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91. 发明申请

US20050042140A1 Sensor for determining radiated energy and use thereof 审中-公开
标题翻译：用于确定辐射能的传感器及其用途
公开(公告)号：US20050042140A1
公开(公告)日：2005-02-24
申请号：US10482775
申请日：2002-07-02
申请人： Damian Fiolka
发明人： Damian Fiolka
IPC分类号： G01N21/33 , G01J1/48 , G03F7/20 , H01L21/027 , G01N33/00
CPC分类号： G03F7/70558 , G01J1/48 , Y10T436/206664
摘要： The invention relates to a sensor for determining the energy of radiation of a type that is capable of converting oxygen into ozone, and to a use of such a sensor. According to the invention, the sensor contains a measuring chamber (1) that can be transirradiated by the radiation and has a gas inlet (4) and a gas outlet (6), means (8) for feeding an oxygen containing gas (9) into the measuring chamber, via the gas inlet, and for discharging the gas via the gas outlet, one ozone sensor element (10) for measuring the ozone content of the gas (9a) located in the measuring chamber or discharged via the gas outlet, and evaluating means (12) for determining the radiant energy from the measured ozone content. The sensor can be used, for example, to determine radiant energy in an optical imaging system operating with the radiation. Use, for example, in microlithography projection exposure systems.
摘要翻译：本发明涉及一种用于确定能够将氧气转化为臭氧的类型的辐射能量的传感器以及这种传感器的使用。根据本发明，传感器包括可以通过辐射被辐照的测量室（1），并具有气体入口（4）和气体出口（6），用于供给含氧气体（9）的装置（8）通过气体入口进入测量室，并通过气体出口排放气体，一个臭氧传感器元件（10），用于测量位于测量室中的气体（9a）的臭氧含量或经由气体出口排放，以及用于从所测量的臭氧含量确定辐射能的评估装置（12）。例如，传感器可以用于确定利用辐射操作的光学成像系统中的辐射能。例如，在微光刻投影曝光系统中使用。

92. 发明授权

US09383544B2 Optical system for semiconductor lithography 有权
标题翻译：用于半导体光刻的光学系统
公开(公告)号：US09383544B2
公开(公告)日：2016-07-05
申请号：US13590509
申请日：2012-08-21
申请人： Frank Melzer , Yim-Bun Patrick Kwan , Stefan Xalter , Damian Fiolka
发明人： Frank Melzer , Yim-Bun Patrick Kwan , Stefan Xalter , Damian Fiolka
IPC分类号： G03B27/54 , G02B7/14 , G02B7/02 , G02B7/10 , G03F7/20
CPC分类号： G02B7/14 , G02B7/023 , G02B7/102 , G03F7/70108 , G03F7/70116 , G03F7/70825
摘要： An optical system for semiconductor lithography including a plurality of optical components, as well as related components and methods, are disclosed. The apparatus can include an optical component that can be moved by a distance along a straight line within a time of between 5 ms and 500 ms. The straight line can have a polar and azimuth angle of between 0° and 90°, and a distance between the straight line and an optical axis of the apparatus being less than a cross-sectional dimension of a projection exposure beam bundle of the projection exposure apparatus. The apparatus can also include a guide unit configured to guide the optical component. The apparatus can further include a drive unit configured to drive the optical component via drive forces so that torques generated by inertial forces of the optical component and of optional components concomitantly moved with the optical component, and the torques generated by the drive forces, which act on the guide unit, compensate for one another to less than 10%.
摘要翻译：公开了一种包括多个光学部件的半导体光刻用光学系统以及相关的部件和方法。该装置可以包括可以在5ms和500ms之间的时间内沿着直线移动一定距离的光学部件。直线可以具有在0°和90°之间的极坐标和方位角，并且设备的直线和光轴之间的距离小于投影曝光的投影曝光束束的横截面尺寸仪器。该装置还可以包括构造成引导光学部件的引导单元。该装置还可以包括驱动单元，该驱动单元经配置以经由驱动力驱动光学部件，使得由光学部件和可选部件的惯性力产生的转矩与光学部件同时移动，以及由驱动力产生的转矩，其作用在导向单元上相互补偿，小于10％。

