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1. 发明申请

US20070091968A1 Two-stage laser system for aligners 有权
标题翻译：对准器的两级激光系统
公开(公告)号：US20070091968A1
公开(公告)日：2007-04-26
申请号：US10554537
申请日：2004-04-16
申请人： Osamu Wakabayashi , Tatsuya Ariga , Takahito Kumazaki , Kotaro Sasano
发明人： Osamu Wakabayashi , Tatsuya Ariga , Takahito Kumazaki , Kotaro Sasano
IPC分类号： H01S3/22 , H01S3/093
CPC分类号： H01S3/2308 , G03F7/70025 , H01S3/083
摘要： The invention relates to a two-stage laser system well fit for semiconductor aligners, which is reduced in terms of spatial coherence while taking advantage of the high stability, high output efficiency and fine line width of the MOPO mode. The two-stage laser system for aligners comprises an oscillation-stage laser (50) and an amplification-stage laser (60). Oscillation laser light having divergence is used as the oscillation-stage laser (50), and the amplification-stage laser (60) comprises a Fabry-Perot etalon resonator made up of an input side mirror (1) and an output side mirror (2). The resonator is configured as a stable resonator.
摘要翻译：本发明涉及一种适用于半导体对准器的两级激光系统，其在利用MOPO模式的高稳定性，高输出效率和细线宽度的同时，在空间相干性方面被减少。用于对准器的两级激光系统包括振荡级激光器（50）和放大级激光器（60）。具有发散的振荡激光用作振荡级激光器（50），放大级激光器（60）包括由输入侧反射镜（1）和输出侧反射镜（2）构成的法布里 - 珀罗标准具共振器）。谐振器被配置为稳定谐振器。

2. 发明授权

US07957449B2 Two-stage laser system for aligners 有权
标题翻译：对准器的两级激光系统
公开(公告)号：US07957449B2
公开(公告)日：2011-06-07
申请号：US11566235
申请日：2006-12-03
申请人： Osamu Wakabayashi , Tatsuya Ariga , Takahito Kumazaki , Kotaro Sasano
发明人： Osamu Wakabayashi , Tatsuya Ariga , Takahito Kumazaki , Kotaro Sasano
IPC分类号： H01S3/083
CPC分类号： H01S3/2308 , G03F7/70025 , H01S3/083
摘要： The invention relates to a two-stage laser system well fit for semiconductor aligners, which is reduced in terms of spatial coherence while taking advantage of the high stability, high output efficiency and fine line width of the MOPO mode. The two-stage laser system for aligners comprises an oscillation-stage laser (50) and an amplification-stage laser (60). Oscillation laser light having divergence is used as the oscillation-stage laser (50), and the amplification-stage laser (60) comprises a Fabry-Perot etalon resonator made up of an input side mirror (1) and an output side mirror (2). The resonator is configured as a stable resonator.
摘要翻译：本发明涉及一种适用于半导体对准器的两级激光系统，其在利用MOPO模式的高稳定性，高输出效率和细线宽度的同时，在空间相干性方面被减少。用于对准器的两级激光系统包括振荡级激光器（50）和放大级激光器（60）。具有发散的振荡激光用作振荡级激光器（50），放大级激光器（60）包括由输入侧反射镜（1）和输出侧反射镜（2）构成的法布里 - 珀罗标准具共振器）。谐振器被配置为稳定谐振器。

3. 发明授权

US08817839B2 Two-stage laser system for aligners 有权
标题翻译：对准器的两级激光系统
公开(公告)号：US08817839B2
公开(公告)日：2014-08-26
申请号：US13468817
申请日：2012-05-10
申请人： Osamu Wakabayashi , Tatsuya Ariga , Takahito Kumazaki , Kotaro Sasano
发明人： Osamu Wakabayashi , Tatsuya Ariga , Takahito Kumazaki , Kotaro Sasano
IPC分类号： H01S3/083
CPC分类号： H01S3/2308 , G03F7/70025 , H01S3/083
摘要： The invention relates to a two-stage laser system well fit for semiconductor aligners, which is reduced in terms of spatial coherence while taking advantage of the high stability, high output efficiency and fine line width of the MOPO mode. The two-stage laser system for aligners comprises an oscillation-stage laser (50) and an amplification-stage laser (60). Oscillation laser light having divergence is used as the oscillation-stage laser (50), and the amplification-stage laser (60) comprises a Fabry-Perot etalon resonator made up of an input side mirror (1) and an output side mirror (2). The resonator is configured as a stable resonator.
摘要翻译：本发明涉及一种适用于半导体对准器的两级激光系统，其在利用MOPO模式的高稳定性，高输出效率和细线宽度的同时，在空间相干性方面被减少。用于对准器的两级激光系统包括振荡级激光器（50）和放大级激光器（60）。具有发散的振荡激光用作振荡级激光器（50），放大级激光器（60）包括由输入侧反射镜（1）和输出侧反射镜（2）构成的法布里 - 珀罗标准具共振器）。谐振器被配置为稳定谐振器。

