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1. 发明授权

US5792280A Method for fabricating silicon cells 失效
标题翻译：制造硅电池的方法
公开(公告)号：US5792280A
公开(公告)日：1998-08-11
申请号：US820969
申请日：1996-12-27
申请人： Douglas S. Ruby , Paul A. Basore , W. Kent Schubert
发明人： Douglas S. Ruby , Paul A. Basore , W. Kent Schubert
IPC分类号： H01L31/0216 , H01L31/0236 , H01L31/068 , H01L31/18 , H01L31/00
CPC分类号： H01L31/1804 , H01L31/02167 , H01L31/0236 , H01L31/068 , Y02E10/547 , Y02P70/521
摘要： A process for making high-efficiency solar cells. This is accomplished by forming a diffusion junction and a passivating oxide layer in a single high-temperature process step. The invention includes the class of solar cells made using this process, including high-efficiency solar cells made using Czochralski-grown silicon.
摘要翻译：制造高效太阳能电池的工艺。这通过在单个高温工艺步骤中形成扩散结和钝化氧化物层来实现。本发明包括使用该方法制造的太阳能电池类，包括使用切克劳斯基生长的硅制造的高效太阳能电池。

2. 发明授权

US6091021A Silicon cells made by self-aligned selective-emitter plasma-etchback process 有权
标题翻译：通过自对准选择发射体等离子体回蚀法制造的硅电池
公开(公告)号：US6091021A
公开(公告)日：2000-07-18
申请号：US191319
申请日：1998-11-13
申请人： Douglas S. Ruby , William K. Schubert , James M. Gee , Saleem H. Zaidi
发明人： Douglas S. Ruby , William K. Schubert , James M. Gee , Saleem H. Zaidi
IPC分类号： H01L31/0216 , H01L31/068 , H01L31/18 , H01L31/00
CPC分类号： H01L31/02167 , H01L31/02168 , H01L31/068 , H01L31/1804 , H01L31/186 , Y02E10/547 , Y02P70/521
摘要： Photovoltaic cells and methods for making them are disclosed wherein the metallized grids of the cells are used to mask portions of cell emitter regions to allow selective etching of phosphorus-doped emitter regions. The preferred etchant is SF.sub.6 or a combination of SF.sub.6 and O.sub.2. This self-aligned selective etching allows for enhanced blue response (versus cells with uniform heavy doping of the emitter) while preserving heavier doping in the region beneath the gridlines needed for low contact resistance. Embodiments are disclosed for making cells with or without textured surfaces. Optional steps include plasma hydrogenation and PECVD nitride deposition, each of which are suited to customized applications for requirements of given cells to be manufactured. The techniques disclosed could replace expensive and difficult alignment methodologies used to obtain selectively etched emitters, and they may be easily integrated with existing plasma processing methods and techniques of the invention may be accomplished in a single plasma-processing chamber.
摘要翻译：公开了光伏电池及其制造方法，其中使用电池的金属化网格来掩蔽电池发射极区域的部分，以允许选择性地蚀刻磷掺杂的发射极区域。优选的蚀刻剂是SF 6或SF 6和O 2的组合。这种自对准选择性蚀刻允许增强的蓝色响应（相对于具有均匀的重掺杂发射体的单元），同时在低接触电阻所需的网格线下方的区域中保持较重的掺杂。公开了用于制造具有或不具有纹理表面的单元的实施例。可选步骤包括等离子体氢化和PECVD氮化物沉积，其中每一种适合于要制造的给定电池的要求的定制应用。所公开的技术可以代替用于获得选择性蚀刻的发射体的昂贵和困难的对准方法，并且它们可以容易地与现有等离子体处理方法集成，并且本发明的技术可以在单个等离子体处理室中实现。

