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91. 发明授权

US08501386B2 Silicon-containing film-forming composition, silicon-containing film-formed substrate, and patterning process 有权
标题翻译：含硅成膜组合物，含硅膜基板和图案化工艺
公开(公告)号：US08501386B2
公开(公告)日：2013-08-06
申请号：US13205262
申请日：2011-08-08
申请人： Tsutomu Ogihara , Takafumi Ueda , Toshiharu Yano , Koji Hasegawa
发明人： Tsutomu Ogihara , Takafumi Ueda , Toshiharu Yano , Koji Hasegawa
IPC分类号： G03F7/00 , G03F7/004 , G03F7/075 , G03F7/09 , G03F7/40
CPC分类号： G03F7/094 , G03F7/0752 , G03F7/091 , G03F7/11
摘要： A thermosetting silicon-containing film-forming composition for forming a silicon-containing film to be formed in a multi-layer resist process used in lithography, the composition including at least: (A) a silicon-containing compound obtained by hydrolysis-condensation of a hydrolyzable silicon compound and compound(s) selected from the group consisting of a hydrolyzable silicon compound and a reactive compound; (B) a thermal crosslinking accelerator; (C) an organic acid with one, or two or more valency having 1 to 30 carbon atoms; and (D) an organic solvent.
摘要翻译：一种用于形成用于光刻的多层抗蚀剂工艺中的含硅膜的热固性含硅膜形成组合物，该组合物至少包括：（A）通过水解缩合得到的含硅化合物可水解硅化合物和选自可水解硅化合物和反应性化合物的化合物; （B）热交联促进剂; （C）具有1至30个碳原子的一价或两价或更多价的有机酸; 和（D）有机溶剂。

92. 发明授权

US08114570B2 Photoacid generator, resist composition, and patterning process 有权
标题翻译：光酸发生剂，抗蚀剂组合物和图案化工艺
公开(公告)号：US08114570B2
公开(公告)日：2012-02-14
申请号：US12410357
申请日：2009-03-24
申请人： Youichi Ohsawa , Takeshi Kinsho , Takeru Watanabe , Koji Hasegawa , Masaki Ohashi
发明人： Youichi Ohsawa , Takeshi Kinsho , Takeru Watanabe , Koji Hasegawa , Masaki Ohashi
IPC分类号： G03F7/004 , G03F7/30 , C07D307/00 , C07C309/03 , C07C309/19
CPC分类号： G03F7/0045 , C07C25/18 , C07C309/12 , C07C381/12 , C07C2601/14 , C07C2602/42 , C07D333/46 , C07D493/08 , C07D493/18 , C08K5/42 , G03F7/0046 , G03F7/0382 , G03F7/0392 , G03F7/0395 , G03F7/0397 , G03F7/2041 , Y10S430/111
摘要： Photoacid generators generate sulfonic acids of formula (1a) upon exposure to high-energy radiation. ROC(═O)R1—COOCH2CF2SO3−H+ (1a) RO is OH or C1-C20 organoxy, R1 is a divalent C1-C20 aliphatic group or forms a cyclic structure with RO. The photoacid generators are compatible with resins and can control acid diffusion and are thus suited for use in chemically amplified resist compositions.
摘要翻译：光生酸发生剂在暴露于高能量辐射时产生式（1a）的磺酸。 ROC（= O）R1-COOCH2CF2SO3-H +（1a）RO是OH或C1-C20有机氧基，R1是二价C1-C20脂族基团或与RO形成环状结构。光致酸产生剂与树脂相容并且可以控制酸扩散，因此适用于化学增幅抗蚀剂组合物。

