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    • 3. 发明授权
    • A-SI TFT AND ORGANIC LIGHT EMITTING DISPLAY EMPLOYING THE SAME
    • A-SI TFT和有机发光显示器使用它
    • KR100763912B1
    • 2007-10-05
    • KR20060034673
    • 2006-04-17
    • SAMSUNG ELECTRONICS CO LTD
    • PARK JAE CHULPARK YOUNG SOOCHA YOUNG KWAN
    • H01L29/786H01L51/52
    • H01L29/78606H01L27/1296H01L27/3244H01L29/78603H01L29/78663
    • An amorphous silicon TFT and an organic light emissive display with the same are provided to recover stably a threshold voltage by applying the heat using a heat generating portion. An amorphous silicon TFT(10) includes an amorphous silicon TFT portion and a heat generating portion. The amorphous silicon TFT portion includes a gate electrode(14), a gate insulating layer(15), an amorphous silicon layer(17) and source/drain electrodes(18,19). The amorphous silicon TFT portion is formed on a substrate(11). The heat generating portion(12) is used for recovering a threshold voltage by transmitting the heat to the amorphous silicon layer. An insulating layer is interposed between the substrate and the amorphous silicon TFT portion. The heat generating portion is located at a predetermined portion corresponding to the amorphous silicon layer between the substrate and the insulating layer.
    • 提供非晶硅TFT和具有该非晶硅TFT的有机发光显示器,以通过使用发热部分施加热量来稳定地恢复阈值电压。 非晶硅TFT(10)包括非晶硅TFT部分和发热部分。 非晶硅TFT部分包括栅极(14),栅极绝缘层(15),非晶硅层(17)和源极/漏极(18,19)。 非晶硅TFT部分形成在基板(11)上。 发热部(12)用于通过将热传递到非晶硅层来恢复阈值电压。 在基板和非晶硅TFT部分之间设置有绝缘层。 发热部分位于与衬底和绝缘层之间的非晶硅层对应的预定部分。