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1. 发明授权

US09602780B2 Apparatus for inspecting defect with time/spatial division optical system 有权
公开(公告)号：US09602780B2
公开(公告)日：2017-03-21
申请号：US13997496
申请日：2011-11-02
申请人： Masaaki Ito , Hidetoshi Nishiyama , Takahiro Jingu
发明人： Masaaki Ito , Hidetoshi Nishiyama , Takahiro Jingu
IPC分类号： H04N7/18 , G01N21/47 , G01N21/956 , H01L21/66 , G01N21/95
CPC分类号： H04N7/18 , G01N21/47 , G01N21/9501 , G01N21/956 , H01L22/12 , H01L2924/0002 , H01L2924/00
摘要： In a defect inspecting apparatus, the strength of a fatal defect signal decreases due to miniaturization. Thus, in order to assure a high SN ratio, it is necessary to reduce noises caused by scattered light from a wafer. Roughness of a pattern edge and surface roughness which serve as a scattered-light source are spread over the entire wafer. The present invention has discovered the fact that reduction of an illuminated area is a technique effective for decreasing noises. That is to say, the present invention has discovered the fact that creation of an illuminated area having a spot shape and reduction of the dimension of a spot beam are effective. A plurality of temporally and spatially divided spot beams are radiated to the wafer serving as a sample.

2. 发明授权

US08508727B2 Defects inspecting apparatus and defects inspecting method 有权
标题翻译：缺陷检查设备和缺陷检查方法
公开(公告)号：US08508727B2
公开(公告)日：2013-08-13
申请号：US13529363
申请日：2012-06-21
申请人： Sachio Uto , Minori Noguchi , Hidetoshi Nishiyama , Yoshimasa Ohshima , Akira Hamamatsu , Takahiro Jingu , Toshihiko Nakata , Masahiro Watanabe
发明人： Sachio Uto , Minori Noguchi , Hidetoshi Nishiyama , Yoshimasa Ohshima , Akira Hamamatsu , Takahiro Jingu , Toshihiko Nakata , Masahiro Watanabe
IPC分类号： G01N21/00
CPC分类号： G01N21/00 , G01N21/9501 , G06T7/0004 , G06T2207/30148
摘要： An inspecting apparatus and method including first and second illuminating units for illuminating a surface of a specimen to be inspected with different incident angles and first and second detecting optical units arranged at different elevation angle directions to the surface of the specimen for detecting images of the specimen illuminated by the first and second illuminating units.
摘要翻译：一种检查装置和方法，包括：第一和第二照明单元，用于以不同的入射角照射待检查样本的表面;以及第一和第二检测光学单元，其以不同的仰角方向布置在样本的表面上，用于检测样本的图像由第一和第二照明单元照亮。

3. 发明授权

US08467048B2 Pattern defect inspection apparatus and method 有权
标题翻译：图案缺陷检查装置及方法
公开(公告)号：US08467048B2
公开(公告)日：2013-06-18
申请号：US13535955
申请日：2012-06-28
申请人： Hidetoshi Nishiyama , Kei Shimura , Sachio Uto , Minori Noguchi
发明人： Hidetoshi Nishiyama , Kei Shimura , Sachio Uto , Minori Noguchi
IPC分类号： G01N21/00
CPC分类号： G01N21/95607 , G01N21/94 , G01N21/9501 , G01N2021/4711
摘要： A pattern defect inspection apparatus capable of detecting minute defects on a sample with high sensitivity without generating speckle noise in signals is realized. Substantially the same region on a surface of a wafer is detected by using two detectors at mutually different timings. Output signals from the two detectors are summed and averaged to eliminate noise. Since a large number of rays of illumination light are not simultaneously irradiated to the same region on the wafer, a pattern defect inspection apparatus capable of suppressing noise resulting from interference of a large number of rays, eliminating noise owing to other causes and detecting with high sensitivity minute defects on the sample without the occurrence of speckle noise in the signal can be accomplished.
摘要翻译：实现能够以高灵敏度检测样品上的微小缺陷而不产生信号中的斑点噪声的图案缺陷检查装置。通过在相互不同的定时使用两个检测器来检测晶片表面上的基本上相同的区域。来自两个检测器的输出信号被相加和平均以消除噪声。由于大量的照明光线不能同时照射到晶片上的相同区域，所以能够抑制由于大量光线的干扰而产生的噪声的图案缺陷检查装置，消除由于其它原因引起的噪声和高检测可以实现样品上的灵敏度微小缺陷，而不会在信号中发生斑点噪声。

