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    • 3. 发明公开
    • 트랜지스터 어레이 기판의 제조 장치 및 제조 방법
    • 用于制造晶体管阵列基板的装置和方法
    • KR1020130047899A
    • 2013-05-09
    • KR1020110112711
    • 2011-11-01
    • 엘지디스플레이 주식회사
    • 이승혁이병성김태선김형민
    • H01L21/302H01L21/203H01L29/786
    • H01L21/67155G02F1/136227H01L21/2855H01L21/76814H01L21/76877H01L27/1248
    • PURPOSE: An apparatus and a method for manufacturing a transistor array substrate are provided to increase the interface adhesion between a protection layer and a pixel electrode layer, to prevent the peeling or collapse of the pixel electrode, and to improve throughput. CONSTITUTION: A transfer chamber(TC) moves a substrate between chambers. The transfer chamber includes a substrate transfer unit(110) for moving the substrate. A load lock chamber(LC) performs a hydrogen plasma process to form a surface process layer on the surface of a protection layer. The load lock chamber includes a plasma generation unit for forming the plasma on the front surface of the substrate. A sputtering chamber(SC) uses a sputtering process to form a pixel anode layer on the surface process layer supplied from the load lock chamber. A heating chamber(HC) heats the substrate having the surface process layer with a preset temperature.
    • 目的:提供一种用于制造晶体管阵列基板的装置和方法,以增加保护层和像素电极层之间的界面粘附性,以防止像素电极的剥离或塌陷,并提高生产量。 构成:传送室(TC)在两个室之间移动一个基板。 传送室包括用于移动衬底的衬底传送单元(110)。 负载锁定室(LC)执行氢等离子体处理以在保护层的表面上形成表面处理层。 负载锁定室包括用于在基板的前表面上形成等离子体的等离子体产生单元。 溅射室(SC)使用溅射工艺在从负载锁定室提供的表面处理层上形成像素阳极层。 加热室(HC)将具有表面处理层的基板以预设温度加热。
    • 4. 发明公开
    • 레이저 윈도우의 자동세정장치와 이의 구동방법
    • 激光窗自动清洗装置及其驱动方法
    • KR1020120124195A
    • 2012-11-13
    • KR1020110041944
    • 2011-05-03
    • 엘지디스플레이 주식회사
    • 오두석이병성강민규윤대균이성배
    • H01L21/302H01L21/02
    • H01L21/67046H01L21/02675H01L21/67034H01L21/67051
    • PURPOSE: An automatic cleaning apparatus and a driving method thereof are provided to effectively prevent damage to a coating film by mechanically washing and inspecting a window used for a laser crystallization device at the same time. CONSTITUTION: A jig(Zig) fixes a window(Win). A cleaning nozzle(130) sprays washing solution to one or more surfaces of the window. A brush(140) physically washes one or more surfaces of the window. A DIW(Deionized Water) nozzle(150) sprays deionized water to one or more surfaces of the window. An inspector(180) inspects cleanliness for the window. A first dry nozzle and a second dry nozzle dry one or more surfaces of the window with different methods. A transfer unit transfers the jig from the location in which the cleaning nozzle is installed to the location in which the inspector is installed.
    • 目的:提供一种自动清洁装置及其驱动方法,以同时机械地清洗和检查用于激光结晶装置的窗口来有效地防止对涂膜的损害。 构成:夹具(Zig)修复窗口(Win)。 清洁喷嘴(130)将洗涤溶液喷射到窗口的一个或多个表面。 刷子(140)物理洗涤窗口的一个或多个表面。 DIW(去离子水)喷嘴(150)将去离子水喷射到窗口的一个或多个表面。 检查员(180)检查窗户的清洁度。 第一干燥喷嘴和第二干燥喷嘴用不同的方法干燥窗户的一个或多个表面。 转移单元将夹具从安装清洁喷嘴的位置转移到安装检查器的位置。
    • 5. 发明公开
    • 박막 증착장비용 밸브장치
    • 用于蒸气沉积有机薄膜的阀装置
    • KR1020130055901A
    • 2013-05-29
    • KR1020110121571
    • 2011-11-21
    • 엘지디스플레이 주식회사
    • 김지훈이병성이종철
    • C23C16/50C23C16/513H01J9/20
    • H01J37/32899H01J37/32082
    • PURPOSE: A valve device for a thin film deposition apparatus is provided to be installed to reduce standing wave effect which is generated when plasma, which is generated in a process chamber of a large-sized PECD, flows into a transfer chamber. CONSTITUTION: A valve device for a thin film deposition apparatus includes a process chamber, a transfer chamber, a valve housing, and a gate valve module. The process chamber receives a supplied glass substrate, and performs a disposition treatment on the glass substrate. The transfer chamber supplies or returns the glass substrate to the process chamber. The valve housing is connected with the process chamber and the transfer chamber. The gate valve module shuttles inside the valve housing to respectively operate the process chamber and the transfer chamber.