93. 发明申请

US20110177455A1 POLYMER, RESIST COMPOSITION, AND PATTERNING PROCESS 有权
标题翻译：聚合物，耐腐蚀组合物和方法
公开(公告)号：US20110177455A1
公开(公告)日：2011-07-21
申请号：US13006598
申请日：2011-01-14
申请人： Yuji HARADA , Takeru Watanabe , Takeshi Sasami , Yuuki Suka , Koji Hasegawa
发明人： Yuji HARADA , Takeru Watanabe , Takeshi Sasami , Yuuki Suka , Koji Hasegawa
IPC分类号： G03F7/004 , C08F14/18 , C08F18/20 , G03F7/20
CPC分类号： C08F14/18 , C08F220/28 , G03F7/0046 , G03F7/0395 , G03F7/0397 , G03F7/11 , G03F7/2041 , C08F2/00 , C08F220/24
摘要： A polymer comprising recurring units of formula (1) and having a solubility in alkaline developer which increases under the action of an alkaline developer is provided. The polymer has transparency to radiation of up to 200 nm and improved water repellency, water slip, acid lability and hydrolysis and is useful as an additive polymer to formulate a resist composition. R1 is H, F, methyl, or trifluoromethyl, R2 is a monovalent fluorinated hydrocarbon group, An is a (n+1)-valent hydrocarbon or fluorinated hydrocarbon group, and n is 1, 2 or 3.
摘要翻译：提供了包含式（1）的重复单元并且在碱性显影剂中具有在碱性显影剂的作用下增加的溶解度的聚合物。该聚合物对于高达200nm的辐射具有透明性，并且具有改善的防水性，水滑性，酸性和水解性，并且可用作配制抗蚀剂组合物的添加剂聚合物。 R1为H，F，甲基或三氟甲基，R2为单价氟化烃基，An为（n + 1）价烃基或氟化烃基，n为1,2或3。

94. 发明授权

US07981589B2 Fluorinated monomer, fluorinated polymer, resist composition and patterning process 有权
标题翻译：氟化单体，含氟聚合物，抗蚀剂组合物和图案化工艺
公开(公告)号：US07981589B2
公开(公告)日：2011-07-19
申请号：US12146375
申请日：2008-06-25
申请人： Koji Hasegawa , Takeshi Kinsho , Katsuhiro Kobayashi , Tsunehiro Nishi , Takeru Watanabe
发明人： Koji Hasegawa , Takeshi Kinsho , Katsuhiro Kobayashi , Tsunehiro Nishi , Takeru Watanabe
IPC分类号： G03F7/004 , C08F32/04 , C08F32/08
CPC分类号： C07C69/67 , C07C69/753 , C07C2601/08 , C07C2602/42 , C08F220/24 , C08F220/26 , C08F232/08 , G03F7/0046 , G03F7/0397 , G03F7/2041 , Y10S430/108 , Y10S430/111
摘要： Fluorinated monomers of formula (1) are useful in producing polymers for the formulation of radiation-sensitive resist compositions. R1 is H or monovalent C1-C20 hydrocarbon group, R2 is H, F, methyl or trifluoromethyl, R3 and R4 are H or a monovalent C1-C8 hydrocarbon group, or R3 and R4 may form an aliphatic hydrocarbon ring, and A is a divalent C1-C6 hydrocarbon group
摘要翻译：式（1）的氟化单体可用于制备用于制备辐射敏感抗蚀剂组合物的聚合物。 R1是H或一价C1-C20烃基，R2是H，F，甲基或三氟甲基，R3和R4是H或一价C1-C8烃基，或R3和R4可以形成脂族烃环，A是二价C1-C6烃基

95. 发明授权

US07758717B2 Wafer treating apparatus 失效
标题翻译：晶圆处理装置
公开(公告)号：US07758717B2
公开(公告)日：2010-07-20
申请号：US11362635
申请日：2006-02-27
申请人： Koji Hasegawa , Akira Morita , Kenichiro Arai
发明人： Koji Hasegawa , Akira Morita , Kenichiro Arai
IPC分类号： C23F1/00
CPC分类号： H01L21/68757
摘要： On a hot plate, jigs and wafers are joined by bonding wax. A first transport mechanism, a posture change mechanism, a pusher and a second transport mechanism transport the jigs joined with the wafers from the hot plate to a treating transport mechanism. The treating transport mechanism immerses the jigs joined with the wafers in a treating solution stored in a treating tank. Thus, the wafers may be thinned, or otherwise treated, without a turn table directly contacting and damaging the wafers as in the prior art.
摘要翻译：在热板上，通过粘结蜡将夹具和晶片接合。第一传送机构，姿势改变机构，推动器和第二传送机构将与晶片接合的夹具从热板传送到处理传送机构。处理传送机构将与晶片接合的夹具浸入存储在处理槽中的处理溶液中。因此，如现有技术那样，晶片可以变薄或以其他方式处理，而没有转台直接接触和损坏晶片。

