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1. 发明授权

US07210980B2 Sealed polishing pad, system and methods 失效
标题翻译：密封抛光垫，系统和方法
公开(公告)号：US07210980B2
公开(公告)日：2007-05-01
申请号：US11213623
申请日：2005-08-26
申请人： Bogdan Swedek , David J. Lischka , Jeffrey Drue David , Dominic J. Benvegnu
发明人： Bogdan Swedek , David J. Lischka , Jeffrey Drue David , Dominic J. Benvegnu
IPC分类号： B24B7/22
CPC分类号： B24B37/205 , B24D18/00
摘要： A polishing pad, polishing system, method of making a polishing pad and method of using a polishing pad. The polishing pad includes a polishing layer having a polishing surface, a backing layer with an aperture and a first portion that is permeable to liquid, and a sealant that penetrates a second portion of the backing layer adjacent to and surrounding the aperture such that the second portion is substantially impermeable to liquid. The aperture is positioned below a substantially fluid-impermeable element.
摘要翻译：抛光垫，抛光系统，制造抛光垫的方法和抛光垫的使用方法。抛光垫包括具有抛光表面的抛光层，具有孔的背衬层和可渗透液体的第一部分，以及密封剂，该密封剂穿透邻近并包围孔的背衬层的第二部分，使得第二部分对液体基本上是不可渗透的。孔被定位在基本上不透液体的元件之下。

2. 发明授权

US07112119B1 Sealed polishing pad methods 失效
标题翻译：密封抛光垫方法
公开(公告)号：US07112119B1
公开(公告)日：2006-09-26
申请号：US11400416
申请日：2006-04-06
申请人： Bogdan Swedek , David J. Lischka , Jeffrey Drue David , Dominic J. Benvegnu
发明人： Bogdan Swedek , David J. Lischka , Jeffrey Drue David , Dominic J. Benvegnu
IPC分类号： B24B7/00
CPC分类号： B24B37/205 , B24D18/00
摘要： A polishing pad, polishing system, method of making a polishing pad and method of using a polishing pad. The polishing pad includes a polishing layer having a polishing surface, a backing layer with an aperture and a first portion that is permeable to liquid, and a sealant that penetrates a second portion of the backing layer adjacent to and surrounding the aperture such that the second portion is substantially impermeable to liquid. The aperture is positioned below a substantially fluid-impermeable element.
摘要翻译：抛光垫，抛光系统，制造抛光垫的方法和抛光垫的使用方法。抛光垫包括具有抛光表面的抛光层，具有孔的背衬层和可渗透液体的第一部分，以及密封剂，该密封剂穿透邻近并包围孔的背衬层的第二部分，使得第二部分对液体基本上是不可渗透的。孔被定位在基本上不透液体的元件之下。

3. 发明授权

US07163437B1 System with sealed polishing pad 失效
标题翻译：系统带密封抛光垫
公开(公告)号：US07163437B1
公开(公告)日：2007-01-16
申请号：US11400079
申请日：2006-04-05
申请人： Bogdan Swedek , David J. Lischka , Jeffrey Drue David , Dominic J. Benvegnu
发明人： Bogdan Swedek , David J. Lischka , Jeffrey Drue David , Dominic J. Benvegnu
IPC分类号： B24B7/22
CPC分类号： B24B37/205 , B24D18/00
摘要： A polishing pad, polishing system, method of making a polishing pad and method of using a polishing pad. The polishing pad includes a polishing layer having a polishing surface, a backing layer with an aperture and a first portion that is permeable to liquid, and a sealant that penetrates a second portion of the backing layer adjacent to and surrounding the aperture such that the second portion is substantially impermeable to liquid. The aperture is positioned below a substantially fluid-impermeable element.
摘要翻译：抛光垫，抛光系统，制造抛光垫的方法和抛光垫的使用方法。抛光垫包括具有抛光表面的抛光层，具有孔的背衬层和可渗透液体的第一部分，以及密封剂，该密封剂穿透邻近并包围孔的背衬层的第二部分，使得第二部分对液体基本上是不可渗透的。孔被定位在基本上不透液体的元件之下。

