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91. 发明授权

US07596164B2 Control system for a two chamber gas discharge laser 有权
标题翻译：双室气体放电激光器控制系统
公开(公告)号：US07596164B2
公开(公告)日：2009-09-29
申请号：US11376364
申请日：2006-03-15
申请人： John P. Fallon , John A. Rule , Robert N. Jacques , Jacob P. Lipcon , William N. Partlo , Alexander I. Ershov , Toshihiko Ishihara , John Meisner , Richard M. Ness , Paul C. Melcher
发明人： John P. Fallon , John A. Rule , Robert N. Jacques , Jacob P. Lipcon , William N. Partlo , Alexander I. Ershov , Toshihiko Ishihara , John Meisner , Richard M. Ness , Paul C. Melcher
IPC分类号： H01S3/223
CPC分类号： H01S3/097 , H01S3/0057 , H01S3/08004 , H01S3/08009 , H01S3/08031 , H01S3/09702 , H01S3/0971 , H01S3/0975 , H01S3/10038 , H01S3/1055 , H01S3/225 , H01S3/2251 , H01S3/2333 , H01S3/2366
摘要： The present invention provides a control system for a modular high repetition rate two discharge chamber ultraviolet gas discharge laser. In preferred embodiments, the laser is a production line machine with a master oscillator producing a very narrow band seed beam which is amplified in the second discharge chamber. Novel control features specially adapted for a two-chamber gas discharge laser system include: (1) pulse energy controls, with nanosecond timing precision (2) precision pulse to pulse wavelength controls with high speed and extreme speed wavelength tuning (3) fast response gas temperature control and (4) F2 injection controls with novel learning algorithm.
摘要翻译：本发明提供了一种用于模块化高重复率两放电室紫外线气体放电激光器的控制系统。在优选实施例中，激光器是具有主振荡器的生产线机器，该主振荡器产生在第二放电室中放大的非常窄的带状晶体束。特别适用于双室气体放电激光系统的新型控制特征包括：（1）脉冲能量控制，具有纳秒定时精度（2）精确脉冲到脉冲波长控制，具有高速和极速波长调谐（3）快速响应气体温度控制和（4）F2注入控制与新的学习算法。

92. 发明申请

US20090057567A1 Gas management system for a laser-produced-plasma EUV light source 有权
标题翻译：用于激光产生等离子体EUV光源的气体管理系统
公开(公告)号：US20090057567A1
公开(公告)日：2009-03-05
申请号：US11897644
申请日：2007-08-31
申请人： Alexander N. Bykanov , Alexander I. Ershov , Igor V. Fomenkov , David C. Brandt
发明人： Alexander N. Bykanov , Alexander I. Ershov , Igor V. Fomenkov , David C. Brandt
IPC分类号： H05G2/00 , H01H1/00
CPC分类号： H05G2/003 , G03F7/70033 , G03F7/70175 , G03F7/70916 , H05G2/005 , H05G2/008 , Y10S422/906
摘要： Devices and corresponding methods of use are described herein which may comprise an enclosing structure defining a closed loop flow path and a system generating a plasma at a plasma site, e.g. laser produced plasma system, where the plasma site may be in fluid communication with the flow path. For the device, a gas may be disposed in the enclosing structure which may include an ion-stopping buffer gas and/or an etchant. A pump may be provided to force the gas through the closed loop flow path. One or more heat exchangers removing heat from gas flowing in the flow path may be provided. In some arrangements, a filter may be used to remove at least a portion of a target species from gas flowing in the flow path.
摘要翻译：本文描述了装置和相应的使用方法，其可以包括限定闭环流动路径的封闭结构和在等离子体位置处产生等离子体的系统，例如，激光产生的等离子体系统，其中等离子体位置可以与流动路径流体连通。对于该装置，气体可以设置在封闭结构中，其可以包括离子停止缓冲气体和/或蚀刻剂。可以提供泵以迫使气体通过闭环流动路径。可以提供一种或多种热交换器来从流动路径中流动的气体中除去热量。在一些布置中，可以使用过滤器来从在流动路径中流动的气体中去除至少一部分目标物种。

