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    • 1. 发明授权
    • Method for high volume manufacturing of thin film batteries
    • 薄膜电池大批量生产方法
    • US08168318B2
    • 2012-05-01
    • US12257049
    • 2008-10-23
    • Byung Sung KwakNety M. KrishnaKurt EisenbeiserWilliam J. DauksherJon Candelaria
    • Byung Sung KwakNety M. KrishnaKurt EisenbeiserWilliam J. DauksherJon Candelaria
    • H01M6/16H01M6/18H01M6/46
    • H01M10/0585H01M6/40H01M10/0436H01M10/052H01M2300/0068
    • Concepts and methods are provided to reduce the cost and complexity of thin film battery (TFB) high volume manufacturing by eliminating and/or minimizing the use of conventional physical (shadow) masks. Laser scribing and other alternative physical maskless patterning techniques meet certain or all of the patterning requirements. In one embodiment, a method of manufacturing thin film batteries comprises providing a substrate, depositing layers corresponding to a thin film battery structure on the substrate, the layers including, in order of deposition, a cathode, an electrolyte and an anode, wherein at least one of the deposited layers is unpatterned by a physical mask during deposition, depositing a protective coating, and scribing the layers and the protective coating. Further, the edges of the layers may be covered by an encapsulation layer. Furthermore, the layers may be deposited on two substrates and then laminated to form the thin film battery.
    • 提供了概念和方法,以通过消除和/或最小化常规物理(阴影)掩模的使用来降低薄膜电池(TFB)大批量制造的成本和复杂性。 激光划线和其他可选的物理无掩模图案化技术满足某些或所有图案化要求。 在一个实施例中,制造薄膜电池的方法包括提供衬底,在衬底上沉积与薄膜电池结构相对应的层,所述层按沉积顺序包括阴极,电解质和阳极,其中至少 沉积层中的一个在沉积期间由物理掩模未图案化,沉积保护涂层,以及划刻层和保护涂层。 此外,层的边缘可以被封装层覆盖。 此外,可以将这些层沉积在两个基板上,然后层压以形成薄膜电池。
    • 2. 发明申请
    • METHOD FOR HIGH VOLUME MANUFACTURING OF THIN FILM BATTERIES
    • 薄膜电池高容量制造方法
    • US20090148764A1
    • 2009-06-11
    • US12257049
    • 2008-10-23
    • Byung Sung KwakNety M. KrishnaKurt EisenbelserWilliam J. DauksherJon Candelaria
    • Byung Sung KwakNety M. KrishnaKurt EisenbelserWilliam J. DauksherJon Candelaria
    • H01M6/18B05D5/12
    • H01M10/0585H01M6/40H01M10/0436H01M10/052H01M2300/0068
    • Concepts and methods are provided to reduce the cost and complexity of thin film battery (TFB) high volume manufacturing by eliminating and/or minimizing the use of conventional physical (shadow) masks. Laser scribing and other alternative physical maskless patterning techniques meet certain or all of the patterning requirements. In one embodiment, a method of manufacturing thin film batteries comprises providing a substrate, depositing layers corresponding to a thin film battery structure on the substrate, the layers including, in order of deposition, a cathode, an electrolyte and an anode, wherein at least one of the deposited layers is unpatterned by a physical mask during deposition, depositing a protective coating, and scribing the layers and the protective coating. Further, the edges of the layers may be covered by an encapsulation layer. Furthermore, the layers may be deposited on two substrates and then laminated to form the thin film battery.
