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    • 5. 发明公开
    • 내마모성이 향상된 폴리카보네이트 투명판 제조방법
    • 制造具有改善耐磨性的聚碳酸酯透明板的方法
    • KR1020010094136A
    • 2001-10-31
    • KR1020000017612
    • 2000-04-04
    • 주식회사 삼양홀딩스
    • 송준섭김성룡박성철이주연
    • B29C59/14
    • B29C59/14B29K2069/00B29K2995/0026B29L2007/002
    • PURPOSE: A manufacturing method of a PC(Poly Carbonate) transparent plate having an improved abrasion resistance is provided to produce an abrasion-resistant thin film having no crack by controlling various factor ranges deciding the characteristics of the abrasion-resistant thin film in a process of manufacturing the thin film on the surface of PC. CONSTITUTION: To coat an abrasion-resistant film using raw material of HMDSO(hexamethyldisiloxane) over the surface of PC by direct PECVD(Plasma Enhanced Chemical Vapor Deposition), plasma is formed around a PC board at a vacuum state. The PC board is positioned on an electrode connected with a plasma generator. Then, HMDSO and oxygen gas is injected to the plasma. The HMDSO and oxygen gas is dissolved by plasma energy, and substance such as SiO2 is deposited on a PC transparent plate. At the same time, ions in the plasma collide with a film by self-bias caused by the electrode connected with the plasma generator. Thereby, a thin film having an excellent abrasion resistance is produced. The thin film has variable characteristics depending on the feed speed rate of energy and HMDSO as well as the feed speed of oxygen gas. The feed speed rate of energy and HMDSO is defined by W/FM wherein the W is power(J/sec) supplied from the plasma generator, the F is feed speed(mol/sec) of HMDSO, and the M is molecular weight(0.1624 Kg/mol) of HMDSO. Oxygen is injected to control the property and color of the deposited material. The more oxygen is injected, the more cracks are generated on the thin film. The proper feed speed of oxygen is 12-18 times of the feed speed(mol/sec) of HMDSO. In addition, HMDSO and argon gas can be injected to improve the stability of plasma. The feed speed of argon gas is 0.1-2 time of the feed speed of HMDSO.
    • 目的:提供具有改进的耐磨性的PC(聚碳酸酯)透明板的制造方法,以通过控制在一个方法中决定耐磨薄膜的特性的各种因素范围来制造不具有裂纹的耐磨薄膜 在PC表面制造薄膜。 构成:通过直接PECVD(等离子体增强化学气相沉积)在PC表面上涂覆使用HMDSO(六甲基二硅氧烷)的原料的耐磨膜,在真空状态下在PC板周围形成等离子体。 PC板位于与等离子体发生器连接的电极上。 然后,将HMDSO和氧气注入等离子体。 HMDSO和氧气通过等离子体能量溶解,诸如SiO 2的物质沉积在PC透明板上。 同时,等离子体中的离子与由等离子体发生器连接的电极引起的自偏压与膜碰撞。 由此,产生具有优异耐磨性的薄膜。 根据能量和HMDSO的进​​料速度以及氧气的进料速度,薄膜具有不同的特性。 能量和HMDSO的进​​料速度由W / FM定义,其中W是从等离子体发生器供给的功率(J / sec),F是HMDSO的进​​料速度(mol / sec),M是分子量 0.1624Kg / mol)HMDSO。 注入氧气以控制沉积材料的性质和颜色。 注入氧气越多,薄膜上产生的裂纹就越多。 氧气的适当进料速度是HMDSO进料速度(mol / sec)的12-18倍。 另外,可以注入HMDSO和氩气,以提高等离子体的稳定性。 氩气的进料速度为HMDSO进料速度的0.1-2倍。
    • 9. 发明公开
    • 플라즈마 도움 화학증착방법을 이용한 내마모성 및 내스크래치성이 향상된 폴리카보네이트 투명판의 제조방법
    • 通过使用等离子体增强化学蒸气沉积法生产耐腐蚀性和耐刮擦性的聚碳酸酯透明板的方法
    • KR1020000020665A
    • 2000-04-15
    • KR1019980039368
    • 1998-09-23
    • 주식회사 삼양홀딩스
    • 송준섭최영준김성룡박성철이주연
    • B05D1/00
    • PURPOSE: A method is provided to produce a polycarbonate transparent plate improved in abrasion resistance and scratch resistance by using plasma enhanced chemical vapor deposition(PECVD). CONSTITUTION: A polycarbonate transparent plate is produced by making the polycarbonate transparent plate vacuous on an electrode(3) in a vacuum device(1), removing impurities of the surface of the transparent plate by inputting argon gas and then generating argon plasma, inputting mixture of a monomer and reacting gas through the electrode, and forming an abrasion resistant layer on a polycarbonate by forming plasma in two electrodes as supplying current to the electrode and an inputting electrode(4) through radio frequency current generators(5,6) having the polycarbonate transparent plate. Therefore, the transparent plate has regular abrasion resistant layer for excellent abrasion resistance.
    • 目的:提供一种通过使用等离子体增强化学气相沉积(PECVD)制造改善耐磨性和耐划伤性的聚碳酸酯透明板的方法。 构成:通过将真空装置(1)中的电极(3)上的聚碳酸酯透明板真空地制成聚碳酸酯透明板,通过输入氩气然后产生氩等离子体,输入混合物来除去透明板表面的杂质 的单体并通过电极反应气体,并且通过在两个电极中形成等离子体,在聚碳酸酯中形成耐磨层,从而通过射频电流发生器(5,6)向电极提供电流,并通过射频发生器(5,6) 聚碳酸酯透明板。 因此,透明板具有规则的耐磨层,具有优异的耐磨性。