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91. 发明授权

US08446665B2 Catadioptric projection objective 有权
标题翻译：反射折射投影物镜
公开(公告)号：US08446665B2
公开(公告)日：2013-05-21
申请号：US12562693
申请日：2009-09-18
申请人： Alexander Epple , Vladimir Kamenov , Toralf Gruner , Thomas Schicketanz
发明人： Alexander Epple , Vladimir Kamenov , Toralf Gruner , Thomas Schicketanz
IPC分类号： G02B5/08
CPC分类号： G02B17/0892 , G02B1/11 , G02B17/08 , G02B17/0896 , G03F7/70 , G03F7/70225 , G03F7/70275
摘要： Catadioptric projection objective (1) for microlithography for imaging an object field (3) in an object plane (5) onto an image field (7) in an image plane (9). The objective includes a first partial objective (11) imaging the object field onto a first real intermediate image (13), a second partial objective (15) imaging the first intermediate image onto a second real intermediate image (17), and a third partial objective (19) imaging the second intermediate image onto the image field. The second partial objective is a catadioptric objective having exactly one concave mirror and having at least one lens (L21, L22). A first folding mirror (23) deflects the radiation from the object plane toward the concave mirror and a second folding mirror (25) deflects the radiation from the concave mirror toward the image plane. At least one surface of a lens (L21, L22) of the second partial objective has an antireflection coating having a reflectivity of less than 0.2% for an operating wavelength of between 150 nm and 250 nm and for an angle-of-incidence range of between 0° and 30°. As an alternative or in addition, all the surfaces of the lenses of the second partial objective are configured such that the deviation from the marginal ray concentricity is greater than or equal to 20°.
摘要翻译：用于微光刻的反折射投影物镜（1），用于将物平面（5）中的物场（3）成像到图像平面（9）中的图像场（7）上。该目的包括将对象场成像到第一实际中间图像（13）上的第一部分目标（11），将第一中间图像成像到第二实际中间图像（17）上的第二部分目标（15）物镜（19）将第二中间图像成像到图像场上。第二部分目标是具有恰好一个凹面镜并具有至少一个透镜（L21，L22）的反射折射物镜。第一折叠镜（23）将来自物体平面的辐射偏转到凹面镜，并且第二折叠镜（25）将来自凹面镜的辐射偏转到图像平面。第二部分物镜的透镜的至少一个表面（L21，L22）具有对于150nm至250nm的工作波长具有小于0.2％的反射率的抗反射涂层，并且对于介于0°和30°之间。作为替代或另外，第二部分物镜的透镜的所有表面被配置为使得与边缘射线同心度的偏差大于或等于20°。

92. 发明授权

US08248578B2 Projection exposure method and projection exposure system therefor 有权
标题翻译：投影曝光方法和投影曝光系统
公开(公告)号：US08248578B2
公开(公告)日：2012-08-21
申请号：US12410640
申请日：2009-03-25
申请人： Julian Kaller , Toralf Gruner
发明人： Julian Kaller , Toralf Gruner
IPC分类号： G03B27/52
CPC分类号： G03F7/70933 , G03F7/70191 , G03F7/70575 , G03F7/70941
摘要： In a projection exposure method, primary radiation having a center wavelength λ is generated and guided through an illumination system along an illumination path and through a projection system along a projection path. The center wavelength is varied within a wavelength variation range Δλ having a lower limit λMIN≦λ and an upper limit λMAX≧λ. A specific absorption coefficient k(λ) of at least one gaseous absorbent species selected from the group consisting of oxygen (O2), ozone (O3) and water vapor (H2O) present in at least one gas-filled space along at least one of the illumination path and the projection path varies between a minimum absorption coefficient kMIN and a maximum absorption coefficient kMAX within the wavelength variation range such that an absorption ratio (kMAX/kMIN) exceeds 10. A concentration of the absorbent species within the gas-filled space is controlled such that an overall absorption variation effected by the absorbent species for all rays running along differing ray paths towards the image field is maintained below a predetermined absorption variation threshold value.
摘要翻译：在投影曝光方法中，产生具有中心波长λ的一次辐射并沿着照明路径通过照明系统并沿着投影路径通过投影系统。中心波长在具有下限λMIN＆nlE;λ和上限λMAX≥λ的波长变化范围＆Dgr;λ内变化。至少一种选自氧（O 2），臭氧（O 3）和水蒸汽（H 2 O）的气体吸收物质的比吸收系数k（λ）存在于至少一个气体填充空间中，照射路径和投影路径在波长变化范围内的最小吸收系数kMIN和最大吸收系数kMAX之间变化，使得吸收比（kMAX / kMIN）超过10。气体填充空间内的吸收物质的浓度被控制为使得沿着沿着不同光线路朝着图像场行进的所有射线的吸收物质的整体吸收变化保持在预定吸收变化阈值以下。

