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1. 发明授权

US11996305B2 Selective oxidation on rapid thermal processing (RTP) chamber with active steam generation 有权
公开(公告)号：US11996305B2
公开(公告)日：2024-05-28
申请号：US17362760
申请日：2021-06-29
申请人： Applied Materials, Inc.
发明人： Chaitanya Anjaneyalu Prasad , Christopher Sean Olsen , Lara Hawrylchak , Erika Gabrielle Hansen , Daniel C. Glover , Naman Apurva , Tsung-Han Yang
IPC分类号： H01L21/67 , H01L21/02
CPC分类号： H01L21/67115 , H01L21/02238
摘要： Embodiments of gas distribution modules for use with rapid thermal processing (RTP) systems and methods of use thereof are provided herein. In some embodiments, a gas distribution module for use with a RTP chamber includes: a first carrier gas line and a first liquid line fluidly coupled to a mixer, the mixer having one or more control valves configured to mix a carrier gas from the first carrier gas line and a liquid from the first liquid line in a desired ratio to form a first mixture; a vaporizer coupled to the mixer and configured to receive the first mixture in a hollow internal volume, the vaporizer having a heater configured to vaporize the first mixture; and a first gas delivery line disposed between the vaporizer and the RTP chamber to deliver the vaporized first mixture to the RTP chamber.

2. 发明授权

US12110585B2 Process chamber and exhaust liner system therefor 有权
公开(公告)号：US12110585B2
公开(公告)日：2024-10-08
申请号：US17167469
申请日：2021-02-04
申请人： APPLIED MATERIALS, INC.
发明人： Naman Apurva , Lara A. Hawrylchak , Mahesh Ramakrishna , Sriharish Srinivasan , Prashant Agarwal
IPC分类号： C23C16/44 , C23C16/455 , C23C16/458 , H01J37/32 , H01L21/67
CPC分类号： C23C16/4412 , C23C16/45517 , C23C16/45591 , C23C16/4585 , C23C16/45565 , H01J37/3244 , H01J37/32633 , H01J37/32834 , H01L21/67069
摘要： Embodiments of exhaust liner systems are provided herein. In some embodiments, an exhaust liner system for use in a process chamber includes a lower exhaust liner having an annular body with a central opening; an upper flange, a central flange, and a lower flange extending outward from the annular body, wherein the lower flange and the central flange partially define a first plenum, and wherein the central flange and the upper flange partially define a second plenum; a plurality of exhaust holes from the central opening to the first plenum; and at least one cutout in the central flange to provide a flow path from the first plenum to the second plenum, wherein the lower exhaust liner defines a gas flow path from the central opening to the first plenum via the plurality of exhaust holes and from the first plenum to the second plenum via the least one cutout.

3. 发明公开

US20240282601A1 METHODS OF SELECTIVE OXIDATION ON RAPID THERMAL PROCESSING (RTP) CHAMBER WITH ACTIVE STEAM GENERATION 审中-公开
公开(公告)号：US20240282601A1
公开(公告)日：2024-08-22
申请号：US18653955
申请日：2024-05-02
申请人： Applied Materials, Inc.
发明人： Chaitanya Anjaneyalu Prasad , Christopher Sean Olsen , Lara Hawrylchak , Erika Gabrielle Hansen , Daniel C. Glover , Naman Apurva , Tsung-Han Yang
IPC分类号： H01L21/67 , H01L21/02
CPC分类号： H01L21/67115 , H01L21/02238
摘要： Embodiments of methods of performing a selective oxidation process on non-metal surfaces are provided herein. In some embodiments, a method of performing a selective oxidation process on non-metal surfaces includes: forming a first mixture of a carrier gas and a liquid in a mixer having a mixing block coupled to one or more control valves with a mixing line disposed therebetween; flowing the first mixture from the mixer to a vaporizer to vaporize the first mixture outside of an RTP chamber; and delivering the vaporized first mixture to the RTP chamber via a gas delivery line to expose a substrate disposed in the RTP chamber with the vaporized first mixture to perform a selective oxidation process on the substrate at a temperature of about 500 to about 1100 degrees Celsius.

5. 发明授权

US10458861B2 Non-contact temperature measurement by dual-wavelength shift in Brewster's angle 有权
公开(公告)号：US10458861B2
公开(公告)日：2019-10-29
申请号：US15604317
申请日：2017-05-24
申请人： Applied Materials, Inc.
发明人： Theodore P. Moffitt , Naman Apurva
IPC分类号： G01K11/12
摘要： Embodiments disclosed herein relate to a thermal processing chamber having a substrate monitoring system. In one embodiment, a temperature monitoring system is disclosed herein. The temperature monitoring system includes a housing and a window defining an interior volume. The temperature monitoring system further includes two or more light sources, a camera, and a polarizer. The two or more light sources are disposed in the interior volume, beneath the window. A first light source of the two or more light sources has a first wavelength. A second light source of the two or more light sources has a second wavelength. A camera is disposed opposite the two or more light sources. The camera to captures a plurality of frames of two or more light beams received from the two or more light sources. The polarizer disposed in an optical path of the two or more light beams.

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