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    • 1. 发明公开
    • 박막 증착에서 여과 및 가스/증기 혼합 장치
    • 过滤和气体/蒸汽混合在薄膜沉积中的装置
    • KR1020090125014A
    • 2009-12-03
    • KR1020090047843
    • 2009-05-29
    • 엠 에스피 코포레이션
    • 벤자민와이.에이치.리우야민마덕딘
    • H01L21/22H01L21/02
    • B01D46/0027C23C16/4402F22B1/28
    • PURPOSE: A filtering and gas/vapor mixing apparatus in thin film deposition is provided to form a thin film with uniform thickness on a wafer, by removing particles from gas/vapor mixture and improving uniformity of the gas/vapor mixture at the same time. CONSTITUTION: A first enclosure(110) comprises a first porous filter element for particle filtering. A base part(115) comprises a feed flow path(130) and a drain flow path(140) for flowing in and drawing out gas/vapor mixture in the first enclosure. The mixture forms vapor from a liquid precursor for thin film deposition. Angular relationship between orifice(150) and the feed flow path and the drain flow path is nearly normal angular relationship. An evaporation apparatus generates a heated exhaust gas/vapor mixture stream. The porous filter element is made of a stainless steel.
    • 目的:提供薄膜沉积中的过滤和气/蒸气混合装置,以在晶片上形成具有均匀厚度的薄膜,通过从气体/蒸气混合物中除去颗粒并同时改善气体/蒸汽混合物的均匀性。 构成:第一外壳(110)包括用于颗粒过滤的第一多孔过滤元件。 基部(115)包括用于在第一外壳中流入和抽出气体/蒸汽混合物的进料流动路径(130)和排出流动路径(140)。 混合物从用于薄膜沉积的液体前体形成蒸汽。 孔(150)与进料流路和排出流路之间的角度关系几乎是正常的角度关系。 蒸发装置产生加热的废气/蒸汽混合物流。 多孔过滤元件由不锈钢制成。