93. 发明授权

US07491954B2 Drive laser delivery systems for EUV light source 失效
标题翻译：驱动用于EUV光源的激光输送系统
公开(公告)号：US07491954B2
公开(公告)日：2009-02-17
申请号：US11580414
申请日：2006-10-13
申请人： Alexander N. Bykanov , Igor V. Fomenkov , Oleh Khodykin , Alexander I. Ershov
发明人： Alexander N. Bykanov , Igor V. Fomenkov , Oleh Khodykin , Alexander I. Ershov
IPC分类号： H01J35/20
CPC分类号： H05G2/003 , G03F7/70033 , H01S3/0064 , H01S3/073 , H01S3/0805 , H01S3/08054 , H01S3/08059 , H01S3/083 , H01S3/10092 , H01S3/105 , H01S3/1066 , H01S3/115 , H01S3/121 , H01S3/127 , H01S3/2232 , H01S3/2316 , H01S3/2325 , H01S3/2383 , H05G2/008
摘要： An LPP EUV light source is disclosed having an optic positioned in the plasma chamber for reflecting EUV light generated therein and a laser input window. For this aspect, the EUV light source may be configured to expose the optic to a gaseous etchant pressure for optic cleaning while the window is exposed to a lower gaseous etchant pressure to avoid window coating deterioration. In another aspect, an EUV light source may comprise a target material positionable along a beam path to participate in a first interaction with light on the beam path; an optical amplifier; and at least one optic directing photons scattered from the first interaction into the optical amplifier to produce a laser beam on the beam path for a subsequent interaction with the target material to produce an EUV light emitting plasma.
摘要翻译：公开了一种LPP EUV光源，其具有位于等离子体室中的光学器件，用于反射在其中产生的EUV光和激光输入窗口。对于该方面，EUV光源可以被配置为将窗口暴露于更低的气体蚀刻剂压力以将窗口暴露于气体蚀刻剂压力以进行光学清洁，以避免窗口涂层变质。在另一方面，EUV光源可以包括沿着光束路径定位以参与与光束路径上的光的第一相互作用的目标材料; 光放大器; 以及至少一个光导向光子从第一相互作用散射到光放大器中以在光束路径上产生激光束，用于随后与目标材料的相互作用以产生EUV发光等离子体。

94. 发明申请

US20080267242A1 Laser system 有权
标题翻译：激光系统
公开(公告)号：US20080267242A1
公开(公告)日：2008-10-30
申请号：US11981195
申请日：2007-10-30
申请人： Alexander I. Ershov , William N. Partlo , Daniel J.W. Brown , Igor V. Fomenkov
发明人： Alexander I. Ershov , William N. Partlo , Daniel J.W. Brown , Igor V. Fomenkov
IPC分类号： H01S3/225
CPC分类号： H01S3/2333 , G03F7/70025 , G03F7/70041 , G03F7/70583 , H01S3/005 , H01S3/08036 , H01S3/08059 , H01S3/10092 , H01S3/225 , H01S3/2251 , H01S3/235 , H01S2301/02
摘要： A method/apparatus may comprise operating a line narrowed pulsed excimer or molecular fluorine gas discharge laser system by using a seed laser oscillator to produce an output which may comprise a first gas discharge excimer or molecular fluorine laser chamber; a line narrowing module; a laser amplification stage which may comprise a ring power amplification stage; the method of operation may the steps of: selecting a differential timing between an electrical discharge between a pair of electrodes in the first laser chamber and in the second laser chamber which at the same time keeps ASE below a selected limit and the pulse energy of the laser system output light beam of pulses essentially constant.
摘要翻译：方法/装置可以包括通过使用种子激光振荡器来操作线窄的脉冲准分子或分子氟气体放电激光系统，以产生可包括第一气体放电准分子或分子氟激光室的输出; 线缩小模块; 可以包括环功率放大级的激光放大级; 操作方法可以是：选择第一激光室中的一对电极与第二激光室中的一对电极之间的放电之间的差分定时，同时使ASE保持在选定的极限以下，并且脉冲能量激光系统输出光束的脉冲基本恒定。