4. 发明授权

US08116347B2 Two-stage laser system for aligners 有权
标题翻译：对准器的两级激光系统
公开(公告)号：US08116347B2
公开(公告)日：2012-02-14
申请号：US10554537
申请日：2004-04-16
申请人： Osamu Wakabayashi , Tatsuya Ariga , Takahito Kumazaki , Kotaro Sasano
发明人： Osamu Wakabayashi , Tatsuya Ariga , Takahito Kumazaki , Kotaro Sasano
IPC分类号： H01S3/22
CPC分类号： H01S3/2308 , G03F7/70025 , H01S3/083
摘要： The invention relates to a two-stage laser system well fit for semiconductor aligners, which is reduced in terms of spatial coherence while taking advantage of the high stability, high output efficiency and fine line width of the MOPO mode. The two-stage laser system for aligners comprises an oscillation-stage laser (50) and an amplification-stage laser (60). Oscillation laser light having divergence is used as the oscillation-stage laser (50), and the amplification-stage laser (60) comprises a Fabry-Perot etalon resonator made up of an input side mirror (1) and an output side mirror (2). The resonator is configured as a stable resonator.
摘要翻译：本发明涉及一种适用于半导体对准器的两级激光系统，其在利用MOPO模式的高稳定性，高输出效率和细线宽度的同时，在空间相干性方面被减少。用于对准器的两级激光系统包括振荡级激光器（50）和放大级激光器（60）。具有发散的振荡激光用作振荡级激光器（50），放大级激光器（60）包括由输入侧反射镜（1）和输出侧反射镜（2）构成的法布里 - 珀罗标准具共振器）。谐振器被配置为稳定谐振器。

5. 发明申请

US20110216800A1 TWO-STAGE LASER SYSTEM FOR ALIGNERS 审中-公开
标题翻译：对准器的两级激光系统
公开(公告)号：US20110216800A1
公开(公告)日：2011-09-08
申请号：US13107247
申请日：2011-05-13
申请人： Osamu WAKABAYASHI , Tatsuya Ariga , Takahito Kumazaki , Kotaro Sasano
发明人： Osamu WAKABAYASHI , Tatsuya Ariga , Takahito Kumazaki , Kotaro Sasano
IPC分类号： H01S5/50
CPC分类号： H01S3/2308 , G03F7/70025 , H01S3/083
摘要： The invention relates to a two-stage laser system well fit for semiconductor aligners, which is reduced in terms of spatial coherence while taking advantage of the high stability, high output efficiency and fine line width of the MOPO mode. The two-stage laser system for aligners comprises an oscillation-stage laser (50) and an amplification-stage laser (60). Oscillation laser light having divergence is used as the oscillation-stage laser (50), and the amplification-stage laser (60) comprises a Fabry-Perot etalon resonator made up of an input side mirror (1) and an output side mirror (2). The resonator is configured as a stable resonator.
摘要翻译：本发明涉及一种适用于半导体对准器的两级激光系统，其在利用MOPO模式的高稳定性，高输出效率和细线宽度的同时，在空间相干性方面被减少。用于对准器的两级激光系统包括振荡级激光器（50）和放大级激光器（60）。具有发散的振荡激光用作振荡级激光器（50），放大级激光器（60）包括由输入侧反射镜（1）和输出侧反射镜（2）构成的法布里 - 珀罗标准具共振器）。谐振器被配置为稳定谐振器。

6. 发明授权

US06785319B1 Ultraviolet laser device 有权
标题翻译：紫外线激光装置
公开(公告)号：US06785319B1
公开(公告)日：2004-08-31
申请号：US09926662
申请日：2002-02-07
申请人： Tatsuya Ariga , Takahito Kumazaki , Jun Akita , Noritoshi Itoh
发明人： Tatsuya Ariga , Takahito Kumazaki , Jun Akita , Noritoshi Itoh
IPC分类号： H01S308
CPC分类号： H01S3/03 , H01S3/08009 , H01S3/134 , H01S3/225
摘要： A narrow band ultraviolet laser device which can restrict a change in temperature gradient at light transmitting sections and maintain laser light at a high grade. To this end, the ultraviolet laser device includes light shielding elements (37A to 37C) having light transmitting sections (47A to 47C) each constituted by an opening for transmitting laser light (11), and light shielding sections (49A to 49C) that surround the light transmitting sections (47A to 47C), remove an undesired laser light (11A) from an optical path and shape the laser light (11) into a predetermined form, wherein heating means (45) for heating the light transmitting sections (47A to 47C) are provided in the vicinity of the light shielding elements (37A to 37C).
摘要翻译：窄带紫外线激光装置，能够限制透光部的温度梯度的变化，将激光维持在高档。为此，紫外线激光装置包括具有透光部（47A〜47C）的遮光元件（37A〜37C），各透光部由用于透射激光的开口（11）构成，遮光部（49A〜49C）光传输部分（47A至47C），从光路去除不需要的激光（11A）并将激光（11）形成预定形式，其中加热装置（45）用于加热光传输部分（47A至 47C）设置在遮光元件（37A〜37C）附近。

