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    • 5. 发明授权
    • Methods of forming magnetoresistive memory devices
    • 形成磁阻存储器件的方法
    • US06780655B2
    • 2004-08-24
    • US10632579
    • 2003-07-31
    • John Mattson
    • John Mattson
    • H01L2100
    • G11C11/16H01L27/222H01L43/08Y10S257/903
    • The invention includes a method of forming a magnetoresistive memory device. A trench is formed in an insulative material, and the trench is partially filled with a first magnetic material to narrow the trench. The narrowed trench is at least partially filled with a conductive material. A second magnetic material is formed over the conductive material. A non-magnetic layer is formed over the second magnetic material. A third magnetic material is formed over the non-magnetic layer. The conductive material and the first and second magnetic materials are incorporated into a sense portion of the magnetoresistive memory device. The third magnetic material is incorporated into a reference portion of the magnetoresistive memory device.
    • 本发明包括形成磁阻存储器件的方法。 在绝缘材料中形成沟槽,并且沟槽部分地填充有第一磁性材料以使沟槽变窄。 变窄的沟槽至少部分地填充有导电材料。 第二磁性材料形成在导电材料上。 在第二磁性材料上形成非磁性层。 在非磁性层上形成第三磁性材料。 导电材料和第一和第二磁性材料被结合到磁阻存储器件的感测部分中。 第三磁性材料被结合到磁阻存储器件的参考部分中。