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1. 发明申请

US20070031321A1 Apparatus and method for purification of corrosive gas streams 审中-公开
标题翻译：用于净化腐蚀性气流的装置和方法
公开(公告)号：US20070031321A1
公开(公告)日：2007-02-08
申请号：US10559070
申请日：2004-06-23
申请人： Daniel Alvarez , Daniel Lev , Jeffrey Spiegelman , Tram Nguyen , Russell Holmes
发明人： Daniel Alvarez , Daniel Lev , Jeffrey Spiegelman , Tram Nguyen , Russell Holmes
IPC分类号： C01F11/22 , C01F5/28
CPC分类号： B01J20/3204 , B01D53/261 , B01D53/28 , B01J20/0211 , B01J20/041 , B01J20/06 , B01J20/28057 , B01J20/28097 , B01J20/3236 , B01J20/3433 , B01J20/3458 , B01J20/3483 , C01B7/0718 , C01B7/0743 , C01B7/093 , C01B7/096 , C01B7/197 , C01B7/20 , C01B7/24
摘要： A process, composition and apparatus for the removal of impurities from corrosive gases, particularly halogen-containing gases, down to about 100 ppb concentration are described. The critical component is zirconia (ZrO2), which in a variety of physical forms is capable of dehydrating such gases. The zirconia can be in the form of a coating on a substrate, as a granular bulk material, or deposited within the pores of a porous body. The zirconia is retained in a simple container which is easily installed in a gas supply line, such as to a gas- or vapor-deposition manufacturing unit. The purification process can be operated for long periods of time in the presence of these gases. The invention provides final purification to gas streams intended for gas- or vapor-deposition formation of high purity electronic, prosthetic or similar products, and can be used in combination with a preliminary dehydration process or a solid particulate removal unit upstream.
摘要翻译：描述了用于从低至约100ppb浓度的腐蚀性气体，特别是含卤素气体中除去杂质的方法，组合物和装置。关键组分是氧化锆（ZrO 2/2），其以各种物理形式能够使这些气体脱水。氧化锆可以是基材上的涂层形式，作为颗粒体材料，或者沉积在多孔体的孔内。氧化锆保持在易于安装在气体供应管线中的简单容器中，例如气体或气相沉积制造单元。净化过程可在这些气体存在的情况下长时间运行。本发明提供了用于气体或气相沉积形成高纯度电子，假体或类似产品的气流的最终纯化，并且可以与预脱水方法或固体颗粒去除单元上游结合使用。

2. 发明申请

US20060188420A1 Hydride gas purification for the semiconductor industry 有权
公开(公告)号：US20060188420A1
公开(公告)日：2006-08-24
申请号：US10565353
申请日：2004-07-21
申请人： Daniel Alvarez , Jeffrey Spiegelman , Joshua Cook , Tram Nguyen , Daniel Lev , Troy Scoggins
发明人： Daniel Alvarez , Jeffrey Spiegelman , Joshua Cook , Tram Nguyen , Daniel Lev , Troy Scoggins
IPC分类号： B01D47/00
CPC分类号： B01D53/86 , C01B3/56 , C01B6/34 , C01B25/06 , C01B33/04 , C01B35/02 , C01C1/024 , Y02E60/324
摘要： A method for hydride gas purification uses materials having at least one lanthanide metal or lanthanide metal oxide. The method reduces contaminants to less than 100 parts per billion (ppb), preferably 10 ppb, more preferably 1 ppb. The material can also include transition metals and transition metal oxides, rare earth elements and other metal oxides. The invention also includes materials for use in the method of the invention.

3. 发明申请

US20070137676A1 Method for the removal of airborne molecular contaminants using extra clean dry air 审中-公开
标题翻译：使用额外干净的干燥空气去除空气中的分子污染物的方法
公开(公告)号：US20070137676A1
公开(公告)日：2007-06-21
申请号：US11706044
申请日：2007-02-13
申请人： Jeffrey Spiegelman , Daniel Alvarez , Allan Tram , Russell Holmes
发明人： Jeffrey Spiegelman , Daniel Alvarez , Allan Tram , Russell Holmes
IPC分类号： B08B7/04 , B08B3/00
CPC分类号： B01D53/00 , B01D53/72 , B08B5/02 , B08B9/00 , C23G5/00 , H01L21/02046
摘要： The present invention discloses a method for the removal of a number of molecular contaminants from surfaces within a device. A purge gas containing oxygen and/or water is introduced into the interior of the device, contacting at least a portion of the interior surfaces. A contaminated purge gas is produced by transferring a portion of the contamination from the interior surfaces into the purge gas. The contaminated purge gas is removed from the device and the process is, continued until the contaminant concentration in the contaminated purge gas is below a predetermined level.
摘要翻译：本发明公开了一种从装置内的表面除去多种分子污染物的方法。含有氧气和/或水的净化气体被引入到装置的内部，与内表面的至少一部分接触。污染的吹扫气体通过将一部分污染物从内表面转移到吹扫气体中而产生。污染的吹扫气体从设备中移出，并且该过程一直持续到污染的净化气体中的污染物浓度低于预定水平。