4. 发明申请

US20110209412A1 METHOD OF MAKING POLISHING PAD ASSEMBLY WITH GLASS OR CRYSTALLINE WINDOW 审中-公开
标题翻译：用玻璃或结晶窗制造抛光垫组件的方法
公开(公告)号：US20110209412A1
公开(公告)日：2011-09-01
申请号：US13103772
申请日：2011-05-09
申请人： Dominic J. Benvegnu , Jeffrey Drue David , Bogdan Swedek
发明人： Dominic J. Benvegnu , Jeffrey Drue David , Bogdan Swedek
IPC分类号： B24D7/12 , B24D18/00
CPC分类号： H01L22/26 , B24B37/013 , B24B37/205 , B24B49/08 , B24B49/12 , B24D7/14 , H01L21/30625 , H01L21/31053 , H01L21/31055 , H01L21/3212 , H01L21/67075 , H01L21/67092 , H01L21/67253
摘要： Methods and apparatus for providing a chemical mechanical polishing pad. The pad includes a polishing layer having a top surface and a bottom surface. The pad includes an aperture having a first opening in the top surface and a second opening in the bottom surface. The top surface is a polishing surface. The pad includes a window that includes a first portion made of soft plastic and a crystalline or glass like second portion. The window is transparent to white light. The window is situated in the aperture so that the first portion plugs the aperture and the second portion is on a bottom side of the first portion, wherein the first portion acts a slurry-tight barrier.
摘要翻译：用于提供化学机械抛光垫的方法和设备。衬垫包括具有顶表面和底表面的抛光层。垫包括在顶表面中具有第一开口和底表面中的第二开口的孔。顶面是抛光面。该垫包括一个窗，其包括由软塑料制成的第一部分和类似第二部分的晶体或玻璃。窗户对白光透明。窗口位于孔中，使得第一部分插入孔，并且第二部分在第一部分的底侧上，其中第一部分起浆料密封的屏障。

5. 发明授权

US07764377B2 Spectrum based endpointing for chemical mechanical polishing 有权
标题翻译：基于光谱的化学机械抛光终点
公开(公告)号：US07764377B2
公开(公告)日：2010-07-27
申请号：US11213344
申请日：2005-08-26
申请人： Dominic J. Benvegnu , Jeffrey Drue David , Bogdan Swedek
发明人： Dominic J. Benvegnu , Jeffrey Drue David , Bogdan Swedek
IPC分类号： G01B11/00
CPC分类号： H01L22/26 , B24B37/013 , B24B37/205 , B24B49/08 , B24B49/12 , B24D7/14 , H01L21/30625 , H01L21/31053 , H01L21/31055 , H01L21/3212 , H01L21/67075 , H01L21/67092 , H01L21/67253
摘要： Methods and apparatus for spectrum-based endpointing. An endpointing method includes selecting a reference spectrum. The reference spectrum is a spectrum of white light reflected from a film of interest on a first substrate and has a thickness greater than a target thickness. The reference spectrum is empirically selected for particular spectrum-based endpoint determination logic so that the target thickness is achieved when endpoint is called by applying the particular spectrum-based endpoint logic. The method includes obtaining a current spectrum. The current spectrum is a spectrum of white light reflected from a film of interest on a second substrate when the film of interest is being subjected to a polishing step and has a current thickness that is greater than the target thickness. The method includes determining, for the second substrate, when an endpoint of the polishing step has been achieved. The determining is based on the reference and current spectra.
摘要翻译：用于基于频谱的终点的方法和装置。终点方法包括选择参考频谱。参考光谱是在第一衬底上从感兴趣的膜反射的白光的光谱，并且具有大于目标厚度的厚度。对于特定的基于频谱的端点确定逻辑，经验地选择参考频谱，使得当通过应用特定的基于频谱的端点逻辑来调用端点时实现目标厚度。该方法包括获得当前频谱。目前的光谱是当感兴趣的薄膜经受抛光步骤并且具有大于目标厚度的电流厚度时，在第二基板上从感兴趣的薄膜反射的白光的光谱。该方法包括为第二基底确定何时已经实现了抛光步骤的终点。该确定基于参考和当前光谱。