95. 发明申请

US20080225908A1 Laser system 有权
标题翻译：激光系统
公开(公告)号：US20080225908A1
公开(公告)日：2008-09-18
申请号：US11981449
申请日：2007-10-30
申请人： Alexander I. Ershov , William N. Partlo , Daniel J.W. Brown , Igor V. Fomenkov , Robert A. Bergstedt
发明人： Alexander I. Ershov , William N. Partlo , Daniel J.W. Brown , Igor V. Fomenkov , Robert A. Bergstedt
IPC分类号： H01S3/225
CPC分类号： H01S3/2333 , G03F7/70025 , G03F7/70041 , G03F7/70558 , G03F7/70583 , H01S3/005 , H01S3/08 , H01S3/08059 , H01S3/105 , H01S3/2251 , H01S3/235 , H01S3/2366
摘要： An apparatus/method which may comprise a line narrowed pulsed excimer or molecular fluorine gas discharge laser system which may comprise a seed laser oscillator producing an output comprising a seed laser output light beam of pulses which may comprise a first gas discharge excimer or molecular fluorine laser chamber; a line narrowing module within a first oscillator cavity; a laser amplification stage containing an amplifying gain medium in a second gas discharge excimer or molecular fluorine laser chamber receiving the output of the seed laser oscillator and amplifying the output of the seed laser oscillator to form a laser system output comprising a laser system output light beam of pulses, which may comprise a ring power amplification stage; a seed injection mechanism.
摘要翻译：可以包括线变窄的脉冲准分子或分子氟气体放电激光系统的装置/方法，其可以包括种子激光振荡器，其产生包括种子激光输出的脉冲光束的输出，所述种子激光输出光束可以包括第一气体放电准分子或分子氟激光房间第一振荡器腔内的线窄模块; 在第二气体放电准分子或分子氟激光室中包含放大增益介质的激光放大级，其接收种子激光振荡器的输出并放大种子激光振荡器的输出，以形成激光系统输出，该激光系统输出包括激光系统输出光束的脉冲，其可以包括环形功率放大级; 种子注射机制。

96. 发明授权

US07411203B2 EUV light source 有权
标题翻译： EUV光源
公开(公告)号：US07411203B2
公开(公告)日：2008-08-12
申请号：US11647016
申请日：2006-12-27
申请人： Igor V. Fomenkov , Alexander I. Ershov
发明人： Igor V. Fomenkov , Alexander I. Ershov
IPC分类号： H01J49/00
CPC分类号： G03F7/70033 , B82Y10/00 , G03F7/70175 , G03F7/70916 , G21K1/062 , G21K2201/061 , G21K2201/065 , G21K2201/067 , H05G2/003 , H05G2/005 , H05G2/006 , H05G2/008
摘要： An apparatus and method for EUV light production is disclosed which may comprise a laser produced plasma (“LPP”) extreme ultraviolet (“EUV”) light source control system comprising a target delivery system adapted to deliver moving plasma initiation targets and an EUV light collection optic having a ibeus defining a desired plasma initiation site, comprising; a target tracking and feedback system comprising: at least one imaging device providing as an output an image of a target stream track, wherein the target stream track results from the imaging speed of the camera being too slow to image individual plasma formation targets forming the target stream imaged as the target stream track; a stream track error detector detecting an error in the position of the target stream track in at least one axis genemily perpendicular to the target stream track from a desired stream truck intersecting the desired plasma initiation site.
摘要翻译：公开了一种用于EUV光产生的装置和方法，其可以包括激光产生的等离子体（“LPP”）极紫外（“EUV”）光源控制系统，其包括适于递送移动等离子体引发靶的目标传送系统和EUV光收集光学元件具有限定期望的等离子体起始位置的ibeus，包括：目标跟踪和反馈系统，包括：至少一个成像装置，其提供目标流轨迹的图像作为输出，其中所述目标流轨迹由所述摄像机的成像速度导致太慢以不能成像形成所述目标的各个等离子体形成目标流成像为目标流轨道; 流轨迹误差检测器，从与期望的等离子体起始位置相交的期望的流动车辆，在垂直于目标流轨迹的至少一个轴中至少一个轴上检测目标流轨迹的位置的误差。