93. 发明授权

US09063336B2 Optical element having a plurality of reflective facet elements 有权
标题翻译：具有多个反射小面元件的光学元件
公开(公告)号：US09063336B2
公开(公告)日：2015-06-23
申请号：US13486073
申请日：2012-06-01
申请人： Marc Kirch , Martin Endres , Damian Fiolka , Joachim Hartjes
发明人： Marc Kirch , Martin Endres , Damian Fiolka , Joachim Hartjes
IPC分类号： G03B27/68 , G03B27/54 , G03B27/72 , G02B26/08 , G02B5/09 , G02B7/182 , G02B27/09 , G03F7/20 , G02B5/08
CPC分类号： G02B26/0816 , G02B5/0891 , G02B5/09 , G02B7/1822 , G02B27/0927 , G02B27/0977 , G03F7/70075 , G03F7/70116
摘要： An optical element for use in an illumination optical unit of an EUV microlithography projection exposure apparatus includes a plurality of reflective facet elements. Each reflective facet element has at least one reflective surface. In this case, at least one facet element is arranged in a manner rotatable about a rotation axis. The rotation axis intersects the at least one reflective surface of the facet element. With such an optical element, it is possible to alter the direction and/or the intensity of at least part of the illumination radiation within the illumination optical unit in a simple manner.
摘要翻译：用于EUV微光刻投影曝光装置的照明光学单元的光学元件包括多个反射小面元件。每个反射小面元件具有至少一个反射表面。在这种情况下，以围绕旋转轴线旋转的方式布置至少一个小面元件。旋转轴与小面元件的至少一个反射表面相交。利用这种光学元件，可以以简单的方式改变照明光学单元内的照明辐射的至少一部分的方向和/或强度。

94. 发明授权

US08767181B2 Microlithographic exposure method as well as a projection exposure system for carrying out the method 有权
标题翻译：微光刻曝光方法以及用于实施该方法的投影曝光系统
公开(公告)号：US08767181B2
公开(公告)日：2014-07-01
申请号：US12946380
申请日：2010-11-15
申请人： Toralf Gruner , Daniel Kraehmer , Michael Totzeck , Johannes Wangler , Markus Brotsack , Nils Dieckmann , Aksel Goehnermeier , Markus Schwab , Damian Fiolka , Markus Zenzinger
发明人： Toralf Gruner , Daniel Kraehmer , Michael Totzeck , Johannes Wangler , Markus Brotsack , Nils Dieckmann , Aksel Goehnermeier , Markus Schwab , Damian Fiolka , Markus Zenzinger
IPC分类号： G03B27/72 , G03B27/54 , G03F7/20
CPC分类号： G03F7/70566 , G03F7/70108 , G03F7/70225 , G03F7/70308
摘要： In an exposure method for exposing a substrate which is arranged in the area of an image plane of a projection objective as well as in a projection exposure system for performing that method, output radiation directed at the substrate and having an output polarization state is produced. Through variable adjustment of the output polarization state with the aid of at least one polarization manipulation device, the output polarization state can be formed to approach a nominal output polarization state. The polarization manipulation can be performed in a control loop on the basis of polarization-optical measuring data.
摘要翻译：在用于曝光布置在投影物镜的像面的区域中的基板以及用于执行该方法的投影曝光系统中的曝光方法中，产生了指向基板并具有输出偏振态的输出辐射。通过借助于至少一个偏振操纵装置对输出偏振状态的可变调节，输出偏振状态可以形成为接近标称输出偏振状态。可以在基于偏振光学测量数据的控制回路中进行极化处理。

95. 发明授权

US08730455B2 Illumination system for a microlithographic projection exposure apparatus 有权
标题翻译：用于微光刻投影曝光装置的照明系统
公开(公告)号：US08730455B2
公开(公告)日：2014-05-20
申请号：US13181033
申请日：2011-07-12
申请人： Damian Fiolka , Manfred Maul , Axel Scholz , Markus Deguenther , Johannes Wangler , Vladimir Davydenko
发明人： Damian Fiolka , Manfred Maul , Axel Scholz , Markus Deguenther , Johannes Wangler , Vladimir Davydenko
IPC分类号： G03B27/54 , G03B27/72 , G03F7/20 , G03B27/68 , G03B27/42 , G03B27/52
CPC分类号： G03F7/7015 , G03B27/54 , G03F7/70075 , G03F7/70108
摘要： An illumination system for a microlithographic projection exposure step-and-scan apparatus has a light source, a first optical raster element and a second optical raster element. The first optical raster element extends in a first pupil plane of the illumination system and is designed such that the geometrical optical flux of the system is increased perpendicular to a scan direction of the projection exposure apparatus. The second optical raster element extends in a second pupil plane of the illumination system, which is not necessarily different from the first pupil plane, and is designed such that the geometrical optical flux of the system is increased in the scan direction and perpendicular thereto. This makes it possible to improve the irradiance uniformity in a reticle plane.
摘要翻译：用于微光刻投影曝光步进扫描装置的照明系统具有光源，第一光栅元件和第二光栅元件。第一光栅元件在照明系统的第一光瞳平面中延伸，并且被设计成使得系统的几何光通量垂直于投影曝光设备的扫描方向增加。第二光栅元件在照明系统的第二光瞳平面中延伸，其不一定与第一光瞳平面不同，并且被设计成使得系统的几何光通量在扫描方向上和垂直于其上增加。这使得可以提高掩模版平面中的辐照度均匀性。

