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    • 91. 发明授权
    • Line narrowing module
    • US07366219B2
    • 2008-04-29
    • US11000684
    • 2004-11-30
    • J. Martin AlgotsRobert A. BergstedtWalter D. GillespieVladimir A. KulgeykoWilliam N. PartloGerman E. RylovRichard L. SandstromBrian StrateTimothy S. Dyer
    • J. Martin AlgotsRobert A. BergstedtWalter D. GillespieVladimir A. KulgeykoWilliam N. PartloGerman E. RylovRichard L. SandstromBrian StrateTimothy S. Dyer
    • H01S3/22
    • H01S3/1055G03F7/70025G03F7/70041H01S3/005H01S3/036H01S3/08H01S3/08004H01S3/08059H01S3/097H01S3/106H01S3/2251
    • A line narrowing method and module for a narrow band DUV high power high repetition rate gas discharge laser producing output laser light pulse beam pulses in bursts of pulses, the module having a nominal optical path are disclosed which may comprise: a dispersive center wavelength selection optic moveably mounted within an optical path of the line narrowing module, selecting at least one center wavelength for each pulse determined at least in part by the angle of incidence of the laser light pulse beam containing the respective pulse on the dispersive wavelength selection optic; a first tuning mechanism operative in part to select the angle of incidence of the laser light pulse beam containing the respective pulse upon the dispersive center wavelength selection optic, by selecting an angle of transmission of the laser light pulse beam containing the pulse toward the dispersive center wavelength selection optic; a second tuning mechanism operative in part to select the angle of incidence of the laser light pulse beam containing the respective pulse by changing the position of the dispersive center wavelength selection optic relative to the nominal optical path of the line narrowing module; wherein the second tuning mechanism coarsely selects a value for the center wavelength and the first tuning mechanism more finely selects the value for the center wavelength. The apparatus and method may further comprise at least one beam expanding and redirecting prism in the optical path of the line narrowing module; the first tuning mechanism selecting an angle of incidence of the at least a first spatially defined portion of the laser light pulse beam by changing the position of the at least one beam expanding prism relative to the nominal optical path of the line narrowing module. The first and second tuning mechanisms may be controlled by a center wavelength controller during a burst based upon feedback from a center wavelength detector detecting the center wavelength of at least one other pulse in the burst of pulses and the controller providing the feedback based upon an algorithm employing the detected center wavelength for the at least one other pulse in the burst. The first tuning mechanism may comprise an electro-mechanical course positioning mechanism and a fine positioning mechanism comprising an actuatable material that changes position or shape when actuated.
    • 92. 发明授权
    • Electric discharge laser with active wavelength chirp correction
    • 具有有源波长啁啾校正的放电激光器
    • US06621846B1
    • 2003-09-16
    • US09501160
    • 2000-02-09
    • Richard L. SandstromPalash P. DasGeorge J. EverageFrederick G. ErieWilliam N. PartloIgor V. Fomenkov
    • Richard L. SandstromPalash P. DasGeorge J. EverageFrederick G. ErieWilliam N. PartloIgor V. Fomenkov
    • H01S322
    • H01S3/104G03F7/70025G03F7/70333G03F7/70575G03F7/708H01S3/036H01S3/038H01S3/0381H01S3/0382H01S3/105H01S3/1055H01S3/13H01S3/134H01S3/225
    • Electric discharge laser with active chirp correction. This application discloses techniques for moderating and dispensing these pressure waves. In some lasers small predictable patterns remain which can be substantially corrected with active wavelength control using relatively slow wavelength control instruments of the prior art. In a preferred embodiment a simple learning algorithm is described to allow advance tuning mirror adjustment in anticipation of the learned chirp pattern. Embodiments include stepper motors having very fine adjustments so that size of tuning steps are substantially reduced for more precise tuning. However, complete elimination of wavelength chirp is normally not feasible with structural changes in the laser chamber and advance tuning; therefore, Applicants have developed equipment and techniques for very fast active chirp correction. Improved techniques include a combination of a relatively slow stepper motor and a very fast piezoelectric driver. In another preferred embodiment chirp correction is made on a pulse-to-pulse basis where the wavelength of one pulse is measured and the wavelength of the next pulse is corrected based on the measurement. This correction technique is able to function at repetition rates as rapid as 2000 Hz and greater.
    • 具有主动啁啾校正的放电激光器。 本申请公开了用于调节和分配这些压力波的技术。 在一些激光器中,可以使用现有技术的相对较慢的波长控制装置的主动波长控制基本上校正了小的可预测的图案。 在优选实施例中,描述了一种简单的学习算法,以便在预期学习的啁啾模式中允许预调谐镜调节。 实施例包括具有非常精细调节的步进电动机,使得调节步骤的尺寸被显着减小以便更精确的调谐。 然而,完全消除波长啁啾通常不可行,在激光室的结构变化和提前调谐; 因此,申请人已经开发了用于非常快的主动啁啾校正的设备和技术。 改进的技术包括相对较慢的步进电机和非常快的压电驱动器的组合。 在另一个优选实施例中,在脉冲对脉冲基础上进行啁啾校正,其中测量一个脉冲的波长,并且基于测量校正下一个脉冲的波长。 该校正技术能够以2000Hz及更高​​的重复速率工作。
    • 94. 发明申请
    • Multi-Pass Optical Apparatus
    • 多通道光学仪器
    • US20120170112A1
    • 2012-07-05
    • US12980939
    • 2010-12-29
    • Richard L. Sandstrom
    • Richard L. Sandstrom
    • H01S3/081G02B5/10H01S3/086G02B5/08
    • G02B17/004G02B7/1815G02B7/1825H01S3/076H01S3/2325
    • An apparatus includes a first plurality of concave reflecting surfaces; a second plurality of reflecting surfaces facing the first plurality of concave reflecting surfaces such that a region is defined between the first and second pluralities; and an input for an optical beam to enter the region and an output for the optical beam to exit the region. The first and second pluralities of reflecting surfaces are arranged relative to each other so that the optical beam is re-imaged at a reflecting surface of one of the pluralities after only one reflection from a reflecting surface of the other of the pluralities and so that overlap of two or more optical beams on each of the reflecting surfaces is avoided.