    • 提供了概念和方法,以通过消除和/或最小化常规物理(阴影)掩模的使用来降低薄膜电池(TFB)大批量制造的成本和复杂性。 激光划线和其他可选的物理无掩模图案化技术满足某些或所有图案化要求。 在一个实施例中,制造薄膜电池的方法包括提供衬底,在衬底上沉积与薄膜电池结构相对应的层,所述层按沉积顺序包括阴极,电解质和阳极,其中至少 沉积层中的一个在沉积期间由物理掩模未图案化,沉积保护涂层,以及划刻层和保护涂层。 此外,层的边缘可以被封装层覆盖。 此外,可以将这些层沉积在两个基板上,然后层压以形成薄膜电池。
    • 6. 发明授权
    • Electrochromic devices
    • 电致变色装置
    • US08693078B2
    • 2014-04-08
    • US13461750
    • 2012-05-01
    • Byung Sung KwakNety Krishna
    • Byung Sung KwakNety Krishna
    • G02F1/15G02F1/153
    • G02F1/1533G02F1/1523G02F1/155G02F2001/1536
    • This invention contemplates integrating laser scribing/patterning the component layers of electrochromic devices by directly removing (ablating) the material of the component layers. To minimize redeposition of laser ablated material and particulate formation on device surfaces a number of approaches may be used: (1) ablated material generated by the focused laser patterning may be removed by vacuum suction and/or application of an inert gas jet in the vicinity of the laser ablation of device material; (2) spatial separation of the edges of layers and patterning of lower layers prior to deposition of upper layers; and (3) the laser patterning step may be performed by a laser beam focused directly on the deposited layers from above, by a laser beam directed through the transparent substrate, or by a combination of both.
    • 本发明考虑通过直接去除(消融)组分层的材料来集成激光划线/图案化电致变色器件的组件层。 为了最小化激光烧蚀材料的再沉积和器件表面上的颗粒形成,可以使用许多方法:(1)通过聚焦激光图案形成产生的消融材料可以通过在附近的真空抽吸和/或施加惰性气体射流来去除 的器件材料的激光烧蚀; (2)在沉积上层之前层的边缘的空间分离和下层的图案化; 和(3)激光图案化步骤可以通过从上方直接聚焦在沉积层上的激光束,通过引导通过透明衬底的激光束,或通过两者的组合进行。
    • 7. 发明申请
    • Electrochromic Devices
    • 电致变色器件
    • US20120218620A1
    • 2012-08-30
    • US13461750
    • 2012-05-01
    • Byung Sung KwakNety Krishna
    • Byung Sung KwakNety Krishna
    • G02F1/15
    • G02F1/1533G02F1/1523G02F1/155G02F2001/1536
    • This invention contemplates integrating laser scribing/patterning the component layers of electrochromic devices by directly removing (ablating) the material of the component layers. To minimize redeposition of laser ablated material and particulate formation on device surfaces a number of approaches may be used: (1) ablated material generated by the focused laser patterning may be removed by vacuum suction and/or application of an inert gas jet in the vicinity of the laser ablation of device material; (2) spatial separation of the edges of layers and patterning of lower layers prior to deposition of upper layers; and (3) the laser patterning step may be performed by a laser beam focused directly on the deposited layers from above, by a laser beam directed through the transparent substrate, or by a combination of both.
    • 本发明考虑通过直接去除(消融)组分层的材料来集成激光划线/图案化电致变色器件的组件层。 为了最小化激光烧蚀材料的再沉积和器件表面上的颗粒形成,可以使用许多方法:(1)通过聚焦激光图案形成产生的消融材料可以通过在附近的真空抽吸和/或施加惰性气体射流来去除 的器件材料的激光烧蚀; (2)在沉积上层之前层的边缘的空间分离和下层的图案化; 和(3)激光图案化步骤可以通过从上方直接聚焦在沉积层上的激光束,通过引导通过透明衬底的激光束,或通过两者的组合进行。
    • 8. 发明授权
    • Method for manufacturing electrochromic devices
    • 电致变色器件的制造方法
    • US08168265B2
    • 2012-05-01
    • US12134437
    • 2008-06-06
    • Byung Sung KwakNety Krishna
    • Byung Sung KwakNety Krishna
    • C08J7/18B05D3/06B05D5/12B05D5/06G02F1/15
    • G02F1/1533G02F1/1523G02F1/155G02F2001/1536
    • This invention contemplates the use of laser patterning/scribing in electrochromic device manufacture, anywhere during the manufacturing process as deemed appropriate and necessary for electrochromic device manufacturability, yield and functionality, while integrating the laser scribing so as to ensure the active layers of the device are protected to ensure long term reliability. It is envisaged that the laser is used to pattern the component layers of electrochromic devices by directly removing (ablating) the material of the component layers. The invention includes a manufacturing method for an electrochromic device comprising one or more focused laser patterning steps. To minimize redeposition of laser ablated material and particulate formation on device surfaces a number of approaches may be used: (1) ablated material generated by the focused laser patterning may be removed by vacuum suction and/or application of an inert gas jet in the vicinity of the laser ablation of device material; (2) spatial separation of the edges of layers and patterning of lower layers prior to deposition of upper layers; and (3) the laser patterning step may be performed by a laser beam focused directly on the deposited layers from above, by a laser beam directed through the transparent substrate, or by a combination of both.
