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    • 3. 发明公开
    • 나노 다공성 멤브레인 및 그 제작 방법
    • 纳米多孔膜及其制造方法
    • KR1020120131379A
    • 2012-12-05
    • KR1020110049500
    • 2011-05-25
    • 한국전자통신연구원한국과학기술원
    • 이대식윤준보최동훈이병기정문연김승환
    • B01D69/02B01D67/00
    • C23C14/06B01D67/0062B82Y30/00B82Y40/00C23C14/024C23C16/56C23F1/02
    • PURPOSE: A nanoporous membrane and a manufacturing method of the same are provided to increase the reproducibility of devices and to be mass-produced at low cost. CONSTITUTION: A manufacturing method of a nanoporous membrane includes the following steps: a first protective layer(110) is formed on both sides of a substrate(100); one of metal, oxide, nitride, and fluoride is physical or chemical vapor deposited on the protective layer to form a thin film(120) with columnar nanopores; a second protective layer is formed on the thin film; the first protective layer is patterned to expose a part of the lower side of the substrate; the first protective layer through the exposed substrate is etched to expose the thin film with the nanopores; a part of the thin film through the exposed part is etched to control the sizes of nanopores; and the second protective layer is removed.
    • 目的:提供一种纳米多孔膜及其制造方法,以提高器件的再现性并以低成本批量生产。 构成:纳米多孔膜的制造方法包括以下步骤:在基板(100)的两面上形成第一保护层(110); 金属,氧化物,氮化物和氟化物中的一种物理或化学气相沉积在保护层上以形成具有柱状纳米孔的薄膜(120); 在薄膜上形成第二保护层; 图案化第一保护层以暴露衬底的下侧的一部分; 通过暴露的基底的第一保护层被蚀刻以用纳米孔暴露薄膜; 通过暴露部分的薄膜的一部分被蚀刻以控制纳米孔的尺寸; 并且去除第二保护层。