4. 发明授权

US08435594B2 Evaporation apparatus, method of manufacturing anode using same, and method of manufacturing battery using same 有权
标题翻译：蒸发装置，使用该阳极的阳极的制造方法以及使用其制造电池的方法
公开(公告)号：US08435594B2
公开(公告)日：2013-05-07
申请号：US12197731
申请日：2008-08-25
申请人： Isamu Konishiike , Chisato Okina , Keisuke Tanabe , Atsuhiro Abe , Hidetoshi Nishiyama , Kenichi Kawase , Shunsuke Kurasawa , Koichi Matsumoto
发明人： Isamu Konishiike , Chisato Okina , Keisuke Tanabe , Atsuhiro Abe , Hidetoshi Nishiyama , Kenichi Kawase , Shunsuke Kurasawa , Koichi Matsumoto
IPC分类号： B05D5/12 , C23C14/00
CPC分类号： C23C14/562 , H01M4/0421 , H01M4/131 , H01M4/1395 , H01M4/661 , H01M10/052 , H01M2200/106
摘要： An evaporation apparatus that is capable of stably forming a good quality thin film and is highly suitable for mass production is provided. The evaporation apparatus include an evaporation source discharging an evaporation material by heating, a retention member retaining an evaporation object, and a heat shield member that is located between the evaporation source and the evaporation object retained by the retention member, has an opening for passing the evaporation material in a state of vapor phase from the evaporation source to the evaporation object, and shields the evaporation object from part of radiation heat of the evaporation source. The heat shield member is located closer to the evaporation source than to the retention member.
摘要翻译：提供能够稳定地形成优质薄膜并且高度适合批量生产的蒸发装置。蒸发装置包括通过加热排出蒸发材料的蒸发源，保持蒸发物体的保持构件和位于蒸发源和由保持构件保留的蒸发物体之间的隔热构件，具有用于使蒸发物质通过的开口从蒸发源到蒸发物体处于气相状态的蒸发材料，并且将蒸发物体与蒸发源的辐射热屏蔽。隔热构件位于比保持构件更靠近蒸发源的位置。

5. 发明申请

US20130002849A1 METHOD AND APPARATUS FOR PATTERN INSPECTION 审中-公开
标题翻译：方法和装置的模式检查
公开(公告)号：US20130002849A1
公开(公告)日：2013-01-03
申请号：US13608501
申请日：2012-09-10
申请人： Kaoru SAKAI , Shunji MAEDA , Hidetoshi NISHIYAMA
发明人： Kaoru SAKAI , Shunji MAEDA , Hidetoshi NISHIYAMA
IPC分类号： G06K9/00 , H04N7/18
CPC分类号： G06T7/001 , G06T2207/30148
摘要： According to the present invention, for a pattern inspection apparatus that compares images in corresponding areas of two patterns that are identical and that determines an unmatched portion between the images is a defect, a plurality of detection systems and a plurality of corresponding image comparison methods are provided. With this configuration, the affect of uneven brightnesses for a pattern that occurs due to differences in film thicknesses can be reduced, a highly sensitive pattern inspection can be performed, a variety of defects can be revealed, and the pattern inspection apparatus can be applied for processing performed within a wide range. Furthermore, the pattern inspection apparatus also includes a unit for converting the tone of image signals of comparison images for a plurality of different processing units, and when a difference in brightness occurs in the same pattern of the images, a defect can be correctly detected.
摘要翻译：根据本发明，对于对相同的两个图案的相应区域中的图像进行比较并且确定图像之间的不匹配部分的图像的图案检查装置是缺陷，多个检测系统和多个对应的图像比较方法是提供。利用这种结构，可以降低由于膜厚度差异而产生的图案的不均匀亮度的影响，可以进行高灵敏度图案检查，可以显示各种缺陷，并且图案检查装置可以应用于在广泛的范围内进行处理。此外，图案检查装置还包括用于转换多个不同处理单元的比较图像的图像信号的色调的单元，并且当在相同图案中出现亮度差时，可以正确地检测缺陷。