93. 发明申请

US20120188636A1 METHOD FOR CORRECTING A LITHOGRAPHY PROJECTION OBJECTIVE, AND SUCH A PROJECTION OBJECTIVE 有权
标题翻译：校正投影目标的方法及其投影目标
公开(公告)号：US20120188636A1
公开(公告)日：2012-07-26
申请号：US13440226
申请日：2012-04-05
申请人： Wilhelm Ulrich , Thomas Okon , Norbert Wabra , Toralf Gruner , Boris Bittner , Volker Graeschus
发明人： Wilhelm Ulrich , Thomas Okon , Norbert Wabra , Toralf Gruner , Boris Bittner , Volker Graeschus
IPC分类号： G02B17/08
CPC分类号： G03F7/70308 , G02B17/08 , G02B27/0025 , G03F7/70216 , G03F7/70225 , G03F7/70258 , G03F7/70266
摘要： A method for correcting at least one image defect of a projection objective of a lithography projection exposure machine, the projection objective comprising an optical arrangement composed of a plurality of lenses and at least one mirror, the at least one mirror having an optically operative surface that can be defective and is thus responsible for the at least one image defect, comprises the steps of: at least approximately determining a ratio VM of principal ray height hMH to marginal ray height hMR at the optically operative surface of the at least one mirror, at least approximately determining at least one optically operative lens surface among the lens surfaces of the lenses, at which the magnitude of a ratio VL of principal ray height hLH to marginal ray height hLR comes at least closest to the ratio VM, and selecting the at least one determined lens surface for the correction of the image defect.
摘要翻译：一种用于校正光刻投影曝光机的投影物镜的至少一个图像缺陷的方法，所述投影物镜包括由多个透镜和至少一个反射镜组成的光学装置，所述至少一个反射镜具有光学操作表面，可能是有缺陷的并且因此对至少一个图像缺陷负责，包括以下步骤：至少近似地确定主光线高度hMH与至少一个反射镜的光学操作表面处的边缘光线高度hMR的比率VM，至少近似地确定透镜的透镜表面中的至少一个光学透镜表面，其中主光线高度hLH与边缘光线高度hLR的比值VL的大小至少最接近于比率VM，并且至少选择至少用于校正图像缺陷的一个确定的透镜表面。

94. 发明申请

US20120176591A1 METHOD AND DEVICE FOR THE CORRECTION OF IMAGING DEFECTS 审中-公开
标题翻译：用于校正图像缺陷的方法和装置
公开(公告)号：US20120176591A1
公开(公告)日：2012-07-12
申请号：US13423965
申请日：2012-03-19
申请人： Franz Sorg , Peter Deufel , Toralf Gruner
发明人： Franz Sorg , Peter Deufel , Toralf Gruner
IPC分类号： G03B27/32
CPC分类号： G03F7/70308 , G03F7/70825 , G03F7/70933
摘要： The disclosure relates to a microlithography projection exposure system having optical corrective elements configured to modify the imaging characteristics, as well as related systems and component.
摘要翻译：本公开涉及具有被配置为修改成像特性以及相关系统和部件的光学校正元件的微光刻投影曝光系统。

