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    • 4. 发明授权
    • MRAM including unit cell formed of one transistor and two magnetic tunnel junctions (MTJs) and method for fabricating the same
    • 包括由一个晶体管和两个磁性隧道结(MTJ)形成的晶胞的MRAM及其制造方法
    • US07195929B2
    • 2007-03-27
    • US11152346
    • 2005-06-15
    • Wan-jun ParkHyung-soon ShinSeung-jun Lee
    • Wan-jun ParkHyung-soon ShinSeung-jun Lee
    • H01L21/00
    • H01L27/228B82Y10/00G11C11/15G11C15/02
    • In an MRAM and method for fabricating the same, the MRAM includes a semiconductor substrate, a transistor formed on the semiconductor substrate, an interlayer dielectric formed on the semiconductor substrate to cover the transistor, and first and second MTJ cells formed in the interlayer dielectric to be coupled in parallel with a drain region of the transistor, wherein the first MTJ cell is coupled to a first bit line formed in the interlayer dielectric and the second MTJ cell is coupled to a second bit line formed in the interlayer dielectric, and wherein a data line is formed between the first MTJ cell and a gate electrode of the transistor to be perpendicular to the first bit line and the second bit line. The MRAM provides high integration density, sufficient sensing margin, high-speed operation and reduced noise, requires reduced current for recording data and eliminates a voltage offset.
    • 在MRAM及其制造方法中,MRAM包括半导体衬底,形成在半导体衬底上的晶体管,形成在半导体衬底上以覆盖晶体管的层间电介质,以及形成在层间电介质中的第一和第二MTJ单元, 与晶体管的漏极区域并联耦合,其中第一MTJ单元耦合到形成在层间电介质中的第一位线,并且第二MTJ单元耦合到形成在层间电介质中的第二位线,并且其中 在第一MTJ单元和晶体管的栅电极之间形成垂直于第一位线和第二位线的数据线。 MRAM提供高集成密度,足够的感测余量,高速操作和降低噪声,需要减少记录数据的电流并消除电压偏移。
    • 5. 发明授权
    • MRAM including unit cell formed of one transistor and two magnetic tunnel junctions (MTJS) and method for fabricating the same
    • MRAM包括由一个晶体管和两个磁性隧道结(MTJS)形成的晶胞及其制造方法
    • US06924520B2
    • 2005-08-02
    • US10759544
    • 2004-01-20
    • Wan-jun ParkHyung-soon ShinSeung-jun Lee
    • Wan-jun ParkHyung-soon ShinSeung-jun Lee
    • H01L27/105G11C11/15H01L21/8246H01L43/08H01L29/76
    • H01L27/228B82Y10/00G11C11/15G11C15/02
    • In an MRAM and method for fabricating the same, the MRAM includes a semiconductor substrate, a transistor formed on the semiconductor substrate, an interlayer dielectric formed on the semiconductor substrate to cover the transistor, and first and second MTJ cells formed in the interlayer dielectric to be coupled in parallel with a drain region of the transistor, wherein the first MTJ cell is coupled to a first bit line formed in the interlayer dielectric and the second MTJ cell is coupled to a second bit line formed in the interlayer dielectric, and wherein a data line is formed between the first MTJ cell and a gate electrode of the transistor to be perpendicular to the first bit line and the second bit line. The MRAM provides high integration density, sufficient sensing margin, high-speed operation and reduced noise, requires reduced current for recording data and eliminates a voltage offset.
    • 在MRAM及其制造方法中,MRAM包括半导体衬底,形成在半导体衬底上的晶体管,形成在半导体衬底上以覆盖晶体管的层间电介质,以及形成在层间电介质中的第一和第二MTJ单元, 与晶体管的漏极区域并联耦合,其中第一MTJ单元耦合到形成在层间电介质中的第一位线,并且第二MTJ单元耦合到形成在层间电介质中的第二位线,并且其中 在第一MTJ单元和晶体管的栅电极之间形成垂直于第一位线和第二位线的数据线。 MRAM提供高集成密度,足够的感测余量,高速操作和降低噪声,需要减少记录数据的电流并消除电压偏移。