96. 发明申请

US20090246694A1 NOVEL PHOTOACID GENERATOR, RESIST COMPOSITION, AND PATTERNING PROCESS 有权
标题翻译：新型光电发生器，电阻组合和图案处理
公开(公告)号：US20090246694A1
公开(公告)日：2009-10-01
申请号：US12410357
申请日：2009-03-24
申请人： Youichi Ohsawa , Takeshi Kinsho , Koji Hasegawa , Masaki Ohashi
发明人： Youichi Ohsawa , Takeshi Kinsho , Koji Hasegawa , Masaki Ohashi
IPC分类号： G03F7/20 , C07C69/007 , G03F7/004
CPC分类号： G03F7/0045 , C07C25/18 , C07C309/12 , C07C381/12 , C07C2601/14 , C07C2602/42 , C07D333/46 , C07D493/08 , C07D493/18 , C08K5/42 , G03F7/0046 , G03F7/0382 , G03F7/0392 , G03F7/0395 , G03F7/0397 , G03F7/2041 , Y10S430/111
摘要： Photoacid generators generate sulfonic acids of formula (1a) upon exposure to high-energy radiation. ROC(═O)R1—COOCH2CF2SO3−H+ (1a) RO is OH or C1-C20 organoxy, R1 is a divalent C1-C20 aliphatic group or forms a cyclic structure with RO. The photoacid generators are compatible with resins and can control acid diffusion and are thus suited for use in chemically amplified resist compositions.
摘要翻译：光生酸发生剂在暴露于高能量辐射时产生式（1a）的磺酸。 <？in-line-formula description =“In-line Formulas”end =“lead”？> ROC（-O）R1-COOCH2CF2SO3-H +（1a）<？in-line-formula description =“In-line Formulas 末端=“尾”→RO是OH或C1-C20有机氧基，R1是二价C1-C20脂族基团或与RO形成环状结构。光致酸产生剂与树脂相容并且可以控制酸扩散，因此适用于化学增幅抗蚀剂组合物。

97. 发明授权

US07531289B2 Fluorinated monomer having cyclic structure, manufacturing method, polymer, photoresist composition and patterning process 有权
标题翻译：具有环状结构的氟化单体，制造方法，聚合物，光致抗蚀剂组合物和图案化工艺
公开(公告)号：US07531289B2
公开(公告)日：2009-05-12
申请号：US11258894
申请日：2005-10-27
申请人： Takeshi Kinsho , Takeru Watanabe , Masaki Ohashi , Koji Hasegawa , Seiichiro Tachibana
发明人： Takeshi Kinsho , Takeru Watanabe , Masaki Ohashi , Koji Hasegawa , Seiichiro Tachibana
IPC分类号： G03F7/039 , C08F18/20 , C07D315/00
CPC分类号： G03F7/0395 , C07D307/20 , C07D309/10 , C07D319/06 , C07D319/08 , C08F220/18 , C08F220/24 , G03F7/0046 , G03F7/0397
摘要： Cyclic structure-bearing fluorinated monomers having formula (1) wherein Z is a divalent organic group containing a polymerizable unsaturated group are useful to produce polymers for the manufacture of radiation-sensitive resist compositions which are fully transparent to radiation having a wavelength of up to 300 nm and have improved development properties.
摘要翻译：具有式（1）的带有结构式的氟化单体，其中Z是含有可聚合不饱和基团的二价有机基团，可用于制备用于制造辐射敏感性抗蚀剂组合物的聚合物，其对波长高达300nm的辐射是完全透明的 nm，具有改善的显影性能。

98. 发明申请

US20080271668A1 Coating Apparatus 审中-公开
标题翻译：涂装设备
公开(公告)号：US20080271668A1
公开(公告)日：2008-11-06
申请号：US11547702
申请日：2004-07-23
申请人： Koji Hasegawa , Yuichi Nakano , Hiroshi Matsuura
发明人： Koji Hasegawa , Yuichi Nakano , Hiroshi Matsuura
IPC分类号： B05C3/08
CPC分类号： B05B13/0257 , B01J2/12 , B05B16/60
摘要： A protrusion (21b) is formed on a central region of an inner surface (21c) of a first disc plate (21) constituting an end on an inclined lower side of a rotating drum (2). Particles (11) in the vicinity of the other end (first disc plate (21)), which are lifted forward in a rotational direction as the rotation drum (2) rotates, are brought into contact with a surface of the protrusion (21b) when the particles (11) flow backward in the rotational direction due to their own weights. Then, the particles (11) are guided by the surface of the protrusion (21b) to thereby flow toward the inclined upper side. As a result, a stagnation phenomenon of the particles (11) in the vicinity of the other end (first disc plate (21)) is less likely to occur.
摘要翻译：在构成旋转鼓（2）的倾斜下侧的端部的第一盘片（21）的内表面（21c）的中心区域上形成有突起（21b）。与旋转鼓（2）旋转时沿旋转方向向前提升的另一端（第一盘板（21））附近的粒子（11）与突起（21b）的表面接触）当颗粒（11）由于其自身重量而在旋转方向上向后流动时。然后，颗粒（11）被突起（21b）的表面引导，从而流向倾斜的上侧。结果，不太可能发生在另一端（第一盘片（21））附近的颗粒（11）的停滞现象。