6. 发明授权

US08269959B2 Inspection method and inspection apparatus 有权
标题翻译：检验方法和检验仪器
公开(公告)号：US08269959B2
公开(公告)日：2012-09-18
申请号：US13347245
申请日：2012-01-10
申请人： Akira Hamamatsu , Minori Noguchi , Hidetoshi Nishiyama , Yoshimasa Ohshima , Takahiro Jingu , Sachio Uto
发明人： Akira Hamamatsu , Minori Noguchi , Hidetoshi Nishiyama , Yoshimasa Ohshima , Takahiro Jingu , Sachio Uto
IPC分类号： G01N21/00
CPC分类号： G01N21/8806 , G01N21/94 , G01N21/9501 , G01N21/95623
摘要： The present invention provides an inspection apparatus and inspection method. The inspection apparatus includes a stage mechanism for supporting an object under inspection. A spatial filter is provided in the detection optical system to inspect the object. A printer is used to print the results of the spatial filter. The spatial filter can be provided in the form of a Fourier transformed image.
摘要翻译：本发明提供一种检查装置和检查方法。检查装置包括用于支撑被检查物体的台架机构。在检测光学系统中设置空间滤波器来检查物体。打印机用于打印空间滤镜的结果。空间滤波器可以以傅里叶变换图像的形式提供。

7. 发明授权

US08254662B2 System for monitoring foreign particles, process processing apparatus and method of electronic commerce 有权
标题翻译：电子商务监控系统，工艺处理装置及电子商务方法
公开(公告)号：US08254662B2
公开(公告)日：2012-08-28
申请号：US13231418
申请日：2011-09-13
申请人： Hidetoshi Nishiyama , Minori Noguchi , Tetsuya Watanabe , Takuaki Sekiguchi
发明人： Hidetoshi Nishiyama , Minori Noguchi , Tetsuya Watanabe , Takuaki Sekiguchi
IPC分类号： G06K9/00
CPC分类号： G01N21/94 , G01N21/9501 , Y02P90/04 , Y02P90/14 , Y02P90/18 , Y02P90/265
摘要： A system for monitoring foreign matter includes a manufacturing line having plural process processing apparatuses, a production management system which manages the processing of workpieces in the manufacturing line, plural optical heads which monitor foreign matter in relation to at least one of the workpieces, and which provide an output signal indicative thereof, and at least one image signal processing unit provided in a lesser number than a number of the plural optical heads for processing the output signal therefrom.
摘要翻译：用于监测异物的系统包括具有多个处理处理装置的生产线，管理制造线中的工件的处理的生产管理系统，与至少一个工件相关地监视异物的多个光学头，以及提供指示其的输出信号，以及至少一个图像信号处理单元，其以比用于处理其输出信号的多个光学头的数量少的数量提供。

8. 发明授权

US08228495B2 Defects inspecting apparatus and defects inspecting method 有权
标题翻译：缺陷检查设备和缺陷检查方法
公开(公告)号：US08228495B2
公开(公告)日：2012-07-24
申请号：US13221935
申请日：2011-08-31
申请人： Sachio Uto , Minori Noguchi , Hidetoshi Nishiyama , Yoshimasa Ohshima , Akira Hamamatsu , Takahiro Jingu , Toshihiko Nakata , Masahiro Watanabe
发明人： Sachio Uto , Minori Noguchi , Hidetoshi Nishiyama , Yoshimasa Ohshima , Akira Hamamatsu , Takahiro Jingu , Toshihiko Nakata , Masahiro Watanabe
IPC分类号： G01N21/00
CPC分类号： G01N21/00 , G01N21/9501 , G06T7/0004 , G06T2207/30148
摘要： An inspecting apparatus and method including first and second illuminating units for illuminating a surface of a specimen to be inspected with different incident angles and first and second detecting optical units arranged at different elevation angle directions to the surface of the specimen for detecting images of the specimen illuminated by the first and second illuminating units.
摘要翻译：一种检查装置和方法，包括：第一和第二照明单元，用于以不同的入射角照射待检查样本的表面;以及第一和第二检测光学单元，其以不同的仰角方向布置在样本的表面上，用于检测样本的图像由第一和第二照明单元照亮。