97. 发明授权

US07369597B2 Laser output light pulse stretcher 有权
标题翻译：激光输出光脉冲担架
公开(公告)号：US07369597B2
公开(公告)日：2008-05-06
申请号：US10847799
申请日：2004-05-18
申请人： Scot T. Smith , Alexander I. Ershov , Alexei Lukashev
发明人： Scot T. Smith , Alexander I. Ershov , Alexei Lukashev
IPC分类号： H01S3/083
CPC分类号： G03F7/7055 , H01S3/0057 , H01S3/036 , H01S3/134 , H01S3/225 , H01S3/2251 , H01S3/2258 , H01S3/2333 , H01S3/2366
摘要： Providing a high peak power short pulse duration gas discharge laser output pulse comprises a pulse stretcher a laser output pulse optical delay initiating optic diverting a portion of the output laser pulse into an optical delay having an optical delay path and comprising a plurality of confocal resonators in series aligned to deliver an output of the optical delay to the laser output pulse optical delay initiating optic. The plurality of confocal resonators comprises four confocal resonators comprising a twelve pass four mirror arrangement. An apparatus and method may comprise a plurality, e.g., two pulse stretchers in series and may include spatial coherency metrology.
摘要翻译：提供高峰值功率短脉冲持续时间气体放电激光输出脉冲包括脉冲展宽器，激光输出脉冲光学延迟启动光学，将输出激光脉冲的一部分转移到具有光学延迟路径的光学延迟中，并且包括多个共焦共振器串联对齐以将光延迟的输出传递到激光输出脉冲光延迟启动光学器件。多个共焦共振器包括四个共聚焦共振器，其包括十二通四反射镜装置。装置和方法可以包括多个例如串联的两个脉冲拉伸器，并且可以包括空间相干度计量学。

98. 发明授权

US07365349B2 EUV light source collector lifetime improvements 有权
标题翻译： EUV光源收集器寿命改善
公开(公告)号：US07365349B2
公开(公告)日：2008-04-29
申请号：US11168190
申请日：2005-06-27
申请人： William N. Partlo , Alexander I. Ershov , Igor V. Fomenkov , Oleh Khodykin
发明人： William N. Partlo , Alexander I. Ershov , Igor V. Fomenkov , Oleh Khodykin
IPC分类号： H01J35/20
CPC分类号： H05G2/003 , B82Y10/00 , G03F7/70925 , G21K1/062 , H05G2/005
摘要： An apparatus and method for cleaning a plasma source material compound from a plasma produced EUV light source collector optic which may comprise reacting the plasma source material compound with hydrogen to form a hydride of the plasma source material from the plasma source material contained in the plasma source material compound on the collector optic. The method may further comprise initiating the reacting by introducing hydrogen into a plasma formation chamber containing the collector optic, and may further comprise removing the hydride from the collector optic, e.g., by cleaning plasma action and/or plasma source material sputtering, or other means as may be determined to be effective. An apparatus and method of extending the useful life of a plasma produced EUV light source collector coating layer may comprise in situ replacement of the material of the coating layer by deposition of the coating layer material onto the coating layer.
摘要翻译：一种用于从等离子体产生的EUV光源收集器光学元件清洗等离子体源材料化合物的装置和方法，其可以包括使等离子体源材料化合物与氢反应以从等离子体源中包含的等离子体源材料形成等离子体源材料的氢化物收集器光学元件上的材料化合物。该方法还可以包括通过将氢引入到包含收集器光学元件的等离子体形成室中来引发反应，并且还可以包括例如通过清洗等离子体作用和/或等离子体源材料溅射或其它方法从收集器光学元件中去除氢化物可能被确定为有效。延长等离子体产生的EUV光源集电器涂层的使用寿命的装置和方法可包括通过将涂层材料沉积到涂层上来原位置换涂层的材料。