6. 发明授权

US07306507B2 Polishing pad assembly with glass or crystalline window 有权
标题翻译：带玻璃或结晶窗的抛光垫组件
公开(公告)号：US07306507B2
公开(公告)日：2007-12-11
申请号：US11213675
申请日：2005-08-26
申请人： Dominic J. Benvegnu , Jeffrey Drue David , Bogdan Swedek
发明人： Dominic J. Benvegnu , Jeffrey Drue David , Bogdan Swedek
IPC分类号： B24B51/00
CPC分类号： H01L22/26 , B24B37/013 , B24B37/205 , B24B49/08 , B24B49/12 , B24D7/14 , H01L21/30625 , H01L21/31053 , H01L21/31055 , H01L21/3212 , H01L21/67075 , H01L21/67092 , H01L21/67253
摘要： Methods and apparatus for providing a chemical mechanical polishing pad. The pad includes a polishing layer having a top surface and a bottom surface. The pad includes an aperture having a first opening in the top surface and a second opening in the bottom surface. The top surface is a polishing surface. The pad includes a window that includes a first portion made of soft plastic and a crystalline or glass like second portion. The window is transparent to white light. The window is situated in the aperture so that the first portion plugs the aperture and the second portion is on a bottom side of the first portion, wherein the first portion acts a slurry-tight barrier.
摘要翻译：用于提供化学机械抛光垫的方法和设备。衬垫包括具有顶表面和底表面的抛光层。垫包括在顶表面中具有第一开口和底表面中的第二开口的孔。顶面是抛光面。该垫包括一个窗，其包括由软塑料制成的第一部分和类似第二部分的晶体或玻璃。窗户对白光透明。窗口位于孔中，使得第一部分插入孔，并且第二部分在第一部分的底侧上，其中第一部分起浆料密封的屏障。

7. 发明授权

US07938714B2 Polishing pad assembly with glass or crystalline window 有权
标题翻译：带玻璃或结晶窗的抛光垫组件
公开(公告)号：US07938714B2
公开(公告)日：2011-05-10
申请号：US12572100
申请日：2009-10-01
申请人： Dominic J. Benvegnu , Jeffrey Drue David , Bogdan Swedek
发明人： Dominic J. Benvegnu , Jeffrey Drue David , Bogdan Swedek
IPC分类号： B24B49/12
CPC分类号： H01L22/26 , B24B37/013 , B24B37/205 , B24B49/08 , B24B49/12 , B24D7/14 , H01L21/30625 , H01L21/31053 , H01L21/31055 , H01L21/3212 , H01L21/67075 , H01L21/67092 , H01L21/67253
摘要： Methods and apparatus for providing a chemical mechanical polishing pad. The pad includes a polishing layer having a top surface and a bottom surface. The pad includes an aperture having a first opening in the top surface and a second opening in the bottom surface. The top surface is a polishing surface. The pad includes a window that includes a first portion made of soft plastic and a crystalline or glass like second portion. The window is transparent to white light. The window is situated in the aperture so that the first portion plugs the aperture and the second portion is on a bottom side of the first portion, wherein the first portion acts a slurry-tight barrier.
摘要翻译：用于提供化学机械抛光垫的方法和设备。衬垫包括具有顶表面和底表面的抛光层。垫包括在顶表面中具有第一开口和底表面中的第二开口的孔。顶面是抛光面。该垫包括一个窗，其包括由软塑料制成的第一部分和类似第二部分的晶体或玻璃。窗户对白光透明。窗口位于孔中，使得第一部分插入孔，并且第二部分在第一部分的底侧上，其中第一部分起浆料密封的屏障。

8. 发明申请

US20100035519A1 REMOVABLE OPTICAL MONITORING SYSTEM FOR CHEMICAL MECHANICAL POLISHING 有权
标题翻译：可拆卸的化学机械抛光光学监测系统
公开(公告)号：US20100035519A1
公开(公告)日：2010-02-11
申请号：US12579245
申请日：2009-10-14
申请人： Dominic J. Benvegnu , Jeffrey Drue David , Bogdan Swedek
发明人： Dominic J. Benvegnu , Jeffrey Drue David , Bogdan Swedek
IPC分类号： B24B49/12
CPC分类号： H01L22/26 , B24B37/013 , B24B37/205 , B24B49/08 , B24B49/12 , B24D7/14 , H01L21/30625 , H01L21/31053 , H01L21/31055 , H01L21/3212 , H01L21/67075 , H01L21/67092 , H01L21/67253
摘要： A polishing system includes a platen having a top surface to receive a polishing pad, a recess in the top surface, and a cavity inside the platen spaced from the recess, a carrier head to hold a surface of a substrate against the polishing pad on the platen, a monitoring module located in the cavity, the monitoring module including a light source and a detector, an optical head removably mounted in the recess in the top surface platen, and an optical fiber having a proximate end coupled to the monitoring module and a distal end held by the optical head holding the distal end of the optical fiber in a position to direct light through a window in the polishing pad to the surface of the substrate and receive reflected light from the surface of the substrate.
摘要翻译：抛光系统包括具有顶表面以接收抛光垫的台板，顶表面中的凹部以及与凹部间隔开的压板内的空腔，用于将基板的表面保持在抛光垫上的载体头压板，位于空腔中的监测模块，监测模块包括光源和检测器，可拆卸地安装在顶表面压板中的凹部中的光学头，以及具有耦合到监测模块的近端的光纤和远端由保持光纤的远端的光学头保持在将光引导至抛光垫中的窗口的位置，并接收来自基板表面的反射光。