4. 发明申请

US20060243585A1 Method for the point of use production of ammonia from water and nitrogen 审中-公开
标题翻译：从水和氮生产氨的方法
公开(公告)号：US20060243585A1
公开(公告)日：2006-11-02
申请号：US10565396
申请日：2004-07-22
申请人： Jeffrey Spiegelman , Daniel Alvarez
发明人： Jeffrey Spiegelman , Daniel Alvarez
IPC分类号： C01B13/00
CPC分类号： C01B21/045 , C01B3/025 , C01B3/56 , C01B2203/043 , C01B2203/0465 , C01B2203/047 , C01B2203/0475 , C01B2203/048 , C01B2203/0495 , C01C1/024 , C01C1/0405 , Y02E60/364 , Y02E60/366 , Y02P20/52
摘要： The present invention discloses a method for the manufacture of high purity ammonia, hydrogen, and nitrogen from de-ionized water and standard nitrogen. De-ionized water is degassed and fed to an electrolytic hydrogen generator to produce raw hydrogen. The hydrogen is purified and mixed with purified nitrogen, compressed, and fed to a catalytic ammonia reactor. Following purification, the ammonia is delivered to the semiconductor process tool along with purified hydrogen and purified nitrogen.
摘要翻译：本发明公开了一种从去离子水和标准氮气制造高纯氨，氢和氮的方法。去离子水被脱气并进料到电解氢发生器以产生原始氢。将氢纯化并与纯化氮混合，压缩，并进料到催化氨反应器中。纯化后，将氨与纯化的氢气和纯化氮气一起输送到半导体工艺工具。

5. 发明申请

US20060211131A1 Method for analysis of contaminants in a process fluid stream 有权
标题翻译：分析工艺流体流中污染物的方法
公开(公告)号：US20060211131A1
公开(公告)日：2006-09-21
申请号：US10544309
申请日：2004-02-20
申请人： Jeffrey Spiegelman , Daniel Alvarez , Allan Tram
发明人： Jeffrey Spiegelman , Daniel Alvarez , Allan Tram
IPC分类号： G01N1/18
CPC分类号： G01N30/12 , G01N1/2214 , G01N1/44 , G01N2030/085 , Y10T436/25 , Y10T436/25375 , Y10T436/255
摘要： The present invention relates to the monitoring of contaminant concentrations in manufacturing processes that employ fluid purification devices. The invention provides a sensitive method for analyzing contaminant concentrations in a process fluid stream using purification material to adsorb contaminants contained therein over an entire process.
摘要翻译：本发明涉及使用流体净化装置的制造过程中的污染物浓度的监测。本发明提供了一种用于分析工艺流体流中的污染物浓度的敏感方法，其使用净化材料在整个过程中吸附其中所含的污染物。

