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1. 发明授权

US08045148B2 System for monitoring foreign particles, process processing apparatus and method of electronic commerce 有权
标题翻译：电子商务监控系统，工艺处理装置及电子商务方法
公开(公告)号：US08045148B2
公开(公告)日：2011-10-25
申请号：US12395848
申请日：2009-03-02
申请人： Hidetoshi Nishiyama , Minori Noguchi , Tetsuya Watanabe , Takuaki Sekiguchi
发明人： Hidetoshi Nishiyama , Minori Noguchi , Tetsuya Watanabe , Takuaki Sekiguchi
IPC分类号： G01N21/00
CPC分类号： G01N21/94 , G01N21/9501 , Y02P90/04 , Y02P90/14 , Y02P90/18 , Y02P90/265
摘要： A system for monitoring foreign matter includes a manufacturing line having plural process processing apparatuses, a production management system which manages the processing of workpieces in the manufacturing line, plural optical heads which monitor foreign matter in relation to at least one of the workpieces, and which provide an output signal indicative thereof, and at least one image signal processing unit provided in a lesser number than a number of the plural optical heads for processing the output signal therefrom.
摘要翻译：用于监测异物的系统包括具有多个处理处理装置的生产线，管理制造线中的工件的处理的生产管理系统，与至少一个工件相关地监视异物的多个光学头，以及提供指示其的输出信号，以及至少一个图像信号处理单元，其以比用于处理其输出信号的多个光学头的数量少的数量提供。

2. 发明申请

US20070165212A1 System for monitoring foreign particles, process processing apparatus and method of electronic commerce 失效
标题翻译：电子商务监控系统，工艺处理装置及电子商务方法
公开(公告)号：US20070165212A1
公开(公告)日：2007-07-19
申请号：US11727037
申请日：2007-03-23
申请人： Hidetoshi Nishiyama , Minori Noguchi , Tetsuya Watanabe , Takuaki Sekiguchi
发明人： Hidetoshi Nishiyama , Minori Noguchi , Tetsuya Watanabe , Takuaki Sekiguchi
IPC分类号： G01N21/88
CPC分类号： G01N21/94 , G01N21/9501 , Y02P90/04 , Y02P90/14 , Y02P90/18 , Y02P90/265
摘要： A system for monitoring foreign matter includes a manufacturing line having plural process processing apparatuses, a production management system which manages the processing of workpieces in the manufacturing line, plural optical heads which monitor foreign matter in relation to at least one of the workpieces, and which provide an output signal indicative thereof, and at least one image signal processing unit provided in a lesser number than a number of the plural optical heads for processing the output signal therefrom.
摘要翻译：用于监测异物的系统包括具有多个处理处理装置的生产线，管理制造线中的工件的处理的生产管理系统，与至少一个工件相关地监视异物的多个光学头，以及提供指示其的输出信号，以及至少一个图像信号处理单元，其以比用于处理其输出信号的多个光学头的数量少的数量提供。

3. 发明授权

US08254662B2 System for monitoring foreign particles, process processing apparatus and method of electronic commerce 有权
标题翻译：电子商务监控系统，工艺处理装置及电子商务方法
公开(公告)号：US08254662B2
公开(公告)日：2012-08-28
申请号：US13231418
申请日：2011-09-13
申请人： Hidetoshi Nishiyama , Minori Noguchi , Tetsuya Watanabe , Takuaki Sekiguchi
发明人： Hidetoshi Nishiyama , Minori Noguchi , Tetsuya Watanabe , Takuaki Sekiguchi
IPC分类号： G06K9/00
CPC分类号： G01N21/94 , G01N21/9501 , Y02P90/04 , Y02P90/14 , Y02P90/18 , Y02P90/265
摘要： A system for monitoring foreign matter includes a manufacturing line having plural process processing apparatuses, a production management system which manages the processing of workpieces in the manufacturing line, plural optical heads which monitor foreign matter in relation to at least one of the workpieces, and which provide an output signal indicative thereof, and at least one image signal processing unit provided in a lesser number than a number of the plural optical heads for processing the output signal therefrom.
摘要翻译：用于监测异物的系统包括具有多个处理处理装置的生产线，管理制造线中的工件的处理的生产管理系统，与至少一个工件相关地监视异物的多个光学头，以及提供指示其的输出信号，以及至少一个图像信号处理单元，其以比用于处理其输出信号的多个光学头的数量少的数量提供。

