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    • 3. 发明授权
    • Pixellated devices such as active matrix liquid crystal displays and methods of manufacturing such
    • 像素化器件如有源矩阵液晶显示器及其制造方法
    • US06773941B2
    • 2004-08-10
    • US10055377
    • 2002-01-22
    • Ian D. FrenchPieter J. Van der Zaag
    • Ian D. FrenchPieter J. Van der Zaag
    • H01L2100
    • H01L29/66765G02F1/13439G02F1/136286H01L27/124H01L27/1248H01L27/1288
    • A method for use in the fabrication of active plates for pixilated devices, such as active matrix liquid crystal displays, having pixel electrodes (38) and associated address lines (32) formed from a layer of transparent conductive material (53) through which the conductivity of the address lines is improved. The transparent conductive layer (53) and a metal layer (54) are deposited in succession and followed by a shielding layer (60), e.g. of photoresist, which is patterned into a configuration of regions (67,68,69) corresponding to the required pixel dielectrodes and address lines with a property of the layer at these respective regions being different. This enables the regions of this layer corresponding to the pixel electrodes to be selectively etched away, thereby allowing the metal at these regions to be selectively removed while leaving metal at the address lines. The method simplifies the production of low mask mount TFT active plates with improved address line conductivity.
    • 一种用于制造用于诸如有源矩阵液晶显示器的像素化器件的有源板的方法,所述有源矩阵液晶显示器具有由透明导电材料层(53)形成的像素电极(38)和相关联的地址线(32),通过该透明导电材料 的地址线被改善。 透明导电层(53)和金属层(54)依次沉积,然后是屏蔽层(60)。 的光刻胶,其被图案化成对应于所需像素电介质的区域(67,68,69)的配置,并且具有在这些相应区域处的层的性质不同的地址线。 这使得能够选择性地蚀刻掉与像素电极相对应的该层的区域,从而允许在这些区域处的金属被选择性地去除,同时在地址线处留下金属。 该方法简化了具有改进的地址线电导率的低掩模安装TFT有源板的生产。
    • 5. 发明授权
    • Pixellated device with the metal layer atop the address lines
    • 像素化设备,金属层位于地址线顶部
    • US07187422B2
    • 2007-03-06
    • US10853349
    • 2004-05-25
    • Ian D. FrenchPieter J. Van der Zaag
    • Ian D. FrenchPieter J. Van der Zaag
    • G02F1/136
    • H01L29/66765G02F1/13439G02F1/136286H01L27/124H01L27/1248H01L27/1288
    • A method for use in the fabrication of active plates for pixellated devices, such as active matrix liquid crystal displays, having pixel electrodes (38) and associated address lines (32) formed from a layer of transparent conductive material (53) through which the conductivity of the address lines is improved. The transparent conductive layer (53) and a metal layer (54) are deposited in succession and followed by a shielding layer (60), e.g. of photoresist, which is patterned into a configuration of regions (67,68,69) corresponding to the required pixel dielectrodes and address lines with a property of the layer at these respective regions being different. This enables the regions of this layer corresponding to the pixel electrodes to be selectively etched away, thereby allowing the metal at these regions to be selectively removed while leaving metal at the address lines.The method simplifies the production of low mask mount TFT active plates with improved address line conductivity.
    • 一种用于制造用于像素化器件(例如有源矩阵液晶显示器)的有源板的方法,其具有由透明导电材料(53)层形成的像素电极(38)和相关联的地址线(32),通过该透明导电材料 的地址线被改善。 透明导电层(53)和金属层(54)依次沉积,然后是屏蔽层(60)。 的光刻胶,其被图案化成对应于所需像素电介质的区域(67,68,69)的配置,并且具有在这些相应区域处的层的性质不同的地址线。 这使得能够选择性地蚀刻掉与像素电极相对应的该层的区域,从而允许在这些区域处的金属被选择性地去除,同时在地址线处留下金属。 该方法简化了具有改进的地址线电导率的低掩模安装TFT有源板的生产。
    • 7. 发明授权
    • Method of improving the conductivity of transparent conductor lines
    • 提高透明导线电导率的方法
    • US06750131B2
    • 2004-06-15
    • US10055356
    • 2002-01-22
    • Ian D. FrenchPieter J. Van der ZaagDaan L. De Kubber
    • Ian D. FrenchPieter J. Van der ZaagDaan L. De Kubber
    • H01L2144
    • G02F1/136286G02F2001/13629G02F2001/136295
    • A method of improving the electrical conductivity of transparent conducting lines (32) carried on a substrate (46), particularly address lines on the active plate for a pixellated device such as an active matrix liquid crystal display or the like fabricated using a low mask count process, involves forming the lines on the substrate from a deposited layer of transparent conducting material (53), e.g. ITO, and provided on their upper surface with a covering layer (72′) extending from at least one end (75) and partially covering the surface, and then performing an electroplating operation to plate the lines (80) with a plating potential being applied at that end. The covering layer (72′) assists in achieving a more uniform plated layer (80) along the length of the line. The covering layer preferably comprises photoresist defined by selective patterning and partial etching of a deposited photoresist layer (54) used for patterning the transparent layer (53). In a pixellated device, pixel electrodes (38) are also defined from the transparent layer.
    • 一种提高承载在基板(46)上的透明导电线(32)的导电性的方法,特别是使用低掩模计数制造的诸如有源矩阵液晶显示器等像素化器件的有源板上的地址线 包括在透明导电材料(53)的沉积层上在衬底上形成线,例如, ITO,并且在其上表面上设置有从至少一个端部(75)延伸并部分地覆盖该表面的覆盖层(72'),然后进行电镀操作以使施加电镀电位的线(80) 在那个时候 覆盖层(72')有助于沿着线的长度实现更均匀的镀层(80)。 覆盖层优选地包括通过选择性图案化和部分蚀刻用于图案化透明层(53)的沉积的光致抗蚀剂层(54)限定的光致抗蚀剂。 在像素化器件中,像素电极(38)也从透明层定义。