)号：US20080118663A1
公开(公告)日：2008-05-22
申请号：US11866490
申请日：2007-10-03
申请人： Soo Young Choi , Qunhua Wang
发明人： Soo Young Choi , Qunhua Wang
IPC分类号： C23C16/00
CPC分类号： C23C16/4404
摘要： A method and apparatus for depositing a film through a plasma enhance chemical vapor deposition process is provided. In one embodiment, an apparatus includes a processing chamber having a coil disposed in the chamber and routed proximate the chamber wall. A liner is disposed over the coil and is protected by a coating of a material, wherein the coating of material has a film property similar to the liner. In one embodiment, the liner is a silicon containing material and is protected by the coating of the material. Thus, in the event that some of the protective coating of material is inadvertently sputtered, the sputter material is not a source of contamination if deposited on the substrate along with the deposited deposition film on the substrate.
摘要翻译：提供了一种通过等离子体沉积膜的方法和装置，提高了化学气相沉积工艺。在一个实施例中，一种设备包括处理室，其具有设置在室中的线圈并且靠近室壁布置。衬套设置在线圈上方并被材料涂层保护，其中材料涂层具有类似于衬垫的膜性质。在一个实施例中，衬垫是含硅材料，并且被材料的涂层保护。因此，在材料的一些保护涂层被无意中溅射的情况下，如果沉积在衬底上并且沉积在衬底上的沉积膜，则溅射材料不是污染源。

95. 发明申请

US20070221128A1 Method and apparatus for improving uniformity of large-area substrates 审中-公开
标题翻译：改善大面积基板均匀性的方法和装置
公开(公告)号：US20070221128A1
公开(公告)日：2007-09-27
申请号：US11389603
申请日：2006-03-23
申请人： Soo Young Choi , John M. White
发明人： Soo Young Choi , John M. White
IPC分类号： C23C16/00
CPC分类号： C23C16/45565 , C23C16/345 , C23C16/5096 , C23C16/52
摘要： Embodiments of the present invention generally provide methods and apparatus for improving the uniformity of a film deposited on a large-area substrate, particularly for films deposited in a PECVD system. In one embodiment, a plasma-processing chamber is configured to be asymmetrical relative to a substrate in order to compensate for plasma density non-uniformities in the chamber caused by unwanted magnetic fields. In another embodiment, a plasma-processing chamber is adapted to create a neutral current bypass path that reduces electric current flow through a magnetic field-generating feature in the chamber. In another embodiment, a method is provided for depositing a uniform film on a large-area substrate in a plasma-processing chamber. The chamber is made electrically symmetric during processing by creating a neutral current bypass path, wherein the neutral current bypass path substantially reduces neutral current flow through a magnetic field-generating feature in the chamber.
摘要翻译：本发明的实施例通常提供了用于改善沉积在大面积基板上的膜的均匀性的方法和装置，特别是用于沉积在PECVD系统中的薄膜。在一个实施例中，等离子体处理室被配置为相对于衬底是不对称的，以便补偿由不想要的磁场引起的腔室中的等离子体密度不均匀性。在另一个实施例中，等离子体处理室适于产生中性电流旁路路径，其减小通过腔室中的磁场产生特征的电流。在另一个实施例中，提供了一种用于在等离子体处理室中的大面积衬底上沉积均匀膜的方法。通过产生中性电流旁路路径，室在处理期间被电对称，其中中性线旁路通过基本上减少通过腔室中的磁场产生特征的中性点电流。

96. 发明授权

US09293706B2 Method for encapsulating an organic light emitting diode 有权
标题翻译：封装有机发光二极管的方法
公开(公告)号：US09293706B2
公开(公告)日：2016-03-22
申请号：US13366109
申请日：2012-02-03
申请人： Dieter Haas , John M. White , Byung-sung Leo Kwak , Soo Young Choi , Jrjyan Jerry Chen , Jose Manuel Dieguez-Campo
发明人： Dieter Haas , John M. White , Byung-sung Leo Kwak , Soo Young Choi , Jrjyan Jerry Chen , Jose Manuel Dieguez-Campo
IPC分类号： H01L33/52 , H01L51/00 , H01L51/52
CPC分类号： H01L51/0014 , H01L51/5253
摘要： Methods for encapsulating OLED structures disposed on a substrate using a soft/polymer mask technique are provided. The soft/polymer mask technique can efficiently provide a simple and low cost OLED encapsulation method, as compared to convention hard mask patterning techniques. The soft/polymer mask technique can utilize a single polymer mask to complete the entire encapsulation process with low cost and without alignment issues present when using conventional metal masks. Rather than utilizing a soft/polymer mask, the encapsulation layers may be blanked deposited and then laser ablated such that no masks are utilized during the encapsulation process.
摘要翻译：提供了使用软/聚合物掩模技术封装设置在基板上的OLED结构的方法。与常规的硬掩模图案化技术相比，软/聚合物掩模技术可以有效地提供简单且低成本的OLED封装方法。软/聚合物掩模技术可以利用单个聚合物掩模以低成本完成整个封装工艺，并且在使用常规金属掩模时不存在对准问题。不是使用软/聚合物掩模，而是可以将封装层消隐沉积，然后激光烧蚀，使得在封装过程中不使用掩模。