4. 发明申请

US20120002196A1 System For Monitoring Foreign Particles, Process Processing Apparatus And Method Of Electronic Commerce 有权
标题翻译：电子商务监控系统，过程处理装置及方法
公开(公告)号：US20120002196A1
公开(公告)日：2012-01-05
申请号：US13231418
申请日：2011-09-13
申请人： Hidetoshi Nishiyama , Minori Noguchi , Tetsuya Watanabe , Takuaki Sekiguchi
发明人： Hidetoshi Nishiyama , Minori Noguchi , Tetsuya Watanabe , Takuaki Sekiguchi
IPC分类号： G01N21/88 , G01N21/00
CPC分类号： G01N21/94 , G01N21/9501 , Y02P90/04 , Y02P90/14 , Y02P90/18 , Y02P90/265
摘要： A system for monitoring foreign matter includes a manufacturing line having plural process processing apparatuses, a production management system which manages the processing of workpieces in the manufacturing line, plural optical heads which monitor foreign matter in relation to at least one of the workpieces, and which provide an output signal indicative thereof, and at least one image signal processing unit provided in a lesser number than a number of the plural optical heads for processing the output signal therefrom.
摘要翻译：用于监测异物的系统包括具有多个处理处理装置的生产线，管理制造线中的工件的处理的生产管理系统，与至少一个工件相关地监视异物的多个光学头，以及提供指示其的输出信号，以及至少一个图像信号处理单元，其以比用于处理其输出信号的多个光学头的数量少的数量提供。

5. 发明申请

US20090177413A1 System For Monitoring Foreign Particles, Process Processing Apparatus And Method Of Electronic Commerce 有权
标题翻译：电子商务监控系统，过程处理装置及方法
公开(公告)号：US20090177413A1
公开(公告)日：2009-07-09
申请号：US12395848
申请日：2009-03-02
申请人： Hidetoshi Nishiyama , Minori Noguchi , Tetsuya Watanabe , Takuaki Sekiguchi
发明人： Hidetoshi Nishiyama , Minori Noguchi , Tetsuya Watanabe , Takuaki Sekiguchi
IPC分类号： G06F19/00 , G06F15/00
CPC分类号： G01N21/94 , G01N21/9501 , Y02P90/04 , Y02P90/14 , Y02P90/18 , Y02P90/265
摘要： A system for monitoring foreign matter includes a manufacturing line having plural process processing apparatuses, a production management system which manages the processing of workpieces in the manufacturing line, plural optical heads which monitor foreign matter in relation to at least one of the workpieces, and which provide an output signal indicative thereof, and at least one image signal processing unit provided in a lesser number than a number of the plural optical heads for processing the output signal therefrom.
摘要翻译：用于监测异物的系统包括具有多个处理处理装置的生产线，管理制造线中的工件的处理的生产管理系统，与至少一个工件相关地监视异物的多个光学头，以及提供指示其的输出信号，以及至少一个图像信号处理单元，其以比用于处理其输出信号的多个光学头的数量少的数量提供。

6. 发明授权

US07499157B2 System for monitoring foreign particles, process processing apparatus and method of electronic commerce 失效
标题翻译：电子商务监控系统，工艺处理装置及电子商务方法
公开(公告)号：US07499157B2
公开(公告)日：2009-03-03
申请号：US11727037
申请日：2007-03-23
申请人： Hidetoshi Nishiyama , Minori Noguchi , Tetsuya Watanabe , Takuaki Sekiguchi
发明人： Hidetoshi Nishiyama , Minori Noguchi , Tetsuya Watanabe , Takuaki Sekiguchi
IPC分类号： G01N21/00
CPC分类号： G01N21/94 , G01N21/9501 , Y02P90/04 , Y02P90/14 , Y02P90/18 , Y02P90/265
摘要： A system for monitoring foreign matter includes a manufacturing line having plural process processing apparatuses, a production management system which manages the processing of workpieces in the manufacturing line, plural optical heads which monitor foreign matter in relation to at least one of the workpieces, and which provide an output signal indicative thereof, and at least one image signal processing unit provided in a lesser number than a number of the plural optical heads for processing the output signal therefrom.
摘要翻译：用于监测异物的系统包括具有多个处理处理装置的生产线，管理制造线中的工件的处理的生产管理系统，与至少一个工件相关地监视异物的多个光学头，以及提供指示其的输出信号，以及至少一个图像信号处理单元，其以比用于处理其输出信号的多个光学头的数量少的数量提供。

