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1. 发明公开

KR1020090118004A 노광 장치, 보정 방법 및 디바이스 제조 방법 无效
标题翻译：曝光装置，校正方法和装置制造方法
公开(公告)号：KR1020090118004A
公开(公告)日：2009-11-17
申请号：KR1020090041200
申请日：2009-05-12
申请人： 캐논 가부시끼가이샤
发明人： 마쯔다히데끼
IPC分类号： H01L21/027 , G03F7/20
CPC分类号： G03B27/32 , G03F7/706 , G03F7/70525 , G03F7/70533 , G03F7/70625 , G03F7/70641 , G03F7/70716
摘要： PURPOSE: An exposure device, a correcting method and a method for manufacturing a device are provided to preform accuracy of measurement by removing an error due to a measurement algorithm, a kind of measurement devices, the thickness of a resist film, the kind of resists, and an oblique incidence angle. CONSTITUTION: An exposure apparatus includes a projection optical system and a controller. The projection optical system projects the pattern of a disc to a substrate. The controller obtains the line width on a first mark and a position on a second mark. The controller is formed at each position of the substrate while the first mark and the second mark change the position of a substrate stage to an optical axial direction by stages. The misalignment on the second mark formed in the substrate maintained by the substrate stage is produced in the optical axial direction to measure the limit value of the change of the line width on the first mark.
摘要翻译：目的：提供一种曝光装置，校正方法和装置的制造方法，通过消除由于测量算法，测量装置的种类，抗蚀剂膜的厚度，抗蚀剂的种类等引起的误差来预测测量精度，和倾斜入射角。构成：曝光装置包括投影光学系统和控制器。投影光学系统将光盘的图案投影到基板。控制器获得第一标记上的线宽和第二标记上的位置。控制器形成在基板的每个位置处，同时第一标记和第二标记将基板台的位置逐级地改变到光轴向。在光轴方向上产生在由基板台保持的基板上形成的第二标记上的未对准，以测量第一标记上的线宽的变化的极限值。

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