96. 发明授权

US08625071B2 Optical system and method for characterising an optical system 有权
标题翻译：用于表征光学系统的光学系统和方法
公开(公告)号：US08625071B2
公开(公告)日：2014-01-07
申请号：US12778649
申请日：2010-05-12
申请人： Damian Fiolka
发明人： Damian Fiolka
IPC分类号： G03B27/32
CPC分类号： G03F7/7085 , G03F7/70133 , G03F7/70566
摘要： The disclosure provides an optical system and a method of characterising an optical system, such as in a microlithographic projection exposure apparatus. According to an aspect, an optical system having an optical axis (OA) includes a first element which is partially translucent for light of a working wavelength of the optical system. The first element has at least one partially reflecting first surface arranged rotated about a first axis of rotation in relation to a plane perpendicular to the optical axis (OA). The optical system also includes a second element in succession to the first element along the optical axis (OA). The second element is partially translucent for light of the working wavelength and has at least one partially reflecting second surface which is arranged rotated about a second axis of rotation in relation to a plane perpendicular to the optical axis (OA). The system further includes an intensity measuring device configured to measure the intensity of light reflected at the first surface and the intensity of light reflected at the second surface.
摘要翻译：本公开提供了一种光学系统和表征光学系统的方法，例如在微光刻投影曝光设备中。根据一个方面，具有光轴（OA）的光学系统包括对于光学系统的工作波长的光而部分半透明的第一元件。第一元件具有相对于垂直于光轴（OA）的平面围绕第一旋转轴线旋转的至少一个部分反射的第一表面。光学系统还包括沿着光轴（OA）连续地连接到第一元件的第二元件。第二元件对于工作波长的光是部分半透明的，并且具有至少一个部分反射的第二表面，该第二表面相对于垂直于光轴（OA）的平面围绕第二旋转轴线旋转。该系统还包括强度测量装置，其被配置为测量在第一表面处反射的光的强度和在第二表面处反射的光的强度。

97. 发明授权

US08542356B2 Measurement method and measurement system for measuring birefringence 有权
标题翻译：用于测量双折射的测量方法和测量系统
公开(公告)号：US08542356B2
公开(公告)日：2013-09-24
申请号：US13237000
申请日：2011-09-20
申请人： Damian Fiolka , Marc Rohe
发明人： Damian Fiolka , Marc Rohe
IPC分类号： G01J4/00
CPC分类号： G01N21/23 , G01M11/0257 , G03F7/70566 , G03F7/70591
摘要： A method measuring the birefringence of an object. A measurement beam having a defined input polarization state is generated, the measurement beam being directed onto the object. Polarization properties of the measurement beam after interaction with the object are detected in order to generate polarization measurement values representing an output polarization state of the measurement beam after interaction with the object. The input polarization state of the measurement beam is modulated into at least four different measurement states in accordance with a periodic modulation function of an angle parameter α, and the polarization measurement values associated with the at least four measurement states are processed to form a measurement function dependent on the angle parameter α. A two-wave portion of the measurement function is determined and analysed in order to derive at least one birefringence parameter describing the birefringence, preferably by double Fourier transformation of the measurement function.
摘要翻译：测量物体双折射的方法。产生具有确定的输入偏振状态的测量光束，测量光束被引导到物体上。检测与物体相互作用后的测量光束的极化特性，以便在与物体相互作用之后产生表示测量光束的输出偏振状态的偏振测量值。根据角度参数α的周期性调制函数将测量光束的输入偏振状态调制成至少四个不同的测量状态，并且处理与至少四个测量状态相关联的偏振测量值以形成测量功能取决于角度参数α。确定和分析测量功能的两波部分，以便优选地通过测量功能的双傅里叶变换来导出描述双折射的至少一个双折射参数。