7. 发明授权

US07196785B2 System for monitoring foreign particles, process processing apparatus and method of electronic commerce 有权
标题翻译：电子商务监控系统，工艺处理装置及电子商务方法
公开(公告)号：US07196785B2
公开(公告)日：2007-03-27
申请号：US10630734
申请日：2003-07-31
申请人： Hidetoshi Nishiyama , Minori Noguchi , Tetsuya Watanabe , Takuaki Sekiguchi
发明人： Hidetoshi Nishiyama , Minori Noguchi , Tetsuya Watanabe , Takuaki Sekiguchi
IPC分类号： G01N21/89
CPC分类号： G01N21/94 , G01N21/9501 , Y02P90/04 , Y02P90/14 , Y02P90/18 , Y02P90/265
摘要： A foreign matter monitoring system comprises: a production management system which manages the processing of workpieces in a manufacture line; foreign matter monitors mounted as on-machine equipment in plural process processing apparatuses of the manufacture line, said foreign matter monitors each having an optical head containing a detecting optical system for irradiating a workpiece with light and a detecting optical system for receiving reflected and scattered light from the workpiece and converting the received light to a detection image signal and an A/D converter for converting the detection image signal, which is obtained through conversion by the detecting optical system, to a detection digital image signal; and a base system having a control unit for acquiring control information, a buffer memory for storing said detection digital image signal which is acquired from each foreign matter monitor, a database storing inspection recipes each associated with a foreign matter monitor and an image signal processing unit used for, based on a detection digital image signal associated with a foreign matter monitor and acquired from the buffer memory, judging whether foreign matter and other defects are present on a workpiece according to an inspection recipe which is selected for the corresponding foreign matter monitor based on control information from the control unit.
摘要翻译：异物监测系统包括：管理制造线中的工件的加工的生产管理系统; 异物监视器作为机器设备安装在制造线的多个处理处理装置中，所述异物监视器具有包含用于向工件照射的照明光学系统的光学头和光学系统的光学头，所述光学系统用于接收来自所述制造线的反射和散射光将所接收的光转换为检测图像信号;以及A / D转换器，用于将通过检测光学系统的转换获得的检测图像信号转换为检测数字图像信号; 以及具有用于获取控制信息的控制单元的基本系统，用于存储从每个异物监视器获取的所述检测数字图像信号的缓冲存储器，存储与异物监视器相关联的检查配方的数据库和图像信号处理单元用于基于与异物监视器相关联并从缓冲存储器获取的检测数字图像信号，根据为相应的异物监视器选择的检查配方来判断异物是否存在于工件上关于来自控制单元的控制信息。

8. 发明申请

US20120312104A1 METHOD OF INSPECTING A SEMICONDUCTOR DEVICE AND AN APPARATUS THEREOF 有权
标题翻译：检查半导体器件的方法及其装置
公开(公告)号：US20120312104A1
公开(公告)日：2012-12-13
申请号：US13593171
申请日：2012-08-23
申请人： Akira HAMAMATSU , Minori Noguchi , Yoshimasa Ohshima , Hidetoshi Nishiyama , Kenji Oka , Takanori Ninomiya , Maki Tanaka , Kenji Watanabe , Tetsuya Watanabe , Yoshio Morishige
发明人： Akira HAMAMATSU , Minori Noguchi , Yoshimasa Ohshima , Hidetoshi Nishiyama , Kenji Oka , Takanori Ninomiya , Maki Tanaka , Kenji Watanabe , Tetsuya Watanabe , Yoshio Morishige
IPC分类号： G01N21/88
CPC分类号： G06T7/001 , G01N21/8851 , G01N21/9501 , G01N2021/8861 , G01N2021/8867 , G06T7/97 , G06T2207/10152 , G06T2207/30148
摘要： A method and apparatus of inspecting a sample, in which the sample is inspected under a plurality of inspection conditions, and inspection data obtained by inspecting the sample under each of the plurality of inspection conditions and position information on the sample of the inspection date in correspondence with the respective inspection conditions, are stored. The inspection data for each of the plurality of inspection conditions is against each other by the use of the position information on the sample to determine a position to be inspected in detail, and an image of the sample at a position to be inspected in detail is obtained. The obtained image is classified, the inspection condition of the sample by the use of information of classification of the image is determined.
摘要翻译：在多个检查条件下对样本进行检查的检查方法和装置以及在多个检查条件下检查样本而获得的检查数据和对应于检查日期样本的位置信息具有相应的检查条件。多个检查条件中的每一个的检查数据通过使用关于样本的位置信息彼此相对来确定待检查的位置，并且在待检查位置处的样本的图像是详细的获得。对所获得的图像进行分类，确定通过使用图像分类信息的样本的检查条件。

