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91. 发明授权

US07764377B2 Spectrum based endpointing for chemical mechanical polishing 有权
标题翻译：基于光谱的化学机械抛光终点
公开(公告)号：US07764377B2
公开(公告)日：2010-07-27
申请号：US11213344
申请日：2005-08-26
申请人： Dominic J. Benvegnu , Jeffrey Drue David , Bogdan Swedek
发明人： Dominic J. Benvegnu , Jeffrey Drue David , Bogdan Swedek
IPC分类号： G01B11/00
CPC分类号： H01L22/26 , B24B37/013 , B24B37/205 , B24B49/08 , B24B49/12 , B24D7/14 , H01L21/30625 , H01L21/31053 , H01L21/31055 , H01L21/3212 , H01L21/67075 , H01L21/67092 , H01L21/67253
摘要： Methods and apparatus for spectrum-based endpointing. An endpointing method includes selecting a reference spectrum. The reference spectrum is a spectrum of white light reflected from a film of interest on a first substrate and has a thickness greater than a target thickness. The reference spectrum is empirically selected for particular spectrum-based endpoint determination logic so that the target thickness is achieved when endpoint is called by applying the particular spectrum-based endpoint logic. The method includes obtaining a current spectrum. The current spectrum is a spectrum of white light reflected from a film of interest on a second substrate when the film of interest is being subjected to a polishing step and has a current thickness that is greater than the target thickness. The method includes determining, for the second substrate, when an endpoint of the polishing step has been achieved. The determining is based on the reference and current spectra.
摘要翻译：用于基于频谱的终点的方法和装置。终点方法包括选择参考频谱。参考光谱是在第一衬底上从感兴趣的膜反射的白光的光谱，并且具有大于目标厚度的厚度。对于特定的基于频谱的端点确定逻辑，经验地选择参考频谱，使得当通过应用特定的基于频谱的端点逻辑来调用端点时实现目标厚度。该方法包括获得当前频谱。目前的光谱是当感兴趣的薄膜经受抛光步骤并且具有大于目标厚度的电流厚度时，在第二基板上从感兴趣的薄膜反射的白光的光谱。该方法包括为第二基底确定何时已经实现了抛光步骤的终点。该确定基于参考和当前光谱。

92. 发明授权

US07306507B2 Polishing pad assembly with glass or crystalline window 有权
标题翻译：带玻璃或结晶窗的抛光垫组件
公开(公告)号：US07306507B2
公开(公告)日：2007-12-11
申请号：US11213675
申请日：2005-08-26
申请人： Dominic J. Benvegnu , Jeffrey Drue David , Bogdan Swedek
发明人： Dominic J. Benvegnu , Jeffrey Drue David , Bogdan Swedek
IPC分类号： B24B51/00
CPC分类号： H01L22/26 , B24B37/013 , B24B37/205 , B24B49/08 , B24B49/12 , B24D7/14 , H01L21/30625 , H01L21/31053 , H01L21/31055 , H01L21/3212 , H01L21/67075 , H01L21/67092 , H01L21/67253
摘要： Methods and apparatus for providing a chemical mechanical polishing pad. The pad includes a polishing layer having a top surface and a bottom surface. The pad includes an aperture having a first opening in the top surface and a second opening in the bottom surface. The top surface is a polishing surface. The pad includes a window that includes a first portion made of soft plastic and a crystalline or glass like second portion. The window is transparent to white light. The window is situated in the aperture so that the first portion plugs the aperture and the second portion is on a bottom side of the first portion, wherein the first portion acts a slurry-tight barrier.
摘要翻译：用于提供化学机械抛光垫的方法和设备。衬垫包括具有顶表面和底表面的抛光层。垫包括在顶表面中具有第一开口和底表面中的第二开口的孔。顶面是抛光面。该垫包括一个窗，其包括由软塑料制成的第一部分和类似第二部分的晶体或玻璃。窗户对白光透明。窗口位于孔中，使得第一部分插入孔，并且第二部分在第一部分的底侧上，其中第一部分起浆料密封的屏障。

