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    • 1. 发明授权
    • Compact camera module
    • 紧凑型相机模块
    • US07515202B2
    • 2009-04-07
    • US10812795
    • 2004-03-30
    • Masahiro SaitoSatoshi AjikiKazuhiro YaegashiYukihiro FurusawaHironori NakajoMichio Sasaki
    • Masahiro SaitoSatoshi AjikiKazuhiro YaegashiYukihiro FurusawaHironori NakajoMichio Sasaki
    • H04N5/225
    • G02B27/0006G02B7/022H04N5/2253H04N5/2254H04N5/2257H05K3/403
    • A compact camera module is disclosed that is capable of preventing adhesion of dust to an image pickup device in the compact camera module. The compact camera module includes a lens unit including a lens and a lens holder holding the lens therein and an image pickup unit attached to the lens unit. The image pickup unit includes a circuit board, an image pickup device on the circuit board, a cover member arranged on the circuit board to cover the image pickup device, and an optical filter arranged with respect to the cover member to face the image pickup device. The image pickup device is disposed in a substantially closed space formed by the circuit board, the cover member, and the optical filter. After the image pickup device is mounted on the circuit board, the image pickup device is disposed in the substantially closed space, and therefore, the compact camera module can be assembled with no occurrence of dust adhesion to the image pickup device.
    • 公开了一种紧凑型相机模块,其能够防止灰尘附着到小型照相机模块中的图像拾取装置。 紧凑型相机模块包括透镜单元,其包括透镜和将透镜保持在其中的透镜保持器以及附接到透镜单元的图像拾取单元。 图像拾取单元包括电路板,电路板上的图像拾取装置,布置在电路板上以覆盖图像拾取装置的盖构件和相对于盖构件布置成面向图像拾取装置的滤光器 。 图像拾取装置设置在由电路板,盖构件和滤光器形成的大致封闭的空间中。 在图像拾取装置安装在电路板上之后,图像拾取装置设置在基本封闭的空间中,因此,可以组装小型相机模块而不会对图像拾取装置产生灰尘附着。
    • 7. 发明授权
    • Mos type image sensor
    • Mos型图像传感器
    • US06521926B1
    • 2003-02-18
    • US09695989
    • 2000-10-26
    • Michio Sasaki
    • Michio Sasaki
    • H01L31062
    • H04N5/35518H01L27/14609H01L27/14623H01L27/14643
    • A MOS type image sensor has an image area that consists of a matrix of pixels and a peripheral circuitry area that drives the image area. To make the MOS type image sensor finer and finer, each of the pixels consists of a second p-well region having a lower impurity concentration than a first p-well region disposed in the peripheral circuitry area; a photodiode having a first main electrode region made of the second p-well region and a second main electrode region formed as a first n-diffusion layer disposed at the surface of the second p-well region; a read transistor having a first main electrode region made of the first n-diffusion layer, a second main electrode region formed as a second n-diffusion layer disposed at the surface of the second p-well region, a gate insulation film disposed on the surface of the second p-well region between the first and second n-diffusion layers, and a gate electrode disposed on the gate insulation film and connected to a read signal line; and an amplification transistor disposed in a third p-well region, having a gate electrode connected to the second main electrode region of the read transistor, a first main electrode region connected to an output signal line, and a second main electrode region. Since the impurity concentration of the second p-well region is low, scaled design rules are employable without causing “white pixels”, sensitivity deterioration, signal read voltage increase, or short-channel effect.
    • MOS型图像传感器具有由像素矩阵和驱动图像区域的外围电路区域组成的图像区域。 为了使MOS型图像传感器更精细,每个像素由具有比设置在外围电路区域中的第一p阱区域的杂质浓度低的第二p阱区域组成; 具有由第二p阱区域制成的第一主电极区域和形成为设置在第二p阱区域的表面处的第一n扩散层的第二主电极区域的光电二极管; 具有由第一n型扩散层制成的第一主电极区域的第二主电极区域,设置在第二p阱区域的表面处的第二n型扩散层形成的第二主电极区域, 在第一和第二n-扩散层之间的第二p阱区的表面和设置在栅极绝缘膜上并连接到读取信号线的栅电极; 以及放大晶体管,其设置在第三p阱区域中,具有连接到所述读取晶体管的第二主电极区域的栅电极,连接到输出信号线的第一主电极区域和第二主电极区域。 由于第二p阱区域的杂质浓度低,所以可以使用缩放设计规则而不引起“白色像素”,灵敏度劣化,信号读取电压增加或短通道效应。
    • 8. 发明授权
    • Solid-state image device including charge-coupled devices having
improved electrode structure
    • 固态图像器件包括具有改进的电极结构的电荷耦合器件
    • US5428231A
    • 1995-06-27
    • US269349
    • 1994-06-30
    • Nagataka TanakaYoshiyuki MatsunagaMichio SasakiHirofumi YamashitaNobuo Nakamura
    • Nagataka TanakaYoshiyuki MatsunagaMichio SasakiHirofumi YamashitaNobuo Nakamura
    • H01L21/28H01L27/148H01L29/423H01L29/78H01L27/14H01L31/00
    • H01L29/42396H01L27/14831
    • A solid-state imaging device comprises a plurality of photoelectric conversion accumulation sections arranged two-dimensionally on a semiconductor substrate, a plurality of vertical CCDs for vertically transferring signal charges read out from the photoelectric conversion accumulation sections, and a horizontal CCD for receiving and horizontally transferring the signal charges transferred by the vertical CCDs. A gap between transfer electrodes of the horizontal CCD is less than a gap between transfer electrodes of the vertical CCDs. The transfer electrodes of the vertical CCDs have a single-layer electrode structure formed by patterning a first polysilicon film. The transfer electrodes of the horizontal CCD have an overlapping double-layer electrode structure comprising alternately arranged electrodes formed by patterning the first polysilicon film and electrodes intervening between the alternately arranged electrodes which are formed by patterning a second polysilicon film. The gap between the electrodes of the horizontal CCD is determined by a silicon oxide film obtained by subjecting the alternately arranged electrodes of the first polysilicon film to thermal oxidation.
    • 固态成像装置包括在半导体基板上二维布置的多个光电转换累积部分,用于垂直转移从光电转换累积部分读出的信号电荷的多个垂直CCD以及用于接收和水平的水平CCD 传输由垂直CCD传输的信号电荷。 水平CCD的转印电极之间的间隙小于垂直CCD的转印电极之间的间隙。 垂直CCD的转印电极具有通过图案化第一多晶硅膜形成的单层电极结构。 水平CCD的转移电极具有重叠的双层电极结构,其包括交替排列的电极,其通过对第一多晶硅膜进行构图而形成,并且通过图案化第二多晶硅膜而形成交替排列的电极之间的电极。 水平CCD的电极之间的间隙由通过对第一多晶硅膜的交替排列的电极进行热氧化而获得的氧化硅膜确定。