9. 发明授权

US07411207B2 Method and its apparatus for inspecting particles or defects of a semiconductor device 有权
标题翻译：用于检查半导体器件的颗粒或缺陷的方法及其装置
公开(公告)号：US07411207B2
公开(公告)日：2008-08-12
申请号：US11782760
申请日：2007-07-25
申请人： Hidetoshi Nishiyama , Minori Noguchi , Yoshimasa Ohshima , Akira Hamamatsu , Kenji Watanabe , Tetsuya Watanabe , Takahiro Jingu
发明人： Hidetoshi Nishiyama , Minori Noguchi , Yoshimasa Ohshima , Akira Hamamatsu , Kenji Watanabe , Tetsuya Watanabe , Takahiro Jingu
IPC分类号： G01N21/88
CPC分类号： G01N21/274 , G01N21/47 , G01N21/4738 , G01N21/8806 , G01N21/94 , G01N21/95 , G01N21/956 , G01N2021/8854
摘要： An apparatus for inspecting particles and/or pattern defects of an object under inspection. Data processing means obtains information on size of the particles and/or the pattern defects from an intensity of the scattered light detected by the light detecting means by referring to a relationship between an intensity of scattered light from a standard particle and a size of the standard particle, and using a calibration coefficient for compensating for a change in intensity of the light of the illuminating means from a predetermined intensity.
摘要翻译：一种用于检查被检查物体的颗粒和/或图案缺陷的装置。数据处理装置通过参考来自标准粒子的散射光的强度与标准尺寸之间的关系，从光检测装置检测到的散射光的强度获得关于颗粒尺寸和/或图案缺陷的信息并且使用用于从预定强度补偿照明装置的光的强度变化的校准系数。

10. 发明申请

US20070265797A1 METHOD AND ITS APPARATUS FOR INSPECTING PARTICLES OR DEFECTS OF A SEMICONDUCTOR DEVICE 有权
标题翻译：用于检查半导体器件的颗粒或缺陷的方法及其装置
公开(公告)号：US20070265797A1
公开(公告)日：2007-11-15
申请号：US11782760
申请日：2007-07-25
申请人： Hidetoshi Nishiyama , Minori Noguchi , Yoshimasa Ohshima , Akira Hamamatsu , Kenji Watanabe , Tetsuya Watanabe , Takahiro Jingu
发明人： Hidetoshi Nishiyama , Minori Noguchi , Yoshimasa Ohshima , Akira Hamamatsu , Kenji Watanabe , Tetsuya Watanabe , Takahiro Jingu
IPC分类号： G06F15/00
CPC分类号： G01N21/274 , G01N21/47 , G01N21/4738 , G01N21/8806 , G01N21/94 , G01N21/95 , G01N21/956 , G01N2021/8854
摘要： An apparatus for inspecting particles and/or pattern defects of an object under inspection. Data processing means obtains information on size of the particles and/or the pattern defects from an intensity of the scattered light detected by the light detecting means by referring to a relationship between an intensity of scattered light from a standard particle and a size of the standard particle, and using a calibration coefficient for compensating for a change in intensity of the light of the illuminating means from a predetermined intensity.
摘要翻译：一种用于检查被检查物体的颗粒和/或图案缺陷的装置。数据处理装置通过参考来自标准粒子的散射光的强度与标准尺寸之间的关系，从光检测装置检测到的散射光的强度获得关于颗粒尺寸和/或图案缺陷的信息并且使用用于从预定强度补偿照明装置的光的强度变化的校准系数。

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