93. 发明授权

US09233450B2 Optical detection of metal layer clearance 有权
标题翻译：光学检测金属层间隙
公开(公告)号：US09233450B2
公开(公告)日：2016-01-12
申请号：US13584565
申请日：2012-08-13
申请人： Jeffrey Drue David , Dominic J. Benvegnu
发明人： Jeffrey Drue David , Dominic J. Benvegnu
IPC分类号： B24B37/013 , B24B37/04 , B24B49/12
CPC分类号： B24B37/013 , B24B37/042 , B24B49/12
摘要： A method of controlling polishing includes polishing a metal layer of a substrate. The metal layer overlies an underlying layer structure. During polishing of the metal layer, a light beam is directed onto the first substrate. The metal layer is sufficiently thin that a portion of the light beam reflects from an exposed surface of the metal layer and a portion of the light beam passes through the metal layer and reflects from the underlying layer structure to generate a reflected light beam. The reflected light beam is monitored during polishing and a sequence of measured spectra is generated from the reflected light beam. At least one of a polishing endpoint or an adjustment for a polishing rate is determined from the sequence of measured spectra.
摘要翻译：控制抛光的方法包括抛光衬底的金属层。金属层覆盖下层结构。在抛光金属层期间，将光束引导到第一基板上。金属层足够薄，使得一部分光束从金属层的暴露表面反射，并且光束的一部分穿过金属层并从下面的层结构反射以产生反射光束。在抛光期间监测反射光束，并从反射光束产生测量光谱序列。从测量光谱的顺序确定抛光终点或抛光速率的调整中的至少一个。

94. 发明授权

US08944884B2 Fitting of optical model to measured spectrum 有权
标题翻译：光学模型拟合到测量光谱
公开(公告)号：US08944884B2
公开(公告)日：2015-02-03
申请号：US13773063
申请日：2013-02-21
申请人： Jeffrey Drue David , Dominic J. Benvegnu
发明人： Jeffrey Drue David , Dominic J. Benvegnu
IPC分类号： B24B1/00 , B24B37/013 , B24B49/12
CPC分类号： B24B37/013 , B24B49/12
摘要： A method of controlling a polishing operation includes polishing a first layer of a substrate, during polishing, obtaining a sequence over time of measured spectra with an in-situ optical monitoring system, for each measured spectrum from the sequence of measured spectra, fitting an optical model to the measured spectrum, the fitting including finding parameters that provide a minimum difference between an output spectrum of the optical model and the measured spectrum, the parameters including an endpoint parameter and at least one non-endpoint parameter, the fitting generating a sequence of fitted endpoint parameter values, each endpoint parameter value of the sequence associated with one of the spectra of the sequence of measured spectra, and determining at least one of a polishing endpoint or an adjustment of a pressure to the substrate from the sequence of fitted endpoint parameter values.
摘要翻译：控制抛光操作的方法包括在抛光期间抛光衬底的第一层，利用原位光学监测系统根据测量光谱序列为每个测量光谱获得测量光谱的时间序列，所述拟合包括找到在所述光学模型的输出光谱与所述测量光谱之间提供最小差异的参数，所述参数包括端点参数和至少一个非端点参数，所述拟合生成序列拟合的端点参数值，与测量光谱序列的光谱之一相关联的序列的每个端点参数值，以及根据拟合的端点参数序列确定抛光终点或对衬底的压力的调整中的至少一个价值观。

95. 发明申请

US20130052916A1 Optical Detection of Metal Layer Clearance 有权
标题翻译：金属层清除光学检测
公开(公告)号：US20130052916A1
公开(公告)日：2013-02-28
申请号：US13584565
申请日：2012-08-13
申请人： Jeffrey Drue David , Dominic J. Benvegnu
发明人： Jeffrey Drue David , Dominic J. Benvegnu
IPC分类号： B24B49/12
CPC分类号： B24B37/013 , B24B37/042 , B24B49/12
摘要： A method of controlling polishing includes polishing a metal layer of a substrate. The metal layer overlies an underlying layer structure. During polishing of the metal layer, a light beam is directed onto the first substrate. The metal layer is sufficiently thin that a portion of the light beam reflects from an exposed surface of the metal layer and a portion of the light beam passes through the metal layer and reflects from the underlying layer structure to generate a reflected light beam. The reflected light beam is monitored during polishing and a sequence of measured spectra is generated from the reflected light beam. At least one of a polishing endpoint or an adjustment for a polishing rate is determined from the sequence of measured spectra.
摘要翻译：控制抛光的方法包括抛光衬底的金属层。金属层覆盖下层结构。在抛光金属层期间，将光束引导到第一基板上。金属层足够薄，使得一部分光束从金属层的暴露表面反射，并且光束的一部分穿过金属层并从下面的层结构反射以产生反射光束。在抛光期间监测反射光束，并从反射光束产生测量光谱序列。从测量光谱的顺序确定抛光终点或抛光速率的调整中的至少一个。

