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    • 1. 发明授权
    • Manufacturing apparatus and manufacturing method for semiconductor device
    • 半导体器件的制造装置及其制造方法
    • US06777355B2
    • 2004-08-17
    • US10718392
    • 2003-11-20
    • Toshiro KisakibaruIsao HonboriYasushi KatoToshikazu SuzukiHirohisa KoriyamaHayato IwamotoHitoshi Abe
    • Toshiro KisakibaruIsao HonboriYasushi KatoToshikazu SuzukiHirohisa KoriyamaHayato IwamotoHitoshi Abe
    • H01L2131
    • H01L21/67017Y10S438/907
    • A manufacturing apparatus for a semiconductor device comprises: a clean room for installing a plurality of semiconductor manufacturing and processing apparatuses; an external air cleaning device connected to a supply port of the clean room for supplying a cleaned-up outside air into the clean room; a common air duct section installed in the clean room; a first air cleaning and ventilating means connected to said common air duct section for cleaning and ventilating a part of the cleaned-up outside air to the common air duct section; individual air duct section branched off from the common air duct section and connected to each of said semiconductor manufacturing and processing apparatuses; and a second air cleaning and ventilating means interposed between the individual air duct section and each of the semiconductor manufacturing and processing apparatuses for cleaning and ventilating the air to be supplied to each of the semiconductor manufacturing and processing apparatuses.
    • 一种用于半导体器件的制造设备,包括:用于安装多个半导体制造和处理设备的洁净室; 连接到洁净室的供给口的外部空气净化装置,用于将净化后的外部空气供给到净化室内; 安装在洁净室内的通风道; 连接到所述公共空气管道部分的第一空气净化和通风装置,用于将一部分净化的外部空气清洁和通风到共用空气管道部分; 单独的空气管道部分从公共空气管道部分分支并连接到每个所述半导体制造和处理装置; 以及第二空气净化和通风装置,其插入在单独的空气管道部分和用于清洁和通风供给到每个半导体制造和处理设备的空气的每个半导体制造和处理设备之间。