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    • 6. 发明授权
    • Components for a film-forming device and method for cleaning the same
    • 用于成膜装置的部件及其清洁方法
    • US08216654B2
    • 2012-07-10
    • US10538856
    • 2004-02-18
    • Akisuke HirataShinji IsodaYutaka KadowakiKatsuhiko Mushiake
    • Akisuke HirataShinji IsodaYutaka KadowakiKatsuhiko Mushiake
    • B23B3/02
    • C23C14/564C23C14/0005C23C16/4401C23C16/4404C23C16/4407C23C30/00C23F13/00C25F5/00Y10T428/12139Y10T428/12569Y10T428/21Y10T428/252Y10T428/256
    • There are provided a film forming equipment component having a structure in which an deposited film d formed on the component can be separated from the component for a time period shorter than the prior art to reduce damage due to a cleaning fluid S, and a method of cleaning such a component. A metal film layer 2 electrochemically less noble than the matrix metal material 1 of the aforementioned component is formed on the surface of the matrix metal material 1 through thermal spraying, vapor depositing, sputtering, laminating or other process. Alternatively, a second metal film layer 3 electrochemically more noble than the aforementioned matrix metal material 1 is formed on the surface of the metal film layer 2 through said thermal spraying or other process. Thus, a local cell is formed between the metal film layer 2 and the matrix metal material 1 or the second metal film layer 3. Therefore, the deposited film d can be separated from the matrix metal material 1 for an extremely shortened time period, without damaging the matrix metal material 1 itself from the cleaning fluid S.
    • 提供了一种成膜设备部件,其具有这样一种结构,其中在组件上形成的沉积膜d可以比现有技术短的时间段与部件分离,以减少由清洗液S引起的损坏的方法 清洗这样一个组件。 通过热喷涂,气相沉积,溅射,层压或其它工艺在基体金属材料1的表面上形成电化学上比上述组分的基体金属材料1更不贵的金属膜层2。 或者,通过所述热喷涂或其它工艺在金属膜层2的表面上形成比上述基体金属材料1电化学更高的第二金属膜层3。 因此,在金属膜层2和基体金属材料1或第二金属膜层3之间形成局部电池。因此,沉积膜d可以在极短的时间内与基体金属材料1分离,而没有 从清洗液S破坏基质金属材料1本身。