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    • 93. 发明授权
    • Method for production of multi-layered epitaxially grown crystal and apparatus therefor
    • 生产多层外延生长晶体的方法及其设备
    • US06273946B1
    • 2001-08-14
    • US08050078
    • 1993-05-05
    • Kazuhiro KurataHajime NakamuraHiroshi Tomida
    • Kazuhiro KurataHajime NakamuraHiroshi Tomida
    • C30B1906
    • C30B19/064
    • A used melt receptacle 40, a holder 60 for the alignment of crystalline substrates and a melt receptacle 20 are piled up in this order along a vertically extending central axis. A plurality of melt reservoirs 21a to 21d for different kinds of melts are disposed in the melt receptacle 20 concentrically about the central axis, while a plurality of used melt reservoirs are disposed in the used melt receptacle 40 in the same way. The supply of each melt from the corresponding melt reservoir 21a to 21d to the receiving cavity 63 of the holder 60 is changed by a cover 65, in which a melt supply hole 66 is formed, rotatable together with the holder 60. The melt used for crystal growth is discharged from the holder 60 to the used melt receptacle 40 through a cover 42 having used melt dropping holes 43a to 43d. Since the melt fills the receiving cavity 63 while partially remaining in the corresponding melt reservoir 21a to 21d, neither oxide films nor microcrystals are introduced into the receiving cavity 63. Hereby, a multi-layered crystal grows on the surface of each crystalline substrate without the harmful influence of the oxide films and the microcrystals.
    • 使用的熔体容器40,用于对准结晶衬底的保持器60和熔体容器20沿着垂直延伸的中心轴依次堆积。 用于不同种类的熔体的多个熔体储存器21a至21d在熔体容器20中围绕中心轴线同心地设置,而多个使用的熔体储存器以相同的方式设置在所使用的熔体容器40中。 通过其中形成有熔体供给孔66的盖65与保持器60一起旋转,将来自相应的熔体储存器21a至21d的每个熔体的供应改变为保持器60的容纳腔63。 晶体生长通过具有使用的熔滴点孔43a至43d的盖42从保持器60排出到使用的熔体容器40。 由于熔体填充接收腔63而部分保留在相应的熔体储存器21a至21d中,所以氧化物膜和微晶都不会被引入到容纳腔63中。因此,多层晶体在每个晶体衬底的表面上生长, 氧化膜和微晶的有害影响。
    • 95. 发明授权
    • Integrated circuit with exterior gain control adjustment
    • 具有外部增益控制调整的集成电路
    • US5402249A
    • 1995-03-28
    • US124195
    • 1993-09-21
    • Junichi KosekiHajime NakamuraJun Sakakibara
    • Junichi KosekiHajime NakamuraJun Sakakibara
    • H04N1/028H04N1/407H04N5/16H04N5/30H04N1/40
    • H04N1/4076
    • An integrated circuit for processing an analog image signal obtained from a CCD, etc. and converting the processed image signal to a digital image signal. The integrated circuit includes a circuit for adjusting an offset voltage included in the analog image signal, a circuit for sampling/holding the image signal from the adjusting circuit, a variable amplifier for varying an amplitude of the image signal output from the sampling/holding circuit, an analog/digital converter for converting the image signal from the variable amplifier to a digital signal, and a circuit for detecting a DC component included in the digital image signal and providing the detection result to the adjusting circuit. Correction of a DC voltage component of the analog image signal and amplitude adjustment of the analog image signal can be performed by using a single LSI, and the LSI can be connected to various types of CCDs without using an additional circuit.