9. 发明授权

US08045146B2 Method and apparatus for reviewing defect 有权
标题翻译：检查缺陷的方法和装置
公开(公告)号：US08045146B2
公开(公告)日：2011-10-25
申请号：US12141955
申请日：2008-06-19
申请人： Keiya Saito , Yasuhiro Yoshitake , Shunichi Matsumoto , Hidetoshi Nishiyama
发明人： Keiya Saito , Yasuhiro Yoshitake , Shunichi Matsumoto , Hidetoshi Nishiyama
IPC分类号： G01N21/00 , G01J4/00
CPC分类号： G01N21/8806 , G01N21/9501 , G01N2021/8822 , G01N2021/8861 , G02B21/0032 , G02B21/0072
摘要： The present invention provides an apparatus and a method for reviewing a defect with high throughput by detecting the defect to be reviewed with high sensitivity, comprising: an optical microscope; a correction means; and a scanning electron microscope which reviews the existing defect on the sample; wherein the optical microscope has: an optical height detection system which optically detects a vertical position of an upper surface of the sample placed on the stage; an illumination optical system which illuminates the defect with light; an image detection optical system which converges and detects reflected light or scattered light generated from the defect illuminated by the illumination optical system to obtain an image signal; and a focus adjusting means which adjusts a focus position of the optical microscope based on the vertical position of the upper surface of the sample, which is detected by the optical height detection system.
摘要翻译：本发明提供一种通过以高灵敏度检测待检查的缺陷来检查具有高通量的缺陷的装置和方法，包括：光学显微镜; 修正手段; 和扫描电子显微镜，用于回顾样品上现有的缺陷; 其中所述光学显微镜具有：光学高度检测系统，其光学地检测放置在所述台上的样品的上表面的垂直位置; 用光照亮缺陷的照明光学系统; 会聚和检测由照明光学系统照射的缺陷产生的反射光或散射光以获得图像信号的图像检测光学系统; 以及焦点调节装置，其基于由光学高度检测系统检测到的样本的上表面的垂直位置来调整光学显微镜的对焦位置。

10. 发明授权

US08013989B2 Defects inspecting apparatus and defects inspecting method 有权
标题翻译：缺陷检查设备和缺陷检查方法
公开(公告)号：US08013989B2
公开(公告)日：2011-09-06
申请号：US12823510
申请日：2010-06-25
申请人： Sachio Uto , Minori Noguchi , Hidetoshi Nishiyama , Yoshimasa Ohshima , Akira Hamamatsu , Takahiro Jingu , Toshihiko Nakata , Masahiro Watanabe
发明人： Sachio Uto , Minori Noguchi , Hidetoshi Nishiyama , Yoshimasa Ohshima , Akira Hamamatsu , Takahiro Jingu , Toshihiko Nakata , Masahiro Watanabe
IPC分类号： G01N21/00
CPC分类号： G01N21/00 , G01N21/9501 , G06T7/0004 , G06T2207/30148
摘要： An inspecting apparatus and method including first and second illuminating units for illuminating a surface of a specimen to be inspected with different incident angles and first and second detecting optical units arranged at different elevation angle directions to the surface of the specimen for detecting images of the specimen illuminated by the first and second illuminating units.
摘要翻译：一种检查装置和方法，包括：第一和第二照明单元，用于以不同的入射角照射待检查样本的表面;以及第一和第二检测光学单元，其以不同的仰角方向布置在样本的表面上，用于检测样本的图像由第一和第二照明单元照亮。

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