6. 发明申请

US20050229783A1 Method for purification of lens gases used in photolithography 审中-公开
标题翻译：纯化用于光刻中的透镜气体的方法
公开(公告)号：US20050229783A1
公开(公告)日：2005-10-20
申请号：US11147563
申请日：2005-06-08
申请人： Daniel Alvarez , Jeffrey Spiegelman
发明人： Daniel Alvarez , Jeffrey Spiegelman
IPC分类号： B01D53/02 , B01D53/04 , B01D53/26 , B01D53/50 , B01D53/56 , B01D53/72 , B01J20/02 , B01J20/06 , B01J20/18 , G03F7/20
CPC分类号： G03F7/70883 , B01D53/02 , B01D53/04 , B01D53/261 , B01D53/508 , B01D53/565 , B01D53/72 , B01D2253/108 , B01D2256/10 , B01D2256/18 , B01D2257/206 , B01D2257/306 , B01D2257/70 , B01D2257/702 , B01D2257/80 , B01J20/02 , B01J20/0207 , B01J20/0211 , B01J20/0214 , B01J20/0225 , B01J20/0229 , B01J20/0237 , B01J20/0244 , B01J20/06 , B01J20/08 , B01J20/103 , B01J20/18 , B01J2220/42 , G03F7/70925 , G03F7/70933
摘要： A method and composition for the removal of contaminants in a gas stream used in the contamination sensitive processes of photolithography and metrology are described. The synergistic effect of a combination of an electropositive metal component, a high silica zeolite, and a late transition metal compound effects removal or reduction of the contaminates in the gas which interfere with light transmittance to the ppb or ppt levels necessary for the gas to be suitable for these uses. The removal of neutral polar molecules, neutral polar aprotic molecules, protic and aprotic alkaline molecules, acidic polar species, and neutral non-polar aprotic molecules is accomplished with the claimed composition. Depending on the type of contaminant, the composition components are each varied from 10 to 80 parts by volume, with the total composition limited to 100 parts by volume.
摘要翻译：描述了用于去除光刻和计量的污染敏感过程中气流中污染物的方法和组合物。正电性金属组分，高二氧化硅沸石和后期过渡金属化合物的组合的协同效应影响气体中污染物的去除或还原，其干扰对于气体所需的ppb或ppt水平的透光率适合这些用途。中性极性分子，中性极性非质子分子，质子和非质子碱性分子，酸性极性物质和中性非极性非质子分子的去除是用要求保护的组合物完成的。取决于污染物的类型，组合物组分各自为10至80体积份，总组合物限制为100体积份。

7. 发明申请

US20050019244A1 Method for the point of use production of ammonia from water and nitrogen 审中-公开
标题翻译：从水和氮生产氨的方法
公开(公告)号：US20050019244A1
公开(公告)日：2005-01-27
申请号：US10626266
申请日：2003-07-23
申请人： Jeffrey Spiegelman , Daniel Alvarez
发明人： Jeffrey Spiegelman , Daniel Alvarez
IPC分类号： C01B3/02 , C01B3/56 , C01C1/04 , C01C1/02
CPC分类号： C01B21/045 , C01B3/025 , C01B3/56 , C01B2203/043 , C01B2203/0465 , C01B2203/047 , C01B2203/0475 , C01B2203/048 , C01B2203/0495 , C01C1/024 , C01C1/0405 , Y02E60/364 , Y02E60/366 , Y02P20/52
摘要： The present invention discloses a method for the manufacture of high purity ammonia, hydrogen, and nitrogen from de-ionized water and standard nitrogen. De-ionized water is degassed and fed to an electrolytic hydrogen generator to produce raw hydrogen. The hydrogen is purified and mixed with purified nitrogen, compressed, and fed to a catalytic ammonia reactor. Following purification, the ammonia is delivered to the semiconductor process tool along with purified hydrogen and purified nitrogen.
摘要翻译：本发明公开了一种从去离子水和标准氮气制造高纯氨，氢和氮的方法。去离子水被脱气并进料到电解氢发生器以产生原始氢。将氢纯化并与纯化氮混合，压缩，并进料到催化氨反应器中。纯化后，将氨与纯化的氢气和纯化氮气一起输送到半导体工艺工具。