3. 发明授权

US5871591A Silicon solar cells made by a self-aligned, selective-emitter, plasma-etchback process 失效
标题翻译：硅太阳能电池通过自对准，选择性发射极，等离子体回蚀工艺制成
公开(公告)号：US5871591A
公开(公告)日：1999-02-16
申请号：US742378
申请日：1996-11-01
申请人： Douglas S. Ruby , William K. Schubert , James M. Gee
发明人： Douglas S. Ruby , William K. Schubert , James M. Gee
IPC分类号： H01L31/0216 , H01L31/068 , H01L31/18 , H01L31/00
CPC分类号： H01L31/186 , H01L31/02167 , H01L31/02168 , H01L31/068 , H01L31/1804 , Y02E10/547 , Y02P70/521
摘要： A potentially low-cost process for forming and passivating a selective emitter. The process uses a plasma etch of the heavily doped emitter to improve its performance. The grids of the solar cell are used to mask the plasma etch so that only the emitter in the region between the grids is etched, while the region beneath the grids remains heavily doped for low contact resistance. This process is potentially low-cost because it requires no alignment. After the emitter etch, a silicon nitride layer is deposited by plasma-enhanced, chemical vapor deposition, and the solar cell is annealed in a forming gas.
摘要翻译：用于形成和钝化选择性发射极的潜在的低成本工艺。该方法使用重掺杂发射极的等离子体蚀刻来改善其性能。太阳能电池的栅格用于掩蔽等离子体蚀刻，使得仅栅极之间的区域中的发射极被蚀刻，而栅极下方的区域保持重掺杂以实现低接触电阻。这个过程是潜在的低成本的，因为它不需要对齐。在发射体蚀刻之后，通过等离子体增强的化学气相沉积沉积氮化硅层，并且太阳能电池在形成气体中退火。

4. 发明授权

US06750391B2 Aternating current photovoltaic building block 有权
标题翻译：交流电光伏建筑块
公开(公告)号：US06750391B2
公开(公告)日：2004-06-15
申请号：US10280530
申请日：2002-10-25
申请人： Ward Issac Bower , Michael G. Thomas , Douglas S. Ruby
发明人： Ward Issac Bower , Michael G. Thomas , Douglas S. Ruby
IPC分类号： H01L31048
CPC分类号： H02J3/383 , H02S20/23 , H02S40/32 , Y02B10/12 , Y02B10/14 , Y02E10/563 , Y10S136/291 , Y10S136/293 , Y10S323/906
摘要： A modular apparatus for and method of alternating current photovoltaic power generation comprising via a photovoltaic module, generating power in the form of direct current; and converting direct current to alternating current and exporting power via one or more power conversion and transfer units attached to the module, each unit comprising a unitary housing extending a length or width of the module, which housing comprises: contact means for receiving direct current from the module; one or more direct current-to-alternating current inverters; an alternating current bus; and contact means for receiving alternating current from the one or more inverters.
摘要翻译：一种用于交流电光伏发电的模块化装置和方法，包括经由光伏模块，以直流形式发电; 并且通过经由连接到所述模块的一个或多个功率转换和传送单元将直流电流转换成交流电和输出功率，每个单元包括延伸模块的长度或宽度的整体外壳，所述壳体包括：接触装置，模块; 一个或多个直流电流 - 交流逆变器; 交流总线; 以及用于从一个或多个逆变器接收交流电的接触装置。

5. 发明授权

US06329296B1 Metal catalyst technique for texturing silicon solar cells 有权
标题翻译：用于纹理硅太阳能电池的金属催化剂技术
公开(公告)号：US06329296B1
公开(公告)日：2001-12-11
申请号：US09634905
申请日：2000-08-09
申请人： Douglas S. Ruby , Saleem H. Zaidi
发明人： Douglas S. Ruby , Saleem H. Zaidi
IPC分类号： H01L2100
CPC分类号： H01L21/31111 , H01L31/02363 , Y02E10/50
摘要： Textured silicon solar cells and techniques for their manufacture utilizing metal sources to catalyze formation of randomly distributed surface features such as nanoscale pyramidal and columnar structures. These structures include dimensions smaller than the wavelength of incident light, thereby resulting in a highly effective anti-reflective surface. According to the invention, metal sources present in a reactive ion etching chamber permit impurities (e.g. metal particles) to be introduced into a reactive ion etch plasma resulting in deposition of micro-masks on the surface of a substrate to be etched. Separate embodiments are disclosed including one in which the metal source includes one or more metal-coated substrates strategically positioned relative to the surface to be textured, and another in which the walls of the reaction chamber are pre-conditioned with a thin coating of metal catalyst material.
摘要翻译：纹理硅太阳能电池及其制造技术利用金属源催化随机分布的表面特征如纳米锥体和柱状结构的形成。这些结构的尺寸小于入射光的波长，从而形成高度有效的抗反射表面。根据本发明，存在于反应离子蚀刻室中的金属源允许将杂质（例如金属颗粒）引入到反应离子蚀刻等离子体中，导致微掩模沉积在待蚀刻的基底的表面上。公开了单独的实施例，包括其中金属源包括相对于要织构的表面有策略地定位的一个或多个金属涂覆的基底的另一个，其中反应室的壁用金属催化剂的薄涂层进行预处理材料。

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