95. 发明授权

US08174676B2 Method for correcting a lithography projection objective, and such a projection objective 有权
标题翻译：用于校正光刻投影物镜的方法和这种投影物镜
公开(公告)号：US08174676B2
公开(公告)日：2012-05-08
申请号：US13187003
申请日：2011-07-20
申请人： Wilhelm Ulrich , Thomas Okon , Norbert Wabra , Toralf Gruner , Boris Bittner , Volker Graeschus
发明人： Wilhelm Ulrich , Thomas Okon , Norbert Wabra , Toralf Gruner , Boris Bittner , Volker Graeschus
IPC分类号： G03B27/70
CPC分类号： G03F7/70308 , G02B17/08 , G02B27/0025 , G03F7/70216 , G03F7/70225 , G03F7/70258 , G03F7/70266
摘要： A method for correcting at least one image defect of a projection objective of a lithography projection exposure machine, the projection objective comprising an optical arrangement composed of a plurality of lenses and at least one mirror, the at least one mirror having an optically operative surface that can be defective and is thus responsible for the at least one image defect, comprises the steps of: at least approximately determining a ratio VM of principal ray height hMH to marginal ray height hMR at the optically operative surface of the at least one mirror, at least approximately determining at least one optically operative lens surface among the lens surfaces of the lenses, at which the magnitude of a ratio VL of principal ray height hLH to marginal ray height hLR comes at least closest to the ratio VM, and selecting the at least one determined lens surface for the correction of the image defect.
摘要翻译：一种用于校正光刻投影曝光机的投影物镜的至少一个图像缺陷的方法，所述投影物镜包括由多个透镜和至少一个反射镜组成的光学装置，所述至少一个反射镜具有光学操作表面，可能是有缺陷的并且因此对至少一个图像缺陷负责，包括以下步骤：至少近似地确定主光线高度hMH与至少一个反射镜的光学操作表面处的边缘光线高度hMR的比率VM，至少近似地确定透镜的透镜表面中的至少一个光学透镜表面，其中主光线高度hLH与边缘光线高度hLR的比值VL的大小至少最接近于比率VM，并且至少选择至少用于校正图像缺陷的一个确定的透镜表面。

96. 发明申请

US20110279803A1 METHOD FOR CORRECTING A LITHOGRAPHY PROJECTION OBJECTIVE, AND SUCH A PROJECTION OBJECTIVE 有权
标题翻译：校正投影目标的方法及其投影目标
公开(公告)号：US20110279803A1
公开(公告)日：2011-11-17
申请号：US13187003
申请日：2011-07-20
申请人： Wilhelm Ulrich , Thomas Okon , Norbert Wabra , Toralf Gruner , Boris Bittner , Volker Graeschus
发明人： Wilhelm Ulrich , Thomas Okon , Norbert Wabra , Toralf Gruner , Boris Bittner , Volker Graeschus
IPC分类号： G03B27/54
CPC分类号： G03F7/70308 , G02B17/08 , G02B27/0025 , G03F7/70216 , G03F7/70225 , G03F7/70258 , G03F7/70266
摘要： A method for correcting at least one image defect of a projection objective of a lithography projection exposure machine, the projection objective comprising an optical arrangement composed of a plurality of lenses and at least one mirror, the at least one mirror having an optically operative surface that can be defective and is thus responsible for the at least one image defect, comprises the steps of: at least approximately determining a ratio VM of principal ray height hMH to marginal ray height hMR at the optically operative surface of the at least one mirror, at least approximately determining at least one optically operative lens surface among the lens surfaces of the lenses, at which the magnitude of a ratio VL of principal ray height hLH to marginal ray height hLR comes at least closest to the ratio VM, and selecting the at least one determined lens surface for the correction of the image defect.
摘要翻译：一种用于校正光刻投影曝光机的投影物镜的至少一个图像缺陷的方法，所述投影物镜包括由多个透镜和至少一个反射镜组成的光学装置，所述至少一个反射镜具有光学操作表面，可能是有缺陷的并且因此对至少一个图像缺陷负责，包括以下步骤：至少近似地确定主光线高度hMH与至少一个反射镜的光学操作表面处的边缘光线高度hMR的比率VM，至少近似地确定透镜的透镜表面中的至少一个光学透镜表面，其中主光线高度hLH与边缘光线高度hLR的比值VL的大小至少最接近于比率VM，并且至少选择至少用于校正图像缺陷的一个确定的透镜表面。