    • 本发明考虑了在制造过程中的任何地方,在电致变色器件的可制造性,成品率和功能性中被认为是合适的和必要的,在电致变色器件制造中使用激光图案/划线,同时整合激光刻划以确保器件的有源层是 保护以确保长期可靠性。 可以设想,激光器用于通过直接去除(消融)组分层的材料来对电致变色器件的组件层进行图案化。 本发明包括一种用于电致变色器件的制造方法,其包括一个或多个聚焦激光器图案化步骤。 为了最小化激光烧蚀材料的再沉积和器件表面上的颗粒形成,可以使用许多方法:(1)通过聚焦激光图案形成产生的消融材料可以通过在附近的真空抽吸和/或施加惰性气体射流来去除 的器件材料的激光烧蚀; (2)在沉积上层之前层的边缘的空间分离和下层的图案化; 和(3)激光图案化步骤可以通过从上方直接聚焦在沉积层上的激光束,通过引导通过透明衬底的激光束,或通过两者的组合进行。
    • 10. 发明授权
    • Thin film batteries and methods for manufacturing same
    • 薄膜电池及其制造方法
    • US08568571B2
    • 2013-10-29
    • US12124918
    • 2008-05-21
    • Byung Sung KwakMichael StowellNety Krishna
    • Byung Sung KwakMichael StowellNety Krishna
    • C23C14/00
    • C23C14/088C23C14/3414H01M4/0426H01M4/1391H01M4/525H01M4/5825H01M6/40H01M10/052H01M10/0585
    • A method of fabricating a layer of a thin film battery comprises providing a sputtering target and depositing the layer on a substrate using a physical vapor deposition process enhanced by a combination of plasma processes. The deposition process may include: (1) generation of a plasma between the target and the substrate; (2) sputtering the target; (3) supplying microwave energy to the plasma; and (4) applying radio frequency power to the substrate. A sputtering target for a thin film battery cathode layer has an average composition of LiMaNbZc, wherein 0.20>{b/(a+b)}>0 and the ratio of a to c is approximately equal to the stoichiometric ratio of a desired crystalline structure of the cathode layer, N is an alkaline earth element, M is selected from the group consisting of Co, Mn, Al, Ni and V, and Z is selected from the group consisting of (PO4), O, F and N.
    • 制造薄膜电池层的方法包括提供溅射靶并使用通过等离子体处理的组合增强的物理气相沉积工艺将该层沉积在衬底上。 沉积过程可以包括:(1)在靶和衬底之间产生等离子体; (2)溅射目标; (3)向等离子体提供微波能量; 和(4)向基板施加射频功率。 用于薄膜电池阴极层的溅射靶具有LiMaNbZc的平均组成,其中0.20> {b /(a + b)}> 0,并且a与c的比值近似等于所需晶体结构的化学计量比 的阴极层,N是碱土金属元素,M选自Co,Mn,Al,Ni和V,Z选自(PO4),O,F和N.