98. 发明授权

US08480261B2 Filter device for the compensation of an asymmetric pupil illumination 有权
标题翻译：用于补偿不对称瞳孔照明的过滤装置
公开(公告)号：US08480261B2
公开(公告)日：2013-07-09
申请号：US13553005
申请日：2012-07-19
申请人： Manfred Maul , Damian Fiolka
发明人： Manfred Maul , Damian Fiolka
IPC分类号： F21V9/00 , G03B27/68
CPC分类号： G02B26/008 , G01J1/0488 , G02B27/0933 , G02B27/0994 , G03F7/70091 , G03F7/70191
摘要： The invention relates to a filter device for an illumination system, especially for the correction of the illumination of the illuminating pupil, including a light source, with the illumination system being passed through by a bundle of illuminating rays from the light source to an object plane, with the bundle of illuminating rays impinging upon the filter device, including at least one filter element which can be introduced into the beam path of the bundle of illuminating rays, with the filter element including an actuating device, so that the filter element can be brought with the help of the actuating device into the bundle of illuminating rays.
摘要翻译：本发明涉及一种用于照明系统的过滤装置，特别是用于校正包括光源的照明光瞳的照明，照明系统通过一束照明光线从光源穿过到物平面具有撞击在过滤装置上的一束照明光线，包括至少一个能够被引入照明光束的光束路径中的过滤元件，过滤元件包括致动装置，使得过滤元件可以是在致动装置的帮助下带入照明光束。

99. 发明授权

US08395753B2 Microlithographic projection exposure apparatus 有权
标题翻译：微光刻投影曝光装置
公开(公告)号：US08395753B2
公开(公告)日：2013-03-12
申请号：US12884485
申请日：2010-09-17
申请人： Damian Fiolka , Michael Totzeck , Alexandra Pazidis , Michael Ricker
发明人： Damian Fiolka , Michael Totzeck , Alexandra Pazidis , Michael Ricker
IPC分类号： G03B27/72 , G03B27/54
CPC分类号： G03F7/70083 , G03F7/70566
摘要： The disclosure relates to a microlithographic projection exposure apparatus, as well as related components and methods. In some embodiments, a microlithographic projection exposure apparatus includes an illumination system and a projection objective, where the illumination system can illuminate an object plane of the projection objective and the projection objective can produce the image of the object plane on an image plane. A polarization-dependent transmission can be produced in the illumination system such that, for at least one polarization distribution in respect of the light impinging on the object plane, a non-homogeneous intensity distribution in the object plane is obtained. The non-homogeneous intensity distribution can afford a homogeneous intensity distribution in the image plane by virtue of polarization-dependent transmission properties of the projection objective.
摘要翻译：本公开涉及微光刻投影曝光装置，以及相关的部件和方法。在一些实施例中，微光刻投影曝光装置包括照明系统和投影物镜，其中照明系统可照亮投影物镜的物平面，并且投影物镜可以在像平面上产生物平面的图像。可以在照明系统中产生偏振相关的透射，使得对于相对于物体平面上的光的至少一个偏振分布，获得物平面中的非均匀强度分布。非均匀强度分布可以通过投影物镜的偏振依赖透射特性在图像平面中提供均匀的强度分布。

100. 发明申请

US20120327385A1 OPTICAL SYSTEM FOR SEMICONDUCTOR LITHOGRAPHY 有权
标题翻译：用于半导体光刻的光学系统
公开(公告)号：US20120327385A1
公开(公告)日：2012-12-27
申请号：US13590509
申请日：2012-08-21
申请人： Frank Melzer , Yim-Bun Patrick Kwan , Stefan Xalter , Damian Fiolka
发明人： Frank Melzer , Yim-Bun Patrick Kwan , Stefan Xalter , Damian Fiolka
IPC分类号： G03B27/54
CPC分类号： G02B7/14 , G02B7/023 , G02B7/102 , G03F7/70108 , G03F7/70116 , G03F7/70825
摘要： Semiconductor lithography system includes a plurality of optical components, including an optical component movable a distance along a straight line within a time of between 5 ms and 500 ms. The straight line can have a polar and azimuth angle of between 0° and 90°, and a distance between the straight line and an optical axis of the apparatus being less than a cross-sectional dimension of a projection exposure beam bundle of the projection exposure apparatus. The apparatus can also include a guide unit configured to guide the optical component. The apparatus can further include a drive unit configured to drive the optical component via drive forces so that torques generated by inertial forces of the optical component and of optional components concomitantly moved with the optical component, and the torques generated by the drive forces, which act on the guide unit, compensate for one another to less than 10%.
摘要翻译：半导体光刻系统包括多个光学部件，包括在5ms和500ms之间的时间内沿着直线移动一定距离的光学部件。直线可以具有在0°和90°之间的极坐标和方位角，并且设备的直线和光轴之间的距离小于投影曝光的投影曝光束束的横截面尺寸仪器。该装置还可以包括构造成引导光学部件的引导单元。该装置还可以包括驱动单元，该驱动单元经配置以经由驱动力驱动光学部件，使得由光学部件和可选部件的惯性力产生的转矩与光学部件同时移动，以及由驱动力产生的转矩，其作用在导向单元上相互补偿，小于10％。

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