96. 发明授权

US07163437B1 System with sealed polishing pad 失效
标题翻译：系统带密封抛光垫
公开(公告)号：US07163437B1
公开(公告)日：2007-01-16
申请号：US11400079
申请日：2006-04-05
申请人： Bogdan Swedek , David J. Lischka , Jeffrey Drue David , Dominic J. Benvegnu
发明人： Bogdan Swedek , David J. Lischka , Jeffrey Drue David , Dominic J. Benvegnu
IPC分类号： B24B7/22
CPC分类号： B24B37/205 , B24D18/00
摘要： A polishing pad, polishing system, method of making a polishing pad and method of using a polishing pad. The polishing pad includes a polishing layer having a polishing surface, a backing layer with an aperture and a first portion that is permeable to liquid, and a sealant that penetrates a second portion of the backing layer adjacent to and surrounding the aperture such that the second portion is substantially impermeable to liquid. The aperture is positioned below a substantially fluid-impermeable element.
摘要翻译：抛光垫，抛光系统，制造抛光垫的方法和抛光垫的使用方法。抛光垫包括具有抛光表面的抛光层，具有孔的背衬层和可渗透液体的第一部分，以及密封剂，该密封剂穿透邻近并包围孔的背衬层的第二部分，使得第二部分对液体基本上是不可渗透的。孔被定位在基本上不透液体的元件之下。

97. 发明授权

US08892568B2 Building a library of spectra for optical monitoring 有权
标题翻译：建立光学监测光谱库
公开(公告)号：US08892568B2
公开(公告)日：2014-11-18
申请号：US13270137
申请日：2011-10-10
申请人： Jeffrey Drue David , Dominic J. Benvegnu , Xiaoyuan Hu
发明人： Jeffrey Drue David , Dominic J. Benvegnu , Xiaoyuan Hu
IPC分类号： G06F17/30 , H01L21/66 , B24B37/013 , B24B49/12 , H01L21/321
CPC分类号： H01L22/26 , B24B37/013 , B24B49/12 , H01L21/3212 , H01L22/12
摘要： A method of controlling polishing includes storing a library having a plurality of reference spectra, polishing a substrate, measuring a sequence of spectra of light from the substrate during polishing, for each measured spectrum of the sequence of spectra, finding a best matching reference spectrum using a matching technique other than sum of squared differences to generate a sequence of best matching reference spectra, and determining at least one of a polishing endpoint or an adjustment for a polishing rate based on the sequence of best matching reference spectra. Finding a best matching reference spectrum may include performing a cross-correlation of the measured spectrum with each of two or more of the plurality of reference spectra from the library and selecting a reference spectrum with the greatest correlation to the measured spectrum as a best matching reference spectrum.
摘要翻译：控制抛光的方法包括：存储具有多个参考光谱的库，抛光衬底，在抛光期间测量来自衬底的光的光谱序列，对于光谱序列的每个测量光谱，使用除了平方差的和以产生最佳匹配参考光谱的序列之外的匹配技术，以及基于最佳匹配参考光谱的序列来确定抛光终点或抛光速率的调整中的至少一个。找到最佳匹配的参考光谱可以包括执行所测量的光谱与来自文库的多个参考光谱中的两个或更多个的互相关，并且选择与所测量的光谱具有最大相关性的参考光谱作为最佳匹配参考光谱。

98. 发明申请

US20120278028A1 GENERATING MODEL BASED SPECTRA LIBRARY FOR POLISHING 审中-公开
标题翻译：用于抛光的基于模型的光谱图
公开(公告)号：US20120278028A1
公开(公告)日：2012-11-01
申请号：US13096777
申请日：2011-04-28
申请人： Jeffrey Drue David , Dominic J. Benvegnu , Xiaoyuan Hu
发明人： Jeffrey Drue David , Dominic J. Benvegnu , Xiaoyuan Hu
IPC分类号： G06F15/00
CPC分类号： B24B37/013 , B24B37/042 , B24B49/12 , G01N21/278 , G01N21/55 , G01N2021/8411
摘要： A method of generating a library of reference spectra, includes receiving a first spectrum representing a reflectance of a first stack of layers on a substrate, the first stack including a first dielectric layer, receiving a second spectrum representing a reflectance of a second stack layer on the substrate, the second stack including the first dielectric layer and a second dielectric layer that is not in the first stack, receiving user input identifying a plurality of different contribution percentages for at least one of the first stack or the second stack on the substrate, and for each contribution percentage from the plurality of different contribution percentages, calculating a reference spectrum from the first spectrum, the second spectrum and the contribution percentage.
摘要翻译：一种产生参考光谱库的方法，包括接收表示衬底上第一层叠层的反射率的第一光谱，第一堆叠包括第一介电层，接收表示第二堆叠层的反射率的第二光谱所述基板，所述第二堆叠包括所述第一介电层和不在所述第一堆叠中的第二介电层，接收用于识别所述基板上的所述第一堆叠或所述第二堆叠中的至少一个的多个不同贡献百分比的用户输入，并且对于来自多个不同贡献百分比的每个贡献百分比，从第一光谱，第二光谱和贡献百分比计算参考光谱。

