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    • 2. 发明公开
    • 화학-기계적 연마 슬러리 조성물
    • 化学机械抛光浆料组合物
    • KR1020130071089A
    • 2013-06-28
    • KR1020110138411
    • 2011-12-20
    • 주식회사 동진쎄미켐
    • 김종원박혜정신종철박종대
    • C09K3/14C07D233/12H01L21/304H01L21/306
    • C09G1/02C09G1/04C09K3/1409C09K3/1463H01L21/30625H01L21/3212
    • PURPOSE: A chemical-mechanical abrasion slurry composition is provided to remarkably reduce abrasion rate of an interlayer insulating film, thereby conduct a planarization of an insulating film with a stepped region. CONSTITUTION: A chemical-mechanical abrasion slurry composition comprises an abrasive particle, a pH modifier, a pH buffer agent, water, and an ionic liquid represented by chemical formula 1. In chemical formula 1, each of R1 and R2 is C1-10 alkyl group; X^- is a monovalent anion. The abrasive particle is selected from colloidal silica, fumed silica, alumina, ceria, titania, zirconia, and a mixture thereof. The pH modifier is selected from phosphoric acid, hydrochloric acid, sulfuric acid, nitric acid, ammonia, potassium hydroxide, tetramethyl ammonium hydroxide, tetraethyl ammonium hydroxide, and a mixture thereof.
    • 目的:提供化学 - 机械磨料浆料组合物,以显着降低层间绝缘膜的磨损率,从而进行具有阶梯状区域的绝缘膜的平坦化。 构成:化学机械磨料浆料组合物包含磨料颗粒,pH调节剂,pH缓冲剂,水和由化学式1表示的离子液体。在化学式1中,R 1和R 2各自为C 1-10烷基 组; X ^ - 是一价阴离子。 研磨颗粒选自胶体二氧化硅,热解法二氧化硅,氧化铝,二氧化铈,二氧化钛,氧化锆及其混合物。 pH调节剂选自磷酸,盐酸,硫酸,硝酸,氨,氢氧化钾,四甲基氢氧化铵,四乙基氢氧化铵及其混合物。
    • 3. 发明公开
    • 18F-표지 PET 방사성의약품의 전구체 및 그 제조방법
    • F标记PET放射免疫法的前体及其制备方法
    • KR1020120128097A
    • 2012-11-26
    • KR1020120050050
    • 2012-05-11
    • (주)퓨쳐켐
    • 지대윤이병세박찬수이민형차효진조우진강희원김경훈
    • C07C247/14C07D233/12C07D249/04A61K49/06
    • PURPOSE: A precursor comprising is provided to simplify existing complex production steps for manufacturing radiopharmaceuticals to one single step, to reduce production cost because a large amount of phase change catalyst is not necessary, to facilitate separation of compounds after a reaction and to have quick reaction rate. CONSTITUTION: A precursor comprises an organic salt leaving group represented by chemical formula 1. In chemical formula 1, R1 is a C1-1000 hydrocarbon group which is 18F-labeled radioactive tracer except a part of -X-CH2-18F. Carbon of the backbone of the C1-100 hydrocarbon group can be substituted or unsubstituted by oxygen, nitrogen, sulfur, phosphorous or combinations thereof, halogen of the backbone can be substituted or unsubstituted by halogen, X is oxygen, sulfur or -C(O)-, and the leaving group is a substituted or unsubstituted C2-50 tetravalent ammonium salt. [Reference numerals] (AA) Leaving group
    • 目的:提供前体,以简化现有的制造放射性药物的复杂生产步骤到一个单一步骤,以降低生产成本,因为不需要大量的相变催化剂,以促进化合物在反应后的分离并具有快速反应 率。 构成:前体包含由化学式1表示的有机盐离去基团。在化学式1中,R 1是除了-X-CH 2-18F的一部分外,其为18F标记的放射性示踪剂的C1-1000烃基。 C1-100烃基骨架的碳可以被氧,氮,硫,磷或其组合取代或未取代,主链的卤素可以被卤素取代或未取代,X是氧,硫或-C(O) ) - ,离去基团是取代或未取代的C 2-50四价铵盐。 (附图标记)(AA)离开组