99. 发明授权

US07276324B2 Nitrogen-containing organic compound, resist composition and patterning process 有权
标题翻译：含氮有机化合物，抗蚀剂组合物和图案化工艺
公开(公告)号：US07276324B2
公开(公告)日：2007-10-02
申请号：US10984933
申请日：2004-11-10
申请人： Takeru Watanabe , Takeshi Kinsho , Koji Hasegawa , Katsuya Takemura , Kazumi Noda , Katsuhiro Kobayashi
发明人： Takeru Watanabe , Takeshi Kinsho , Koji Hasegawa , Katsuya Takemura , Kazumi Noda , Katsuhiro Kobayashi
IPC分类号： G03C1/73 , G03F7/038 , G03F7/039 , G03F7/20 , G03F7/30
CPC分类号： G03F7/0392 , G03F7/0045 , G03F7/0382
摘要： Chemically amplified resist compositions comprising nitrogen-containing organic compounds having an aromatic carboxylic acid ester structure have an excellent resolution and provide a precise pattern profile and are useful in microfabrication using electron beams or deep-UV light.
摘要翻译：包含具有芳族羧酸酯结构的含氮有机化合物的化学扩增抗蚀剂组合物具有优异的分辨率并提供精确的图案轮廓，并且可用于使用电子束或深紫外光的微细加工。

100. 发明申请

US20070218402A1 Fluorine-containing silicon compounds, silicone resins, resist compositions, and patterning process 有权
标题翻译：含氟硅化合物，硅树脂，抗蚀剂组合物和图案化工艺
公开(公告)号：US20070218402A1
公开(公告)日：2007-09-20
申请号：US11713709
申请日：2007-03-05
申请人： Takeshi Kinsho , Mutsuo Nakashima , Koji Hasegawa , Takeru Watanabe
发明人： Takeshi Kinsho , Mutsuo Nakashima , Koji Hasegawa , Takeru Watanabe
IPC分类号： G03C1/00
CPC分类号： G03F7/0757 , C07F7/1804 , G03F7/0045 , G03F7/0046 , Y10S430/106 , Y10S430/108
摘要： Fluorine-containing silicon compounds having the general formula (1): wherein X1, X2, and X3 each are hydrogen, hydroxyl, halogen, a straight, branched or cyclic alkoxy group of 1 to 6 carbon atoms, or a monovalent organic group of 1 to 20 carbon atoms having a straight, branched, cyclic or polycyclic skeleton, Y is a divalent organic group, R1 and R2 are each independently hydrogen or a monovalent organic group of 1 to 20 carbon atoms having a straight, branched, cyclic or polycyclic skeleton, or R1 and R2 may bond together to form a ring with the carbon atom to which they are attached silicone resins obtained from the compounds of formula (1) has an appropriate acidity to enable formation of a finer pattern while minimizing the pattern collapse by swelling when used in a resist composition.
摘要翻译：具有通式（1）的含氟硅化合物：其中X 1，X 2和X 3各自为氢，羟基，卤素，1〜6个碳原子的直链，支链或环状烷氧基，或具有直链，支链，环状或多环骨架的1〜20个碳原子的一价有机基团，Y为二价有机基团， 1和R 2各自独立地为氢或具有直链，支链，环状或多环骨架的1至20个碳原子的一价有机基团，或R 1 >和R 2可以键合在一起形成与它们所连接的碳原子形成的环，由式（1）化合物获得的有机硅树脂具有适当的酸度以使得能够形成更精细的图案，同时当在抗蚀剂组合物中使用时，通过溶胀使图案崩溃最小化。

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