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    • 8. 发明公开
    • 박막형 NTC 써미스터 제조방법
    • 制造薄膜YCRO3 NTC热敏电阻的方法
    • KR1020030065007A
    • 2003-08-06
    • KR1020020005137
    • 2002-01-29
    • 대한민국(전남대학교총장)허기석김상헌이병택김진혁문종하
    • 김진혁문종하이병택허기석김상헌
    • H01C7/04
    • H01C7/049C04B35/505C04B2235/3225H01C17/06546
    • PURPOSE: A method for manufacturing a thin-film YCrO3 NTC(Negative Temperature Coefficient) thermistor is provided to reduce the power consumption by using a high-frequency magnetron sputtering process. CONSTITUTION: Amounts of Y2O3 and Cr2O3 are weighted(S10) in order to form YCrO3 for depositing. The weighted Y2O3 and Cr2O3 are calcined at temperature of 250-350°C during 2.5 to 3.5 hours and dried in an oven at temperature of 80-120°C(S20). The dried Y2O3 and Cr2O3 are pressure-formed through a metal mold(S30). The pressure-formed Y2O3 and Cr2O3 are sintered to form YCr2O3 for depositing(S40). YCrO3 is sputtered through a high-frequency magnetron to deposit YCrO3 thin-film on a silicon wafer(S50). The deposited YCrO3 thin-film is treated with heat(S60). A platinum electrode is deposited on YCrO3 thin-film(S70).
    • 目的:提供一种制造薄膜YCrO3 NTC(负温度系数)热敏电阻的方法,以通过使用高频磁控溅射工艺来降低功耗。 构成:为了形成YCrO3进行沉积,对Y2O3和Cr2O3的量进行加权(S10)。 将加权的Y 2 O 3和Cr 2 O 3在250-350℃的温度下煅烧2.5至3.5小时,并在80-120℃的温度下在烘箱中干燥(S20)。 干燥的Y 2 O 3和Cr 2 O 3通过金属模压制(S30)。 将形成压力的Y 2 O 3和Cr 2 O 3烧结以形成用于沉积的YCr 2 O 3(S40)。 YCrO3通过高频磁控管溅射,在硅晶片上沉积YCrO3薄膜(S50)。 沉积的YCrO3薄膜用热处理(S60)。 在YCrO3薄膜上沉积铂电极(S70)。