97. 发明授权

US08883269B2 Thin film deposition using microwave plasma 有权
标题翻译：使用微波等离子体的薄膜沉积
公开(公告)号：US08883269B2
公开(公告)日：2014-11-11
申请号：US13331021
申请日：2011-12-20
申请人： Tae Kyung Won , Helinda Nominanda , Seon-Mee Cho , Soo Young Choi , Beom Soo Park , John M. White , Suhail Anwar , Jozef Kudela
发明人： Tae Kyung Won , Helinda Nominanda , Seon-Mee Cho , Soo Young Choi , Beom Soo Park , John M. White , Suhail Anwar , Jozef Kudela
IPC分类号： H05H1/30 , C23C16/34 , C23C16/455 , C23C16/511 , C23C16/54 , H01J37/32
CPC分类号： C23C16/345 , C23C16/45578 , C23C16/511 , C23C16/545 , H01J37/32192 , H01J37/3222 , H01J37/3244
摘要： A method of processing a substrate in a processing chamber is provided. The method generally includes applying a microwave power to an antenna coupled to a microwave source disposed within the processing chamber, wherein the microwave source is disposed relatively above a gas feeding source configured to provide a gas distribution coverage covering substantially an entire surface of the substrate, and exposing the substrate to a microwave plasma generated from a processing gas provided by the gas feeding source to deposit a silicon-containing layer on the substrate at a temperature lower than about 200 degrees Celsius, the microwave plasma using a microwave power having a power density of about 500 milliWatts/cm2 to about 5,000 milliWatts/cm2 at a frequency of about 1 GHz to about 10 GHz.
摘要翻译：提供了一种在处理室中处理衬底的方法。该方法通常包括对耦合到设置在处理室内的微波源的天线施加微波功率，其中微波源设置在气体馈送源的相对上方，该气体馈送源被配置成提供覆盖基板整个表面的气体分布覆盖，以及将所述衬底暴露于由所述气体供给源提供的处理气体产生的微波等离子体，以在低于约200摄氏度的温度下在所述衬底上沉积含硅层，所述微波等离子体使用具有功率密度在约1GHz至约10GHz的频率下为约500毫瓦/厘米2至约5,000毫瓦/厘米2。

98. 发明授权

US08853098B2 Substrate support with gas introduction openings 有权
标题翻译：衬底支撑与气体导入孔
公开(公告)号：US08853098B2
公开(公告)日：2014-10-07
申请号：US13401755
申请日：2012-02-21
申请人： Sam H. Kim , John M. White , Soo Young Choi , Carl A. Sorensen , Robin L. Tiner , Beom Soo Park
发明人： Sam H. Kim , John M. White , Soo Young Choi , Carl A. Sorensen , Robin L. Tiner , Beom Soo Park
IPC分类号： H01L21/00 , H01L21/44 , H01L21/31 , H01L21/469 , H01L21/687 , H01L21/683
CPC分类号： H01L21/68742 , H01L21/6831
摘要： Embodiments disclosed herein generally relate to an apparatus and a method for placing a substrate substantially flush against a substrate support in a processing chamber. When a large area substrate is placed onto a substrate support, the substrate may not be perfectly flush against the substrate support due to gas pockets that may be present between the substrate and the substrate support. The gas pockets can lead to uneven deposition on the substrate. Therefore, pulling the gas from between the substrate and the support may pull the substrate substantially flush against the support. During deposition, an electrostatic charge can build up and cause the substrate to stick to the substrate support. By introducing a gas between the substrate and the substrate support, the electrostatic forces may be overcome so that the substrate can be separated from the susceptor with less or no plasma support which takes extra time and gas.
摘要翻译：本文公开的实施例通常涉及用于将衬底基本上与衬底支撑件齐平地放置在处理室中的装置和方法。当将大面积基板放置在基板支撑件上时，由于可能存在于基板和基板支撑件之间的气体袋，基板可能不能完全与基板支撑件齐平。气袋可导致基板上的不均匀沉积。因此，从衬底和支撑件之间拉动气体可以将衬底基本上与支撑件齐平。在沉积期间，静电电荷可能积聚并使衬底粘附到衬底支撑件上。通过在衬底和衬底支撑件之间引入气体，可以克服静电力，使得衬底可以用较少或不需要额外时间和气体的等离子体支架与基座分离。