    • 一种装置包括:第一多个凹面反射面; 面对所述第一多个凹反射表面的第二多个反射表面,使得在所述第一和第二多个之间限定区域; 以及用于进入该区域的光束的输入和用于使光束离开该区域的输出。 第一和第二多个反射表面相对于彼此布置,使得光束在仅一次反射之后的多个反射表面中从多个另一个的反射表面重新成像,并且重叠 避免了在每个反射表面上的两个或更多个光束。
    • 97. 发明授权
    • Pulse energy control for excimer laser
    • 准分子激光脉冲能量控制
    • US06005879A
    • 1999-12-21
    • US34870
    • 1998-03-04
    • Richard L. SandstromHerve Andre BesauceleIgor V. FomenkovPalash P. Das
    • Richard L. SandstromHerve Andre BesauceleIgor V. FomenkovPalash P. Das
    • H01S3/038G03F7/20H01S3/03H01S3/034H01S3/036H01S3/08H01S3/081H01S3/0971H01S3/134H01S3/225H01S3/00
    • G03F7/70025G03F7/70041G03F7/70216G03F7/70558G03F7/70575H01S3/03H01S3/134H01S3/225H01S3/036H01S3/08009H01S3/0812H01S3/09713H01S3/2251H01S3/2256
    • A process for controlling pulse energy and integrated energy dose in bursts of pulses produced by an excimer laser. The energy of each pulse in each burst is measured. The rate of change of pulse energy with charging voltage is determined. A pulse energy error is determined for a previous pulse of the present burst. An integrated dose error is also determined for all previous pulses in the current burst. A charging voltage for the next pulse is determined using the pulse energy error, the integrated dose error, the rate of change of energy with charging voltage and a reference voltage. In a preferred embodiment, the rate of change of energy with voltage is determined by dithering the voltage during two pulses of each burst, once lower and once higher. The reference voltage is a voltage calculated using prior energy and voltage data. In this embodiment, the method of determining the reference voltage during a first portion of the pulse is different from the method used during a latter portion of the burst. During the first set of pulses (40 in this embodiment), for each pulse, a specified voltage calculated using voltage and energy data from a corresponding pulse in a previous burst is utilized as a prediction of the voltage needed to produce a pulse energy converging on a target pulse energy. For pulses 41 and thereafter the reference voltage for each pulse is the specified voltage for the previous pulse.
    • 用于在由准分子激光器产生的脉冲脉冲中控制脉冲能量和积分能量剂量的过程。 测量每个脉冲中每个脉冲的能量。 确定脉冲能量随充电电压的变化率。 针对当前脉冲串的先前脉冲确定脉冲能量误差。 还针对当前突发中的所有先前脉冲确定积分剂量误差。 使用脉冲能量误差,积分剂量误差,带充电电压的能量变化率和参考电压确定下一个脉冲的充电电压。 在优选实施例中,通过在每个脉冲串的两个脉冲期间抖动电压来确定能量与电压的变化率,一旦较低和一次较高。 参考电压是使用先前的能量和电压数据计算的电压。 在本实施例中,在脉冲的第一部分期间确定参考电压的方法与在脉冲串的后一部分期间使用的方法不同。 在第一组脉冲(在本实施例中为40)中,对于每个脉冲,使用从先前脉冲串中的对应脉冲的电压和能量数据计算的指定电压作为产生脉冲能量收敛所需的电压的预测 目标脉冲能量。 对于脉冲41,此后每个脉冲的参考电压是先前脉冲的指定电压。
    • 99. 发明授权
    • System and method for seed laser mode stabilization
    • 种子激光模式稳定的系统和方法
    • US08811440B2
    • 2014-08-19
    • US13607623
    • 2012-09-07
    • Richard L. Sandstrom
    • Richard L. Sandstrom
    • H01S3/00H01S3/13
    • H01S3/13H01S3/0085H01S3/11H01S3/1305H01S3/136H01S3/1398H01S3/2366H01S3/2383H05G2/005H05G2/008
    • A method and apparatus for stabilizing the seed laser in a laser produced plasma (LPP) extreme ultraviolet (EUV) light system are disclosed. In one embodiment, the cavity length of the laser may be adjusted by means of a movable mirror forming one end of the cavity. The time delay from the release of an output pulse to the lasing threshold next being reached is measured at different mirror positions, and a mirror position selected which results in a cavity mode being aligned with the gain peak of the laser, thus producing a minimum time delay from an output pulse of the laser to the next lasing threshold. A Q-switch in the laser allows for pre-lasing and thus jitter-free timing of output pulses. Feedback loops keep the laser output at maximum gain and efficiency, and the attenuation and timing at a desired operating point.
    • 公开了一种用于在激光产生的等离子体(LPP)极紫外(EUV)光系统中稳定种子激光的方法和装置。 在一个实施例中,可以通过形成空腔的一端的可移动镜来调节激光器的腔体长度。 在不同的反射镜位置处测量从输出脉冲释放到激光阈值的时间延迟,并且选择导致腔模式与激光器的增益峰值对准的反射镜位置,从而产生最小时间 从激光器的输出脉冲到下一个激光阈值的延迟。 激光器中的Q开关允许预激光,从而使输出脉冲无抖动定时。 反馈回路将激光输出保持在最大的增益和效率,以及在所需工作点的衰减和时序。