会员体验
专利管家(专利管理)
工作空间(专利管理)
风险监控(情报监控)
数据分析(专利分析)
侵权分析(诉讼无效)
联系我们
交流群
官方交流:
QQ群: 891211   
微信请扫码    >>>
现在联系顾问~
热词
    • 1. 发明授权
    • Compound semiconductor device with T-shaped gate electrode
    • 具有T形栅电极的复合半导体器件
    • US08183558B2
    • 2012-05-22
    • US13023146
    • 2011-02-08
    • Kozo MakiyamaTsuyoshi Takahashi
    • Kozo MakiyamaTsuyoshi Takahashi
    • H01L29/06
    • H01L29/7787H01L29/2003H01L29/205H01L29/42316H01L29/66431
    • A compound semiconductor device includes a compound semiconductor substrate; epitaxially grown layers formed over the compound semiconductor substrate and including a channel layer and a resistance lowering cap layer above the channel layer; source and drain electrodes in ohmic contact with the channel layer; recess formed by removing the cap layer between the source and drain electrodes; a first insulating film formed on an upper surface of the cap layer and having side edges at positions retracted from edges, or at same positions as the edges of the cap layer in a direction of departing from the recess; a second insulating film having gate electrode opening and formed covering a semiconductor surface in the recess and the first insulating film; and a gate electrode formed on the recess via the gate electrode opening.
    • 化合物半导体器件包括化合物半导体衬底; 在化合物半导体衬底上形成的外延生长层,并且在沟道层上方包括沟道层和电阻降低覆盖层; 源极和漏极与沟道层欧姆接触; 通过去除源极和漏极之间的覆盖层形成的凹陷; 第一绝缘膜,其形成在所述盖层的上表面上,并且在从所述盖层的边缘离开所述凹部的边缘处或与所述盖层的边缘相同的位置处具有侧边缘; 第二绝缘膜,具有栅极电极开口并形成为覆盖所述凹部中的半导体表面和所述第一绝缘膜; 以及通过栅电极开口形成在凹部上的栅电极。
    • 2. 发明授权
    • Compound semiconductor device with T-shaped gate electrode and its manufacture
    • 具有T形栅电极的复合半导体器件及其制造
    • US07906417B2
    • 2011-03-15
    • US12190216
    • 2008-08-12
    • Kozo MakiyamaTsuyoshi Takahashi
    • Kozo MakiyamaTsuyoshi Takahashi
    • H01L21/44
    • H01L29/7787H01L29/2003H01L29/205H01L29/42316H01L29/66431
    • A method for manufacturing a compound semiconductor device forms an EB resist layer on first SiN film, performs EB exposure at high dose for recess forming opening and at low dose for eaves removing opening, develops the high dose EB resist pattern to etch the first SiN film, selectively etches the cap layer to form a recess wider than the opening of the first SiN film leaving eaves of SiN, develops the low dose EB resist pattern to form the eaves removing opening, etches the first SiN film to extinguish the eaves, forms second SiN film on the exposed surface, forms a resist pattern having a gate electrode opening on the second SiN film to etch the second SiN film, forms a metal layer to form a gate electrode by lift-off. The SiN film in eaves shape will not be left.
    • 一种化合物半导体器件的制造方法在第一SiN膜上形成EB抗蚀剂层,以高剂量进行用于凹部形成开口的EB曝光,并以低剂量进行檐部剥离开口的EB曝光,形成高剂量EB抗蚀剂图案以蚀刻第一SiN膜 选择性地蚀刻覆盖层以形成比离开SiN的檐的第一SiN膜的开口更宽的凹陷,形成低剂量EB抗蚀剂图案以形成檐口去除开口,蚀刻第一SiN膜以扑灭檐口,形成第二个 在曝光表面上形成SiN膜,形成在第二SiN膜上具有栅电极开口以蚀刻第二SiN膜的抗蚀剂图案,通过剥离形成金属层以形成栅电极。 檐形状的SiN膜不会留下。
    • 3. 发明授权
    • Semiconductor device having a mushroom gate with hollow space
    • 具有中空空间的蘑菇门的半导体装置
    • US06998695B2
    • 2006-02-14
    • US10649643
    • 2003-08-28
    • Kozo MakiyamaTsuyoshi TakahashiMasahiro Nishi
    • Kozo MakiyamaTsuyoshi TakahashiMasahiro Nishi
    • H01L29/00
    • H01L29/66462H01L21/28587H01L29/42316
    • A method of manufacturing a semiconductor device has the steps of: forming a mushroom gate traversing an active region of a semiconductor substrate and having a fine gate and an expanded over gate formed thereon; coating a first organic material film on the semiconductor substrate; patterning the first organic material film and leaving the first organic material film only near the mushroom gate; coating a second organic (insulating) material film covering the left first organic material film; forming an opening through the second organic material film to expose the first organic material film; and dissolving and removing the first organic material film via the opening to form a hollow space in the second organic material film.