99. 发明授权

US07317196B2 LPP EUV light source 失效
标题翻译： LPP EUV光源
公开(公告)号：US07317196B2
公开(公告)日：2008-01-08
申请号：US10979919
申请日：2004-11-01
申请人： William N. Partlo , Daniel J. W. Brown , Igor V. Fomenkov , Alexander I. Ershov , David W. Myers
发明人： William N. Partlo , Daniel J. W. Brown , Igor V. Fomenkov , Alexander I. Ershov , David W. Myers
IPC分类号： H01J35/20
CPC分类号： B82Y10/00 , G03F7/70033 , H05G2/003 , H05G2/008
摘要： An apparatus and method is described for effectively and efficiently providing plasma irradiation laser light pulses in an LPP EUV light source which may comprise a laser initial target irradiation pulse generating mechanism irradiating a plasma initiation target with an initial target irradiation pulse to form an EUV generating plasma having an emission region emitting in-band EUV light; a laser plasma irradiation pulse generating mechanism irradiating the plasma with a plasma irradiation pulse after the initial target irradiation pulse so as to compress emission material in the plasma toward the emission region of the plasma. The plasma irradiation pulse may comprise a laser pulse having a wavelength that is sufficiently longer than a wavelength of the initial target irradiation pulse to have an associated lower critical density resulting in absorption occurring within the plasma in a region of the plasma defined by the wavelength of the plasma irradiation pulse sufficiently separated from an initial target irradiation site to achieve compression of the emission material, and the may compress the emission region. The laser plasma irradiation pulse may produce an aerial mass density in the ablating cloud of the plasma sufficient to confine the favorably emitting plasma for increased conversion efficiency. The deposition region for the plasma irradiation pulse may be is removed enough from the initial target surface so as to insure compression of the favorably emitting plasma. A high conversion efficiency laser produced plasma extreme ultraviolet (“EUV”) light source may comprise a laser initial target irradiation pulse generating mechanism irradiating a plasma initiation target with a target irradiation pulse to form an EUV generating plasma emitting in-band EUV light; a plasma tamper substantially surrounding the plasma to constrain the expansion of the plasma.
摘要翻译：描述了一种用于在LPP EUV光源中有效且有效地提供等离子体照射激光脉冲的装置和方法，其可以包括用初始目标照射脉冲照射等离子体引发目标的激光初始靶照射脉冲发生机构以形成产生EUV的等离子体具有发射带内EUV光的发射区域; 激光等离子体照射脉冲发生机构在初始目标照射脉冲之后用等离子体照射脉冲照射等离子体，以将等离子体中的发射材料压缩到等离子体的发射区域。等离子体照射脉冲可以包括具有足够长于初始靶照射脉冲的波长的波长的激光脉冲，以具有相关联的较低的临界密度，从而在由等离子体的波长定义的等离子体的区域内的等离子体内发生吸收等离子体照射脉冲从初始目标照射位置充分分离，以实现发射材料的压缩，并且可以压缩发射区域。激光等离子体照射脉冲可以在等离子体的消融云中产生足够的空气质量密度以限制有利的发射等离子体以提高转换效率。可以从初始目标表面去除等离子体照射脉冲的沉积区域，以确保有利地发射等离子体的压缩。高转换效率的激光产生的等离子体极紫外（“EUV”）光源可以包括激光初始靶照射脉冲发生机构，用目标照射脉冲照射等离子体引发目标，以形成产生EUV的发射等离子体的带内EUV光; 等离子体篡改基本上围绕等离子体以约束等离子体的膨胀。

100. 发明授权

US07193228B2 EUV light source optical elements 有权
标题翻译： EUV光源光学元件
公开(公告)号：US07193228B2
公开(公告)日：2007-03-20
申请号：US11021261
申请日：2004-12-22
申请人： Norbert R. Bowering , Alexander I. Ershov , Timothy S. Dyer , Hugh R. Grinolds
发明人： Norbert R. Bowering , Alexander I. Ershov , Timothy S. Dyer , Hugh R. Grinolds
IPC分类号： G01J1/00 , G02B1/00
CPC分类号： G21K1/062 , B82Y10/00 , G03F7/70175 , G03F7/70916
摘要： Apparatus and methods are disclosed for forming plasma generated EUV light source optical elements, e.g., reflectors comprising MLM stacks employing various binary layer materials and capping layer(s) including single and binary capping layers for utilization in plasma generated EUV light source chambers, particularly where the plasma source material is reactive with one or more of the MLM materials.
摘要翻译：公开了用于形成等离子体产生的EUV光源光学元件的装置和方法，例如，包括使用各种二元层材料的MLM堆叠的反射器和包括用于等离子体产生的EUV光源室中的单个和二进制封盖层的封盖层，特别是在等离子体源材料与一种或多种MLM材料反应。

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