7. 发明授权

US08093571B2 Extreme ultraviolet light source device, laser light source device for extreme ultraviolet light source device and method for controlling saturable absorber used in extreme ultraviolet light source device 有权
标题翻译：极紫外光源装置，用于极紫外光源装置的激光光源装置及用于极紫外光源装置的可饱和吸收器的控制方法
公开(公告)号：US08093571B2
公开(公告)日：2012-01-10
申请号：US12566865
申请日：2009-09-25
申请人： Akira Endo , Krzysztof Nowak , Hideo Hoshino , Tatsuya Ariga , Masato Moriya , Osamu Wakabayashi
发明人： Akira Endo , Krzysztof Nowak , Hideo Hoshino , Tatsuya Ariga , Masato Moriya , Osamu Wakabayashi
IPC分类号： G02B26/02
CPC分类号： H05G2/003 , H01S3/005 , H01S3/0064 , H01S3/2316 , H05G2/008
摘要： An EUV light source of the present invention is capable of using a saturable absorber stably and continuously in a high heat load state. A saturable absorber (SA) device is disposed on a laser beam line to absorb feeble light, such as self-excited oscillation light, parasitic oscillation light or return light. SA gas from an SA gas cylinder and buffer gas from a buffer gas cylinder are mixed to be a mixed gas. The mixed gas is supplied to an SA gas cell via a supply pipeline, and absorbs the feeble light included in the laser beam. The mixed gas is exhausted via an exhaust pipeline, and is sent to a heat exchanger. The mixed gas, cooled down by a heat exchanger, is sent back to the SA gas cell by a circulation pump.
摘要翻译：本发明的EUV光源能够在高热负荷状态下稳定且连续地使用饱和吸收体。可饱和吸收体（SA）装置设置在激光束线上以吸收诸如自激振荡光，寄生振荡光或返回光的微弱光。来自SA气瓶的SA气体和来自缓冲气瓶的缓冲气体混合成混合气体。混合气体经由供给管路供给到SA气室，吸收激光束中包含的微弱光。混合气体通过排气管道排出，并被送到热交换器。由热交换器冷却的混合气体通过循环泵送回到SA气室。

8. 发明申请

US20060239309A1 Two-stage laser pulse energy control device and two-stage laser system 有权
标题翻译：两级激光脉冲能量控制装置和两级激光系统
公开(公告)号：US20060239309A1
公开(公告)日：2006-10-26
申请号：US10568091
申请日：2004-08-09
申请人： Tatsuya Ariga , Osamu Wakabayashi , Kouji Kakizaki
发明人： Tatsuya Ariga , Osamu Wakabayashi , Kouji Kakizaki
IPC分类号： H01S3/13 , H01S3/00 , H01S3/22 , H01S3/223
CPC分类号： G03F7/70041 , H01S3/097 , H01S3/09702 , H01S3/10007 , H01S3/104 , H01S3/1301 , H01S3/134
摘要： A charging voltage Vosc applied to a main capacitor C0 disposed in an oscillating high-voltage pulse generator 12 of an oscillating laser 100 is subject to constant control such that a pulse energy Posc of the oscillating laser 100 becomes a lower limit energy Es0 or more of an amplification saturation region. And, a charging voltage Vamp applied to a main capacitor C0 disposed in an amplifying high-voltage pulse generator 32 of an amplifying laser 300 is controlled, and pulse energy Pamp of the amplifying laser 300 is determined as target energy Patgt. Thus, the pulse energy of a two-stage laser is controlled to stabilize the pulse energy.
摘要翻译：施加到设置在振荡激光器100的振荡高电压脉冲发生器12中的主电容器C 0的充电电压Vosc受到恒定的控制，使得振荡激光器100的脉冲能量Posc成为下限能量Es 0或更多的是放大饱和区域。并且，控制施加到放大激光器300的放大高压脉冲发生器32中的主电容器C 0的充电电压Vamp，将放大激光器300的脉冲能量Pamp确定为目标能量Patgt。因此，控制两级激光器的脉冲能量以稳定脉冲能量。