    • 一种半导体器件的制造方法,其特征在于:形成穿过半导体衬底的有源区并形成有精细栅极和扩展栅极的蘑菇栅极; 在半导体衬底上涂覆第一有机材料膜; 图案化第一有机材料膜并仅在蘑菇门附近留下第一有机材料膜; 涂覆覆盖左第一有机材料膜的第二有机(绝缘)材料膜; 通过所述第二有机材料膜形成开口以暴露所述第一有机材料膜; 并且经由所述开口溶解并除去所述第一有机材料膜,以在所述第二有机材料膜中形成中空空间。
    • 4. 发明申请
    • COMPOUND SEMICONDUCTOR DEVICE WITH T-SHAPED GATE ELECTRODE
    • 具有T形门电极的化合物半导体器件
    • US20110127545A1
    • 2011-06-02
    • US13023146
    • 2011-02-08
    • Kozo MakiyamaTsuyoshi Takahashi
    • Kozo MakiyamaTsuyoshi Takahashi
    • H01L29/161H01L29/78
    • H01L29/7787H01L29/2003H01L29/205H01L29/42316H01L29/66431
    • A compound semiconductor device includes a compound semiconductor substrate; epitaxially grown layers formed over the compound semiconductor substrate and including a channel layer and a resistance lowering cap layer above the channel layer; source and drain electrodes in ohmic contact with the channel layer; recess formed by removing the cap layer between the source and drain electrodes; a first insulating film formed on an upper surface of the cap layer and having side edges at positions retracted from edges, or at same positions as the edges of the cap layer in a direction of departing from the recess; a second insulating film having gate electrode opening and formed covering a semiconductor surface in the recess and the first insulating film; and a gate electrode formed on the recess via the gate electrode opening.
    • 化合物半导体器件包括化合物半导体衬底; 在化合物半导体衬底上形成的外延生长层,并且在沟道层上方包括沟道层和电阻降低覆盖层; 源极和漏极与沟道层欧姆接触; 通过去除源极和漏极之间的覆盖层形成的凹陷; 第一绝缘膜,其形成在所述盖层的上表面上,并且在从所述盖层的边缘离开所述凹部的边缘处或与所述盖层的边缘相同的位置处具有侧边缘; 第二绝缘膜,具有栅极电极开口并形成为覆盖所述凹部中的半导体表面和所述第一绝缘膜; 以及通过栅极电极开口形成在凹部上的栅电极。
    • 8. 发明申请
    • BIOLOGICAL SAMPLE MEASURING DEVICE AND METHOD FOR MEASURING BIOLOGICAL SAMPLE USING SAME
    • 生物样品测量装置和使用其测量生物样品的方法
    • US20130337571A1
    • 2013-12-19
    • US14003090
    • 2012-05-10
    • Daiki MizuokaHiroyuki TokunagaTsuyoshi Takahashi
    • Daiki MizuokaHiroyuki TokunagaTsuyoshi Takahashi
    • G01N33/66
    • G01N33/66G01N27/3273G01N27/3274Y10T436/144444
    • With this biological sample measuring device, the determination section performs measurement at specific intervals in a first measurement period from the start of measurement until a first time, and performs measurement at specific intervals in a second measurement period that comes after the first measurement period, calculates the difference between the measurement values in corresponding specific periods, and finds a plurality of first difference determination values, on the basis of a plurality of current values measured in the first measurement period and a plurality of current values measured in the second measurement period, finds a second difference determination value by finding the difference at specific intervals in the plurality of first difference determination values, and determines whether or not a reagent movement error and/or exposure error of the biological sample measurement sensor has occurred, on the basis of the first and second difference determination values.
    • 在该生物样本测定装置中,决定部在从开始测量直到第一次的第一测量期间内以特定间隔进行测量,并且在第一测定周期之后的第二测定期间内,以规定间隔进行测定, 基于在第一测量周期中测量的多个电流值和在第二测量周期中测量的多个电流值,在相应的特定周期中的测量值之间的差异,并且找到多个第一差分确定值,找到 第二差分确定值,通过在多个第一差分确定值中以特定间隔找到差异,并且基于第一差异确定值确定生物样本测量传感器的试剂移动误差和/或曝光误差是否已经发生 和第二差分确定值。