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    • 1. 发明授权
    • 질화물계 발광 소자
    • 氮化物基发光元件
    • KR100850950B1
    • 2008-08-08
    • KR1020060070214
    • 2006-07-26
    • 엘지전자 주식회사엘지이노텍 주식회사
    • 김종욱
    • H01L33/08
    • H01L33/06B82Y20/00H01L33/32
    • 본 발명은 질화물계 발광 소자에 관한 것으로 특히, 발광 소자의 발광 효율과 신뢰성을 향상시킬 수 있는 질화물계 발광 소자에 관한 것이다. 이러한 본 발명은, 발광 소자에 있어서, n-형 반도체층과; p-형 반도체층과; 상기 n-형 반도체층과 p-형 반도체층 사이에 위치하며, 적어도 한쌍 이상의 우물층과 장벽층으로 이루어지는 활성층과; 상기 n-형 반도체층과 활성층 사이 및 상기 p-형 반도체층과 활성층 사이의 경계면 중 적어도 어느 하나의 경계면에 위치하며, 밴드갭 또는 두께가 변동하는 복수의 층으로 이루어지는 제1층과; 상기 복수의 제1층 사이에 위치하는 제2층을 포함하여 구성되는 것이 바람직하다.
      질화물, 반도체, GaN, InGaN, 활성층.
    • 氮化物基发光器件技术领域本发明涉及氮化物基发光器件,并且更具体地涉及能够提高发光器件的发光效率和可靠性的氮化物基发光器件。 这样的本发明是一种发光器件,包括:n型半导体层; p型半导体层; 设置在所述n型半导体层和所述p型半导体层之间的有源层,所述有源层包括至少一个或多个阱层和势垒层; 位于所述n型半导体层和所述有源层中的至少任一个之间以及所述p型半导体层和所述有源层之间的界面处并且具有变化的带隙或厚度的第一层; 以及位于多个第一层之间的第二层。
    • 2. 发明授权
    • 나노로드를 형성하는 방법
    • 나노로드를형성하는방법
    • KR100741204B1
    • 2007-07-19
    • KR1020060024719
    • 2006-03-17
    • 엘지전자 주식회사엘지이노텍 주식회사
    • 김종욱조현경이규철안성진유진경홍영준
    • H01L33/00B82Y20/00
    • A method for forming a nano rod is provided to increase the number of rods vertically orientated on a target structure having metal liquid droplets by forming the metal liquid droplets on the target structure and by melting III-V group semiconductor in the metal liquid droplets and educing the III-V group semiconductor. A metal thin film is deposited on a target structure(100), having a thickness of 1~40 A. The target structure can be a substrate on which a buffer layer is formed. The target structure is heated to form metal liquid droplets(120). A III-group material and a V-group material are melted in the metal liquid droplets. III-V group semiconductor is extracted from the III-V material melted in the metal liquid droplets to form nano rods on the target structure in which the metal liquid droplets exist.
    • 提供用于形成纳米棒的方法,以通过在目标结构上形成金属液滴并通过熔化金属液滴中的III-V族半导体来增加垂直取向在具有金属液滴的目标结构上的棒的数量, III-V族半导体。 将金属薄膜沉积在厚度为1〜40的靶结构(100)上。靶结构可以是在其上形成缓冲层的基板。 目标结构被加热以形成金属液滴(120)。 III族材料和V族材料在金属液滴中熔化。 从金属液滴中熔化的III-V族材料中提取III-V族半导体,以在其中存在金属液滴的目标结构上形成纳米棒。
    • 3. 发明公开
    • 나노 패턴이 형성된 기판의 제조방법 및 그 기판을 이용한발광소자
    • 使用纳米图案制作基板的方法和使用基板的发光装置
    • KR1020070063731A
    • 2007-06-20
    • KR1020050123861
    • 2005-12-15
    • 엘지전자 주식회사엘지이노텍 주식회사
    • 김종욱조현경
    • H01L33/00
    • H01L33/0079H01L33/007H01L33/22
    • A method for manufacturing a substrate with a nano pattern and a light emitting device using the substrate manufactured thereby are provided to realize mass-production and to economize substrate fabrication costs by performing an etching process on the substrate using an agglomerated portion of a nano size as an etch mask. A protection layer is formed on a substrate(100). A thin film including metal is formed on the protection layer. A plurality of agglomerated portions of nano size are formed on the protection layer by performing a heat treatment on the thin film. The protection layer is vertically etched by using the plurality of agglomerated portions as an etch mask. The plurality of agglomerated portions are removed. A plurality of nano rods(105) are formed on the resultant structure by performing a vertical etching process on the substrate using the protection layer as an etch mask.
