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    • 4. 发明申请
    • IN VACUUM OPTICAL WAFER HEATER FOR CRYOGENIC PROCESSING
    • 真空加热用真空加热器
    • US20110143461A1
    • 2011-06-16
    • US12638221
    • 2009-12-15
    • Roger B. FishJeffrey E. Krampert
    • Roger B. FishJeffrey E. Krampert
    • H01L21/67H01L21/42H01L21/66
    • H01L21/67213H01L21/67115H01L21/67196
    • A vacuum assembly used for warming processed substrates above the dew point to prevent unwanted moisture on the processed substrate surfaces as well as reducing negative impact on manufacturing throughput. The vacuum assembly includes a processing chamber, a substrate handling robot, and a heater which may be an optical heater. The processing chamber is configured to cryogenically process one or more substrates. The transfer chamber is connected to the processing chamber and houses the substrate handling robot. The substrate handling robot is configured to displace one or more substrates from the processing chamber to the transfer chamber. The heater is connected to the transfer chamber above the substrate handling robot such that the heater emits energy incident on the substrate when the substrate handling robot displaces the substrate in the transfer chamber.
    • 一种真空组件,用于将处理后的基材加热到露点以上,以防止已加工的基材表面上的不必要的水分,以及减少对制造产量的负面影响。 真空组件包括处理室,基板处理机器人和可以是光学加热器的加热器。 处理室被配置为低温处理一个或多个基板。 传送室连接到处理室并容纳基板处理机器人。 衬底处理机器人构造成将一个或多个衬底从处理室移动到传送室。 加热器连接到基板处理机器人上方的传送室,使得当基板处理机器人移动传送室中的基板时,加热器发射入射到基板上的能量。
    • 7. 发明授权
    • Optical heater for cryogenic ion implanter surface regeneration
    • 用于低温离子注入机表面再生的光学加热器
    • US07977652B2
    • 2011-07-12
    • US12569128
    • 2009-09-29
    • Roger B. FishJeffrey E. Krampert
    • Roger B. FishJeffrey E. Krampert
    • H01J37/08
    • H01J37/3171H01J37/20H01J2237/022H01J2237/2001
    • In an ion implanter, one or more optical heaters are disposed above a pair of support arms. The support arms have an engaged positioned which is disposed beneath a platen and a retractable position displaced vertically away from the platen and rotated away from the platen in a direction parallel to a planar surface thereof. When the support arms are in the retracted position, the one or more optical heaters is configured to provide optical energy incident on surfaces of the cooling pads disposed on the support arms for removal of unwanted materials thereon. In this manner, the optical heaters are used during a regeneration cycle of cryogenic surfaces in an ion implanter.
    • 在离子注入机中,一对或多个光学加热器设置在一对支撑臂上方。 支撑臂具有接合位置,其设置在压板下方并且垂直远离压板移动并沿平行于其平坦表面的方向远离压板旋转的可缩回位置。 当支撑臂处于缩回位置时,一个或多个光学加热器被配置为提供入射到设置在支撑臂上的冷却垫的表面上的光能,以去除其上的不需要的材料。 以这种方式,在离子注入机的低温表面的再生循环期间使用光学加热器。
    • 9. 发明授权
    • Method and apparatus for removing a vertically-oriented substrate from a cassette
    • 从盒中去除垂直取向的基板的方法和装置
    • US09070730B2
    • 2015-06-30
    • US13268109
    • 2011-10-07
    • John Robert FairhurstJeffrey E. KrampertRichard J. Hertel
    • John Robert FairhurstJeffrey E. KrampertRichard J. Hertel
    • H01L21/677H01L21/687
    • H01L21/68707H01L21/67751Y10S414/138Y10S414/141
    • A system and method are disclosed for removing vertically oriented substrates from a cassette. A lifter includes a lifter notch and a stabilizer notch for holding a substrate. The lifter notch engages and lifts the substrate along the substrate ID, while the stabilizer notch captures the substrate OD to prevent lateral movement of the substrate during lifting. In use, the cassette is tilted to bias all substrates to one side and ensure consistent spacing. The lifter moves up into the cassette until the notches are adjacent, but beneath, the ID and OD of a substrate. The lifter is moved laterally to position the notches directly below the ID and OD. Upward movement of the lifter causes the lifter notch to lift the substrate along the ID. The lifter continues upward with the substrate until the substrate clears the top of the cassette. Other embodiments are described and claimed.
    • 公开了用于从盒中去除垂直取向的基板的系统和方法。 提升器包括用于保持基板的升降器切口和稳定器切口。 升降器切口沿着基板ID接合和提升基板,而稳定器凹口捕获基板OD,以防止在提升期间基板的横向移动。 在使用中,盒子倾斜以将所有基板偏压到一侧,并确保间隔一致。 提升器向上移动到盒中,直到凹口相邻,但在底部下方的基底的ID和OD。 升降机横向移动,将切口定位在ID和OD的正下方。 升降机的向上运动导致升降器切口沿着ID抬起基板。 升降器继续向上与基板直到基板清除磁带的顶部。 描述和要求保护其他实施例。
    • 10. 发明授权
    • Method and apparatus for manipulating a substrate
    • 用于操纵衬底的方法和装置
    • US08550520B2
    • 2013-10-08
    • US13268139
    • 2011-10-07
    • John Robert FairhurstJeffrey E. KrampertRichard J. Hertel
    • John Robert FairhurstJeffrey E. KrampertRichard J. Hertel
    • B66C1/00B66C1/54
    • H01L21/68707H01L21/68764H01L21/68771
    • A device is disclosed for manipulating a substrate having an inside diameter (ID). The device includes a handle, a trigger that slides within the handle, an alignment shaft and a plurality of substrate supports having distal ends. A plurality of substrate support actuators are connected to the trigger. The trigger can move the plurality of substrate supports between a substrate engaging position and a substrate releasing position through selective engagement of the plurality of substrate supports by the plurality of substrate support actuators. In the substrate engaging position the distal ends of the substrate supports move radially outward to engage the ID of the substrate, enabling the device to hold the substrate without touching the substrate faces. Other embodiments are described and claimed.
    • 公开了一种用于操纵具有内径(ID)的基板的装置。 该装置包括手柄,在手柄内滑动的触发器,对准轴和具有远端的多个基板支撑件。 多个基板支撑致动器连接到触发器。 触发器可以通过由多个基板支撑致动器选择性地接合多个基板支撑件而在基板接合位置和基板释放位置之间移动多个基板支撑件。 在衬底接合位置,衬底支撑件的远端径向向外移动以接合衬底的ID,使得器件能够保持衬底而不接触衬底面。 描述和要求保护其他实施例。