99. 发明授权

US08609098B2 Composition for repression of hyperlipidemia and obesity through suppression of intestinal cholesterol absorption 有权
标题翻译：通过抑制肠胆固醇吸收抑制高脂血症和肥胖的组合物
公开(公告)号：US08609098B2
公开(公告)日：2013-12-17
申请号：US13579810
申请日：2011-04-25
申请人： Sang Ho Jang , Soo Young Choi , Yeom Pyo Lee , Jae Jin An , Hong Gul Cheong , Hyuck Se Kwon , Jeong Keum Park , Doo Yeon Baek
发明人： Sang Ho Jang , Soo Young Choi , Yeom Pyo Lee , Jae Jin An , Hong Gul Cheong , Hyuck Se Kwon , Jeong Keum Park , Doo Yeon Baek
IPC分类号： A61K39/00
CPC分类号： C07K16/18 , C07K2317/11 , C07K2317/23 , C07K2317/76
摘要： Disclosed are a composition for inhibiting hyperlipidemia and obesity through suppression of intestinal cholesterol absorption. An IgY-type antibody derived from yolk to NPC1L1 (Niemann-Pick C1-Like1), contained, as an active ingredient, in the composition of the present invention is linked to NPC1L1 (Niemann-Pick C1-Like1) that is a cholesterol transport protein in the intestines, thus interfering with binding between cholesterol and the transport protein to completely block absorption of cholesterol in the body and thereby prevent hyperlipidemia and obesity.
摘要翻译：公开了通过抑制肠胆固醇吸收来抑制高脂血症和肥胖的组合物。在本发明的组合物中含有作为活性成分的NPC1L1（Niemann-Pick C1-Like1）的蛋黄的IgY型抗体与作为胆固醇转运体的NPC1L1（Niemann-Pick C1-Like1）连接蛋白质，从而干扰胆固醇与运输蛋白之间的结合，以完全阻断体内胆固醇的吸收，从而防止高脂血症和肥胖。

100. 发明申请

US20130263782A1 FLIP EDGE SHADOW FRAME 审中-公开
标题翻译：卷边边框
公开(公告)号：US20130263782A1
公开(公告)日：2013-10-10
申请号：US13569064
申请日：2012-08-07
申请人： QUNHUA WANG , Soo Young Choi , Robin L. Tiner , John M. White , Gaku Furuta , Beom Soo Park
发明人： QUNHUA WANG , Soo Young Choi , Robin L. Tiner , John M. White , Gaku Furuta , Beom Soo Park
IPC分类号： C23C16/04
摘要： Device for processing a substrate are described herein. An apparatus for controlling deposition on a substrate can include a chamber comprising a shadow frame support, a substrate support comprising a substrate supporting surface, a shadow frame with a shadow frame body including a first support surface, a second support surface opposite the first surface, and a detachable lip connected with the shadow frame body. The detachable lip can include a support connection, a first lip surface facing the substrate, a second lip surface opposite the first lip surface, a first edge positioned over the first support surface, and a second edge opposite the first edge to contact the substrate.
摘要翻译：本文描述了用于处理衬底的装置。用于控制基板上的沉积的装置可以包括：腔室，其包括阴影框架支撑件，包括基板支撑表面的基板支撑件，具有包括第一支撑表面的阴影框架主体的阴影框架，与第一表面相对的第二支撑表面，以及与阴影框体连接的可拆卸唇缘。可拆卸唇缘可以包括支撑连接，面向基底的第一唇缘表面，与第一唇缘表面相对的第二唇缘表面，位于第一支撑表面上方的第一边缘以及与第一边缘相对的第二边缘以接触基底。

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