97. 发明申请

US20110109893A1 MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS 有权
标题翻译：微波投影曝光装置
公开(公告)号：US20110109893A1
公开(公告)日：2011-05-12
申请号：US13007039
申请日：2011-01-14
申请人： Toralf Gruner , Alexander Epple , Markus Degünther
发明人： Toralf Gruner , Alexander Epple , Markus Degünther
IPC分类号： G03F7/20 , G03B27/54 , G03B27/72
CPC分类号： G03F7/70108 , G03F7/70141 , G03F7/70191
摘要： A projection exposure apparatus has a projection lens with an object plane, an image plane, an optical axis and a non-telecentric entrance pupil. The apparatus further comprises an illumination system having an intermediate field plane and a field stop. The field stop is positioned in or in close proximity to the intermediate field plane and defines an illuminated field in the object plane that does not contain the optical axis of the projection lens. The illumination system is configured such that, in the object plane, a mean of the angles formed between all principal rays emanating from the intermediate field plane on the one hand and the optical axis of the projection lens on the other hand differs from 0°.
摘要翻译：投影曝光装置具有物镜面，像面，光轴和非远心入射光瞳的投影透镜。该装置还包括具有中间场平面和场停止的照明系统。场停止件位于中间场平面中或紧邻中间场平面，并且在物平面中限定不包含投影透镜的光轴的照明场。照明系统被配置为使得在物平面中，从一方面从中间场平面发射的所有主光线与另一方面的投影透镜的光轴之间形成的角度的平均值不同于0°。

98. 发明申请

US20110038061A1 CATADIOPTRIC PROJECTION OBJECTIVE 有权
标题翻译：目标投影目标
公开(公告)号：US20110038061A1
公开(公告)日：2011-02-17
申请号：US12562693
申请日：2009-09-18
申请人： Alexander EPPLE , Vladimir Kamenov , Toralf Gruner , Thomas Schicketanz
发明人： Alexander EPPLE , Vladimir Kamenov , Toralf Gruner , Thomas Schicketanz
IPC分类号： G02B17/00 , G03B27/52
CPC分类号： G02B17/0892 , G02B1/11 , G02B17/08 , G02B17/0896 , G03F7/70 , G03F7/70225 , G03F7/70275
摘要： Catadioptric projection objective (1) for microlithography for imaging an object field (3) in an object plane (5) onto an image field (7) in an image plane (9). The objective includes a first partial objective (11) imaging the object field onto a first real intermediate image (13), a second partial objective (15) imaging the first intermediate image onto a second real intermediate image (17), and a third partial objective (19) imaging the second intermediate image onto the image field. The second partial objective is a catadioptric objective having exactly one concave mirror and having at least one lens (L21, L22). A first folding mirror (23) deflects the radiation from the object plane toward the concave mirror and a second folding mirror (25) deflects the radiation from the concave mirror toward the image plane. At least one surface of a lens (L21, L22) of the second partial objective has an antireflection coating having a reflectivity of less than 0.2% for an operating wavelength of between 150 nm and 250 nm and for an angle-of-incidence range of between 0° and 30°. As an alternative or in addition, all the surfaces of the lenses of the second partial objective are configured such that the deviation from the marginal ray concentricity is greater than or equal to 20°.
摘要翻译：用于微光刻的反折射投影物镜（1），用于将物平面（5）中的物场（3）成像到图像平面（9）中的图像场（7）上。该目的包括将对象场成像到第一实际中间图像（13）上的第一部分目标（11），将第一中间图像成像到第二实际中间图像（17）上的第二部分目标（15）物镜（19）将第二中间图像成像到图像场上。第二部分目标是具有恰好一个凹面镜并具有至少一个透镜（L21，L22）的反射折射物镜。第一折叠镜（23）将来自物体平面的辐射偏转到凹面镜，并且第二折叠镜（25）将来自凹面镜的辐射偏转到图像平面。第二部分物镜的透镜（L21，L22）的至少一个表面具有对于150nm至250nm的工作波长具有小于0.2％的反射率的抗反射涂层，并且对于介于0°和30°之间。作为替代或另外，第二部分物镜的透镜的所有表面被配置为使得与边缘射线同心度的偏差大于或等于20°。