9. 发明授权

US07651385B2 Polishing system with optical head 有权
标题翻译：抛光系统带光头
公开(公告)号：US07651385B2
公开(公告)日：2010-01-26
申请号：US11894785
申请日：2007-08-20
申请人： Dominic J. Benvegnu , Jeffrey Drue David , Bogdan Swedek
发明人： Dominic J. Benvegnu , Jeffrey Drue David , Bogdan Swedek
IPC分类号： B24B49/00 , B24B51/00
CPC分类号： H01L22/26 , B24B37/013 , B24B37/205 , B24B49/08 , B24B49/12 , B24D7/14 , H01L21/30625 , H01L21/31053 , H01L21/31055 , H01L21/3212 , H01L21/67075 , H01L21/67092 , H01L21/67253
摘要： A polishing system includes a platen, a carrier head to hold a surface of a substrate against a polishing pad on the platen, a monitoring module including a light source and a detector, an optical fiber having a proximate end coupled to the monitoring module and a distal end, and an optical head removably mounted in the platen. The optical head holds the distal end of the optical fiber to direct light through a window in the polishing pad to the surface of the substrate and receive reflected light from the surface of the substrate, and the optical head is configured to adjust a distance from the distal end of the fiber to the window.
摘要翻译：抛光系统包括压板，用于将基板的表面保持在压板上的抛光垫上的载体头，包括光源和检测器的监测模块，具有耦合到监测模块的近端的光纤和远端，以及可拆卸地安装在压板中的光学头。光学头保持光纤的远端以将光引导到抛光垫中的窗口到达基板的表面，并接收来自基板表面的反射光，并且光学头被配置成调整距离纤维的末端到窗户。

10. 发明授权

US07614936B2 Spectrum based endpointing for chemical mechanical polishing 有权
标题翻译：基于光谱的化学机械抛光终点
公开(公告)号：US07614936B2
公开(公告)日：2009-11-10
申请号：US11747786
申请日：2007-05-11
申请人： Dominic J. Benvegnu , Jeffrey Drue David , Bogdan Swedek
发明人： Dominic J. Benvegnu , Jeffrey Drue David , Bogdan Swedek
IPC分类号： B24B1/00 , B24B49/00 , B24B51/00
CPC分类号： H01L22/26 , B24B37/013 , B24B37/205 , B24B49/08 , B24B49/12 , B24D7/14 , H01L21/30625 , H01L21/31053 , H01L21/31055 , H01L21/3212 , H01L21/67075 , H01L21/67092 , H01L21/67253
摘要： Methods and apparatus for providing a flushing system for flushing a top surface of an optical head. The flushing system includes a source of gas configured to provide a flow of gas, a delivery nozzle, a delivery line that connects the source of gas to the delivery nozzle, a vacuum source configured to provide a vacuum, a vacuum nozzle, and a vacuum line that connects the vacuum source to the vacuum nozzle. The source of gas and the delivery nozzle are configured to direct a flow of gas across the top surface of the optical head. The vacuum nozzle and vacuum sources are configured so that the flow if gas is laminar.
摘要翻译：用于提供用于冲洗光学头的顶表面的冲洗系统的方法和装置。冲洗系统包括构造成提供气体流的气体源，输送喷嘴，将气体源连接到输送喷嘴的输送管线，被配置为提供真空，真空喷嘴和真空的真空源将真空源连接到真空喷嘴。气体源和输送喷嘴构造成引导气流穿过光学头的顶表面。真空喷嘴和真空源被配置为使得气体是层流的流动。

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