8. 发明申请

US20050229947A1 Methods of inserting or removing a species from a substrate 审中-公开
标题翻译：从基材中插入或除去物质的方法
公开(公告)号：US20050229947A1
公开(公告)日：2005-10-20
申请号：US11036585
申请日：2005-01-13
申请人： Jeffrey Spiegelman , Daniel Alvarez , Joshua Cook
发明人： Jeffrey Spiegelman , Daniel Alvarez , Joshua Cook
IPC分类号： H01L21/306 , H01L21/44
CPC分类号： B08B7/00 , H01L21/02052 , H01L21/02057 , H01L21/76814 , H01L21/76826
摘要： Methods of inserting and removing species from substrates utilizing pressure-vent cycling are revealed in embodiments of the invention. Various embodiments introduce a fluid to a vessel containing the substrate while setting pressure at an elevated level. The pressure is maintained at the elevated level for a predetermined period of time, the lowered by removing fluid from the vessel. The steps of introducing fluid, maintaining pressure, and lowering pressure are repeated at least once. Embodiments of the invention may allow a species to be removed from the voids of a substrate, or allow a new species to be inserted into the voids. Particular embodiments also have special application to preconditioning, activating, and/or regenerating gas purification substrates, or removing and/or delivering species with respect to semiconductor substrates. Embodiments of the invention allow faster transport of species to and from substrates with less use of purging or filling fluids.
摘要翻译：在本发明的实施方案中揭示了使用压力 - 排气循环从底物中插入和除去物质的方法。各种实施例在将压力设定在较高水平的同时将流体引入到容纳衬底的容器中。压力在升高的水平上保持预定的时间，通过从容器中除去流体而降低。引入流体，保持压力和降低压力的步骤至少重复一次。本发明的实施方案可以允许物质从基底的空隙中除去，或允许将新物质插入空隙中。具体实施方案还具有预处理，活化和/或再生气体净化衬底或相对于半导体衬底去除和/或递送物质的特殊应用。本发明的实施方案允许物种更快地使用清洗或填充液体将物质运送到基底和从基底移走。

9. 发明申请

US20050205114A1 Method for the removal of airborne molecular contaminants using water gas mixtures 失效
标题翻译：使用水煤气混合物去除空气传播的分子污染物的方法
公开(公告)号：US20050205114A1
公开(公告)日：2005-09-22
申请号：US11113726
申请日：2005-04-25
申请人： Daniel Alvarez , Jeffrey Spiegelman
发明人： Daniel Alvarez , Jeffrey Spiegelman
IPC分类号： B01D53/00 , B01D53/72 , B08B5/02 , B08B9/00 , H01L21/306 , B08B7/00
CPC分类号： B01D53/00 , B01D53/72 , B08B5/02 , B08B9/00 , C23G5/00 , H01L21/02046
摘要： The present invention discloses a method for the removal of a number of molecular contaminants from surfaces within a device. A purge gas containing oxygen and/or water is introduced into the interior of the device, contacting at least a portion of the interior surfaces. A contaminated purge gas is produced by transferring a portion of the contamination from the interior surfaces into the purge gas. The contaminated purge gas is removed from the device and the process is continued until the contaminant concentration in the contaminated purge gas is below a predetermined level.
摘要翻译：本发明公开了一种从装置内的表面除去多种分子污染物的方法。含有氧气和/或水的净化气体被引入到装置的内部，与内表面的至少一部分接触。污染的吹扫气体通过将一部分污染物从内表面转移到吹扫气体中而产生。污染的净化气体从设备中移出，并且继续该过程直到污染的吹扫气体中的污染物浓度低于预定水平。

10. 发明申请

US20070144118A1 Purging of a wafer conveyance container 审中-公开
标题翻译：清洗晶片输送容器
公开(公告)号：US20070144118A1
公开(公告)日：2007-06-28
申请号：US11318258
申请日：2005-12-22
申请人： Daniel Alvarez , Troy Scoggins , Russell Holmes
发明人： Daniel Alvarez , Troy Scoggins , Russell Holmes
IPC分类号： B01D50/00
CPC分类号： H01L21/67769 , H01L21/67017 , H01L21/67389
摘要： Embodiments of the invention are directed to methods and systems of purging of transfer containers, such as standardized mechanical interface (SMIF) pods. In particular, purified purge gases can purify front operated unified pods (FOUPs) and other non hermetically sealed transfer containers, such that the containers can be interfaced with a sealed chamber (e.g., a semiconductor processing tool) without detrimentally contaminating the environment of the sealed chamber with organics and other harmful contaminants. The methods and systems may be used to transfer objects, such as wafers, semiconductor components, and other materials requiring exposure to extremely clean environments, during electronic materials manufacturing and processing. Transfer containers specifically configured to promote purging of the container's enclosure are also described.
摘要翻译：本发明的实施例涉及清洁转移容器的方法和系统，例如标准化机械界面（SMIF）舱。特别地，净化的净化气体可净化前操作的统一容器（FOUP）和其他非密封的转运容器，使得容器可以与密封室（例如，半导体加工工具）接合，而不会有害地污染密封室内有有机物和其他有害污染物。在电子材料制造和加工期间，可以使用这些方法和系统来传送诸如晶片，半导体部件和需要暴露于非常干净的环境的其它材料的对象。还描述了专门配置为促进容器外壳清洗的转移容器。

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