    • 一种用于处理从CCD等获得的模拟图像信号的集成电路,并将经处理的图像信号转换为数字图像信号。 集成电路包括用于调整模拟图像信号中包括的偏移电压的电路,用于对来自调节电路的图像信号进行采样/保持的电路,用于改变从采样/保持电路输出的图像信号的幅度的可变放大器 ,用于将来自可变放大器的图像信号转换为数字信号的模拟/数字转换器,以及用于检测数字图像信号中包括的DC分量并将调整电路提供检测结果的电路。 模拟图像信号的DC电压分量的校正和模拟图像信号的幅度调整可以通过使用单个LSI来执行,并且可以在不使用附加电路的情况下将LSI连接到各种类型的CCD。
    • 97. 发明授权
    • X-ray optical apparatus
    • X射线光学装置
    • US5119411A
    • 1992-06-02
    • US632941
    • 1990-12-24
    • Hajime Nakamura
    • Hajime Nakamura
    • G21K1/06G01Q30/04G21K7/00
    • G21K7/00
    • An X-ray optical apparatus comprises an X-ray optical system which is capable of projecting an enlarged sample image by soft X-rays and a visible optical system to observe the sample with a visible radiation. To enable simultaneous observation using both optical systems, the systems utilize a common objective zone plate. The objective zone plate includes a base plate having an opening at the center thereof to pass the soft X-rays which have passed through the sample and also having a visible radiation passing section to the outside of the opening. A zone plate is supported centrally on the base plate for converging soft X-rays which have passed through the sample and forming the sample image at a predetermined position. An eyepiece is provided in a position displaced from the X-ray optical axis to enable visual observation of the sample with the light passed through the visible radiation transmitting section of the objective zone plate.
    • X射线光学装置包括能够通过软X射线投影扩大的样本图像和可见光学系统的X射线光学系统,以用可见光辐射观察样品。 为了同时观察使用两个光学系统,该系统利用一个共同的目标区域板。 目标区域板包括基板,该基板在其中心具有开口,以通过已经通过样品的软X射线,并且还具有可见的辐射通过部分到开口的外部。 区域板被中心地支撑在基板上,用于会聚已经通过样品的软X射线并在预定位置形成样品图像。 目镜被设置在从X射线光轴偏移的位置,以便能够通过目标区域板的可见光辐射透射部分的光线目视观察样品。
    • 100. 发明授权
    • Dummy substrate, and start method of, retention/modification method of deposition condition, and stop method of deposition apparatus using same
    • 基质沉积,沉积条件的保留/修饰方法的启动方法,以及使用其的沉积设备的停止方法
    • US09011654B2
    • 2015-04-21
    • US12596303
    • 2008-04-16
    • Koji IshinoHajime NakamuraMayako MatsudaTakaaki ShindouYukio Kikuchi
    • Koji IshinoHajime NakamuraMayako MatsudaTakaaki ShindouYukio Kikuchi
    • C23C14/00C25B11/00C25B13/00C23C14/34C23C14/56
    • C23C14/34C23C14/564Y10T428/12361
    • This dummy substrate is for use in an inline reactive sputtering apparatus. The main unit thereof is made of a rectangular-plate-like frame structure in which an opening portion in a rectangular shape is formed in a metal plate in a similar shape. It is configured such that a contact portion of a carrier with the main unit is covered with the main unit. As a result, even while the sputtering apparatus is in operation, there is no possibility of the occurrence of undesirable situations such as glass cracking, making it possible to significantly increase the number of times the dummy substrate is used. Furthermore, the dummy substrate continues to cover the contact portion with the carrier. Thereby, it is possible to prevent deposition of a substance left in a sputter deposition chamber, especially a compound thin film, on the contact portion of the carrier with the substrate. Therefore, it is possible to prevent undesirable situations such as an abnormal discharge due to the deposition of the compound thin film. As a result of these, it is possible to start (activate) an apparatus that deposits a compound thin film by the sputtering method, retain and modify a deposition condition in the apparatus, and stop (deactivate) the apparatus in a shorter time, and more efficiently and at a lower cost than before.
    • 该虚拟衬底用于在线反应溅射装置中。 其主体由矩形板状框架结构制成,其中矩形形状的开口部分形成为类似形状的金属板。 其构造使得与主单元的承载件的接触部分被主单元覆盖。 结果,即使在溅射装置运行时,也不可能发生不希望的情况,如玻璃破裂,从而可以显着增加使用虚拟衬底的次数。 此外,虚设基板继续覆盖与载体的接触部分。 由此,可以防止残留在溅射沉积室,特别是复合薄膜中的物质沉积在载体与基板的接触部分上。 因此,可以防止由于复合薄膜的沉积而导致的异常放电等不良情况。 作为其结果,可以通过溅射法开始(激活)沉积复合薄膜的装置,保持和改变装置中的沉积条件,并且在较短的时间内停止(停用)装置,并且 更有效率,成本更低。