9. 发明授权

US06879617B2 Two stage laser system 有权
标题翻译：两级激光系统
公开(公告)号：US06879617B2
公开(公告)日：2005-04-12
申请号：US10438737
申请日：2003-05-14
申请人： Tatsuya Ariga , Kyohei Seki , Osamu Wakabayashi
发明人： Tatsuya Ariga , Kyohei Seki , Osamu Wakabayashi
IPC分类号： H01S3/131 , H01S3/036 , H01S3/08 , H01S3/134 , H01S3/225 , H01S3/23 , H01S3/22
CPC分类号： H01S3/10092 , H01S3/036 , H01S3/08004 , H01S3/08009 , H01S3/08059 , H01S3/134 , H01S3/225 , H01S3/2258 , H01S3/2316
摘要： The present invention relates to a two stage laser system in which a desired spectral line width can be obtained at high output even when the integrated spectral characteristic of oscillator laser does not have the desired spectral line width, comprising an oscillator laser device 10 which has discharge electrodes 2 within a laser chamber 1 filled with laser gas containing F2 and emits laser beam which is band-narrowed by means of a band narrowing module 3 arranged in a laser resonator, and an amplifier laser device 20 which has discharge electrodes 2 within a laser chamber 1 filled with laser gas containing F2 and amplifies laser pulse injected from said oscillator laser device 10. In the system, a synchronous time interval having a predetermined spectral line width exists in laser pulse from the oscillator laser 10, and the system is set such that a discharge occurs in the amplifier laser 20 within the synchronous time interval.
摘要翻译：本发明涉及一种二阶段激光系统，其中即使当振荡器激光器的积分光谱特性不具有期望的谱线宽度时，也可以以高输出获得期望的谱线宽度，包括具有放电的振荡器激光装置10 在激光室1内的充满了含有F2的激光气体的激光器2内的电极2，并且发射通过设置在激光谐振器中的带窄化模块3而带宽化的激光束，以及在激光器内具有放电电极2的放大器激光装置20 室1充满含有F2的激光气体，并放大从所述振荡器激光装置10注入的激光脉冲。在该系统中，具有预定光谱线宽的同步时间间隔存在于来自振荡器激光器10的激光脉冲中，并且系统被设置为在同步时间间隔内在放大器激光器20中发生放电。

10. 发明授权

US08476609B2 Extreme ultraviolet light source device, laser light source device for extreme ultraviolet light source device, and method for controlling saturable absorber used in extreme ultraviolet light source device 有权
标题翻译：极紫外光源装置，用于极紫外光源装置的激光光源装置和用于极紫外光源装置的可饱和吸收器的控制方法
公开(公告)号：US08476609B2
公开(公告)日：2013-07-02
申请号：US13306358
申请日：2011-11-29
申请人： Akira Endo , Krzysztof Nowak , Hideo Hoshino , Tatsuya Ariga , Masato Moriya , Osamu Wakabayashi
发明人： Akira Endo , Krzysztof Nowak , Hideo Hoshino , Tatsuya Ariga , Masato Moriya , Osamu Wakabayashi
IPC分类号： G02B26/02
CPC分类号： H05G2/003 , H01S3/005 , H01S3/0064 , H01S3/2316 , H05G2/008
摘要： An EUV light source of the present invention is capable of using a saturable absorber stably and continuously in a high heat load state. A saturable absorber (SA) device is disposed on a laser beam line to absorb feeble light, such as self-excited oscillation light, parasitic oscillation light or return light. SA gas from an SA gas cylinder and buffer gas from a buffer gas cylinder are mixed to be a mixed gas. The mixed gas is supplied to an SA gas cell via a supply pipeline, and absorbs the feeble light included in the laser beam. The mixed gas is exhausted via an exhaust pipeline, and is sent to a heat exchanger. The mixed gas, cooled down by a heat exchanger, is sent back to the SA gas cell by a circulation pump.
摘要翻译：本发明的EUV光源能够在高热负荷状态下稳定且连续地使用饱和吸收体。可饱和吸收体（SA）装置设置在激光束线上以吸收诸如自激振荡光，寄生振荡光或返回光的微弱光。来自SA气瓶的SA气体和来自缓冲气瓶的缓冲气体混合成混合气体。混合气体经由供给管路供给到SA气室，吸收激光束中包含的微弱光。混合气体通过排气管道排出，并被送到热交换器。由热交换器冷却的混合气体通过循环泵送回到SA气室。

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