    • 提供一种使用纳米图案制造衬底的方法和使用其制造的衬底的发光器件,以通过使用纳米尺寸的聚集部分对衬底进行蚀刻处理来实现批量生产并节省衬底制造成本 蚀刻掩模 在基板(100)上形成保护层。 在保护层上形成包括金属的薄膜。 通过对薄膜进行热处理,在保护层上形成多个纳米尺寸的附聚部分。 通过使用多个附聚部分作为蚀刻掩模来垂直蚀刻保护层。 去除多个附聚部分。 通过使用保护层作为蚀刻掩模在基板上进行垂直蚀刻处理,在所得结构上形成多个纳米棒(105)。
    • 5. 发明授权
    • 수직형 발광소자 제조방법
    • 수직형발광소자제조방법
    • KR100648813B1
    • 2006-11-23
    • KR1020050128862
    • 2005-12-23
    • 엘지전자 주식회사엘지이노텍 주식회사
    • 조현경김종욱
    • H01L33/12H01L33/02
    • A method for fabricating a vertical light emitting device is provided to eliminate the necessity of a dry etch process for isolation by forming a plurality of buffer layers separated from each other on a substrate and by growing a light emitting structure on each buffer layer. A plurality of buffer layers are formed on a substrate wherein a plurality of protrusions are formed on each lateral surface of the plurality of buffer layers, separated from each other. Light emitting structures(220a,220b) are respectively formed on the plurality of buffer layers. Current diffusion layers(230a,230b) are respectively formed on the light emitting structures. Support units(240a,240b) are attached to interconnect all the upper parts of the current diffusion layers. The plurality of buffer layers and the substrate under the light emitting structures are removed. Electrodes layers are respectively formed under the light emitting structures. The support unit except the upper part of the current diffusion layer is removed by an etch process to isolate devices.
    • 提供了一种用于制造垂直发光器件的方法,以通过在衬底上形成彼此分离的多个缓冲层并通过在每个缓冲层上生长发光结构来消除用于隔离的干法刻蚀工艺的必要性。 多个缓冲层形成在基板上,其中多个突起形成在多个缓冲层的每个侧表面上,彼此分离。 发光结构(220a,220b)分别形成在多个缓冲层上。 电流扩散层(230a,230b)分别形成在发光结构上。 支撑单元(240a,240b)被附接以互连电流扩散层的所有上部部分。 多个缓冲层和发光结构下面的衬底被去除。 电极层分别形成在发光结构下方。 除了电流扩散层的上部之外的支撑单元通过蚀刻工艺被去除以隔离器件。
    • 9. 发明公开
    • 질화물계 발광 소자
    • 基于氮化物的发光二极管
    • KR1020080010137A
    • 2008-01-30
    • KR1020060070215
    • 2006-07-26
    • 엘지전자 주식회사엘지이노텍 주식회사
    • 김종욱
    • H01L33/06
    • A nitride based light emitting device is provided to efficiently realize an electron blocking layer by increasing the conduction band discontinuity of the interface between a light emitting layer and a p-type semiconductor layer and to increase the efficiency inner quantum of the light emitting device. A nitride based light emitting device includes an n-type semiconductor layer(30), a p-type semiconductor layer(50), and a light emitting layer(40). The light emitting layer is located between the n-type semiconductor layer and the p-type semiconductor layer, and has at least one pair of first barrier layers(42) and well layers(41) and a second barrier layer(43) with a band-gap between those of the first barrier layer and the well layer. The second barrier layer is located on the surface adjacent to the P-type semiconductor layer.
    • 提供一种氮化物基发光器件,用于通过增加发光层和p型半导体层之间的界面的导带不连续性来有效地实现电子阻挡层,并提高发光器件的内部效率。 氮化物系发光器件包括n型半导体层(30),p型半导体层(50)和发光层(40)。 发光层位于n型半导体层和p型半导体层之间,并且具有至少一对第一势垒层(42)和阱层(41)和第二势垒层(43) 第一阻挡层和阱层之间的带隙。 第二阻挡层位于与P型半导体层相邻的表面上。
    • 10. 发明授权
    • 나노선을 갖는 발광 소자 및 그의 제조 방법
    • 나노선을갖갖발광발광소자및그의제조방법
    • KR100746784B1
    • 2007-08-06
    • KR1020060020098
    • 2006-03-02
    • 엘지전자 주식회사엘지이노텍 주식회사
    • 김종욱조현경이규철안성진유진경홍영준
    • H01L33/00B82Y20/00
    • A light emitting device and its manufacturing method are provided to improve a light emitting efficiency by increasing a light emissive area using a light emitting structure of a concentric type. A light emitting device includes a substrate, a plurality of nano wires, an active layer and a second semiconductor layer. The plurality of nano wires(110) are spaced apart from each other on the substrate. The nano wire is made of a first semiconductor with a first polarity. The active region(120) is formed along peripheral portions of the substrate and the nano wires. The second semiconductor layer(130) is formed along a peripheral region of the active layer. The second semiconductor layer has a second polarity. An upper surface of the nano wire is sequentially enclosed with the active layer and the second semiconductor layer.
    • 提供发光器件及其制造方法以通过使用同心型发光结构增加发光面积来提高发光效率。 发光器件包括衬底,多个纳米线,有源层和第二半导体层。 多个纳米线(110)在衬底上彼此间隔开。 纳米线由具有第一极性的第一半导体制成。 有源区(120)沿着衬底和纳米线的外围部分形成。 第二半导体层(130)沿着有源层的周边区域形成。 第二半导体层具有第二极性。 纳米线的上表面依次被有源层和第二半导体层包围。