99. 发明授权

US07938714B2 Polishing pad assembly with glass or crystalline window 有权
标题翻译：带玻璃或结晶窗的抛光垫组件
公开(公告)号：US07938714B2
公开(公告)日：2011-05-10
申请号：US12572100
申请日：2009-10-01
申请人： Dominic J. Benvegnu , Jeffrey Drue David , Bogdan Swedek
发明人： Dominic J. Benvegnu , Jeffrey Drue David , Bogdan Swedek
IPC分类号： B24B49/12
CPC分类号： H01L22/26 , B24B37/013 , B24B37/205 , B24B49/08 , B24B49/12 , B24D7/14 , H01L21/30625 , H01L21/31053 , H01L21/31055 , H01L21/3212 , H01L21/67075 , H01L21/67092 , H01L21/67253
摘要： Methods and apparatus for providing a chemical mechanical polishing pad. The pad includes a polishing layer having a top surface and a bottom surface. The pad includes an aperture having a first opening in the top surface and a second opening in the bottom surface. The top surface is a polishing surface. The pad includes a window that includes a first portion made of soft plastic and a crystalline or glass like second portion. The window is transparent to white light. The window is situated in the aperture so that the first portion plugs the aperture and the second portion is on a bottom side of the first portion, wherein the first portion acts a slurry-tight barrier.
摘要翻译：用于提供化学机械抛光垫的方法和设备。衬垫包括具有顶表面和底表面的抛光层。垫包括在顶表面中具有第一开口和底表面中的第二开口的孔。顶面是抛光面。该垫包括一个窗，其包括由软塑料制成的第一部分和类似第二部分的晶体或玻璃。窗户对白光透明。窗口位于孔中，使得第一部分插入孔，并且第二部分在第一部分的底侧上，其中第一部分起浆料密封的屏障。

100. 发明申请

US20130237128A1 FITTING OF OPTICAL MODEL TO MEASURED SPECTRUM 有权
标题翻译：将光学模型连接到测量光谱
公开(公告)号：US20130237128A1
公开(公告)日：2013-09-12
申请号：US13773063
申请日：2013-02-21
申请人： Jeffrey Drue David , Dominic J. Benvegnu
发明人： Jeffrey Drue David , Dominic J. Benvegnu
IPC分类号： B24B37/013 , B24B49/12
CPC分类号： B24B37/013 , B24B49/12
摘要： A method of controlling a polishing operation includes polishing a first layer of a substrate, during polishing, obtaining a sequence over time of measured spectra with an in-situ optical monitoring system, for each measured spectrum from the sequence of measured spectra, fitting an optical model to the measured spectrum, the fitting including finding parameters that provide a minimum difference between an output spectrum of the optical model and the measured spectrum, the parameters including an endpoint parameter and at least one non-endpoint parameter, the fitting generating a sequence of fitted endpoint parameter values, each endpoint parameter value of the sequence associated with one of the spectra of the sequence of measured spectra, and determining at least one of a polishing endpoint or an adjustment of a pressure to the substrate from the sequence of fitted endpoint parameter values.
摘要翻译：控制抛光操作的方法包括在抛光期间抛光衬底的第一层，利用原位光学监测系统根据测量光谱序列为每个测量光谱获得测量光谱的时间序列，所述拟合包括找到在所述光学模型的输出光谱与所述测量光谱之间提供最小差异的参数，所述参数包括端点参数和至少一个非端点参数，所述拟合生成序列拟合的端点参数值，与测量光谱序列的光谱之一相关联的序列的每个端点参数值，以及根据拟合的端点参数序列确定抛光终点或对衬底的压力的调整中的至少一个价值观。

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