99. 发明申请

US20100014065A1 METHOD FOR IMPROVING IMAGING PROPERTIES OF AN OPTICAL SYSTEM, AND SUCH AN OPTICAL SYSTEM 审中-公开
标题翻译：用于改善光学系统的成像特性的方法和这样的光学系统
公开(公告)号：US20100014065A1
公开(公告)日：2010-01-21
申请号：US12552894
申请日：2009-09-02
申请人： Toralf Gruner , Yim-Bun Patrick Kwan
发明人： Toralf Gruner , Yim-Bun Patrick Kwan
IPC分类号： G03B27/54 , G02B7/00 , G03B27/70
CPC分类号： G02B7/028 , G02B27/0068 , G03F7/70258 , G03F7/70308 , G03F7/706 , G03F7/70891
摘要： The disclosure relates to a method for improving optical properties of an optical system. The optical system has a plurality of optical elements for imaging a pattern onto a substrate that is arranged in an image plane of the optical system. The method includes detecting at least one time-dependent, at least partially reversible aberration of the optical system that is caused by heating of at least one of the optical elements. The method also includes at least partially correcting the aberration by replacing at least one optical element from the plurality of optical elements with at least one optical compensation element. The disclosure also relates to such an optical system with improved imaging properties.
摘要翻译：本公开涉及一种用于改善光学系统的光学特性的方法。光学系统具有多个光学元件，用于将图案成像到布置在光学系统的图像平面中的基板上。该方法包括检测由至少一个光学元件的加热引起的光学系统的至少一个依赖于时间的至少部分可逆的像差。该方法还包括至少部分地通过用至少一个光学补偿元件替换来自多个光学元件的至少一个光学元件来校正像差。本公开还涉及具有改进的成像特性的这种光学系统。

100. 发明申请

US20090257032A1 OPTICAL ELEMENT AND METHOD 有权
标题翻译：光学元件和方法
公开(公告)号：US20090257032A1
公开(公告)日：2009-10-15
申请号：US12402015
申请日：2009-03-11
申请人： Eric Eva , Payam Tayebati , Michael Thier , Markus Hauf , Ulrich Schoenhoff , Ole Fluegge , Arif Kazi , Alexander Sauerhoefer , Gerhard Focht , Jochen Weber , Toralf Gruner
发明人： Eric Eva , Payam Tayebati , Michael Thier , Markus Hauf , Ulrich Schoenhoff , Ole Fluegge , Arif Kazi , Alexander Sauerhoefer , Gerhard Focht , Jochen Weber , Toralf Gruner
IPC分类号： G03B27/52 , G02B7/02
CPC分类号： G03F7/70891 , G02B7/028 , G02B27/0068 , G03F7/70266
摘要： The disclosure relates to an optical element configure to at least partial spatially resolve correction of a wavefront aberration of an optical system (e.g., a projection exposure apparatus for microlithography) to which optical radiation can be applied, as well as related systems and methods.
摘要翻译：本公开涉及一种光学元件，其被配置为至少部分空间地解决可以应用光辐射的光学系统（例如，用于微光刻的投影曝光设备）的波前像差的校正，以及相关的系统和方法。

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