    • 目的:提供一种用于薄膜沉积设备的阀装置,以减少在大型PECD的处理室中产生的等离子体流入传送室时产生的驻波效应。 构成:用于薄膜沉积设备的阀装置包括处理室,传送室,阀壳和闸阀模块。 处理室接收供应的玻璃基板,并对玻璃基板进行配置处理。 传送室将玻璃基板提供或返回到处理室。 阀壳与处理室和传送室连接。 闸阀模块在阀壳体内穿梭以分别操作处理室和传送室。
    • 7. 发明公开
    • 멀티 슬랏 로드락 챔버와 그 동작 방법
    • 多路负载锁定室及其操作方法,无过程延时
    • KR1020050003272A
    • 2005-01-10
    • KR1020030043988
    • 2003-06-30
    • 엘지디스플레이 주식회사
    • 이병성
    • G02F1/13
    • H01L21/67201H01L21/67766H01L21/67769
    • PURPOSE: A multislot load lock chamber is provided to prevent process delay generated when a substrate which have passed through a process chamber is cooled by supplying a processed substrate to the process chamber while the substrate is cooled. CONSTITUTION: A multislot load lock chamber includes first and second cassette doors(401a,401b) for coming in and out of a substrate, a substrate loading portion(402) loading the substrate ejected from a cassette, and a driving motor(403) moving the substrate loading portion up and down. A connector(404) connects the substrate loading portion with the driving motor. A process chamber door(408) is connected with a process chamber formed at one side of the load lock chamber, and a sealing means is provided at an outer wall of the substrate loading portion. A sealing portion(409) is connected with the sealing means to partially seal the load lock chamber and is formed at a side inside the load lock chamber.
    • 目的:提供多槽负载锁定室,以防止在通过处理室的基板被冷却时产生的处理延迟,同时在衬底被冷却的同时将处理过的衬底提供给处理室。 构成:多时间负载锁定室包括用于进出基板的第一和第二盒门(401a,401b),装载从盒子弹出的基板的基板装载部分(402)和移动的驱动电机(403) 基板装载部分上下。 连接器(404)将基板装载部分与驱动马达连接。 处理室门(408)与形成在负载锁定室一侧的处理室连接,密封装置设置在基板装载部分的外壁处。 密封部分(409)与密封装置连接以部分地密封负载锁定室并且形成在负载锁定室内侧。
    • 8. 发明授权
    • 기판 반송시스템
    • 基板运输系统
    • KR101815095B1
    • 2018-01-04
    • KR1020110041873
    • 2011-05-03
    • 엘지디스플레이 주식회사
    • 김형민이병성이기조변상근김태선강민규이승혁이성배
    • H01L21/677B65G49/06G02F1/13
    • 본발명은기판반송시스템에관한것으로, 특히액정표시장치의제조를위한인라인형스퍼터링장치등의액정표시장치용제조장비내에서기판을이송시키는기판반송시스템에관한것이다. 본발명의특징은반송레일의샤프트축의높이를자유롭게조절할수 있도록, 샤프트축의일단에구비된회전부재를별도의회전력을갖는제 1 케이스와제 2 케이스로구성하는것이다. 즉, 제 2 케이스의회전축의중심을일부치우치도록형성함으로써, 제 2 케이스의회전에따라회전부재의높이가달라지도록하며, 이를통해회전부재와조립된샤프트축의높이를조절하는것이다. 이를통해, 각챔버내에구비된반송레일의높이차에의해반송레일상에안착된캐리어가이드와회전롤러간의충돌이발생하는것을방지할수 있어, 파티클과같은이물이발생되거나, 충돌에의한충격으로기판이파손되는것을방지할수 있다. 또한, 충돌에의해샤프트축과회전롤러의마찰및 마모가발생하는것을방지할수 있어, 장비보수시간을줄일수 있으며, 장비유지시간및 공정의생산성을향상시킬수 있다.
    • 本发明涉及的基板输送系统,用于在制造设备的液晶显示装置传送基板,例如用于生产,更具体地,根据基板输送系统中的液晶显示装置的在线式溅射装置。 本发明的特征,以允许自由调整承载轨的轴线的高度,与所述轴的轴线构成所述旋转部件的第一壳体的一端,并且具有单独的旋转力的第二壳体。 即,通过形成所述第二壳体部的旋转轴中心罢工放好,第二和旋转bujaeui高度取决于所述壳组件之前而变化,以调节所述旋转部件和所述轴组件轴,通过该高。 因此,由于设置在各个室中的输送轨道的高度差,可以防止载运导轨和位于输送轨道上的旋转辊之间的碰撞产生诸如颗粒的水, 可以防止基材被破坏。 此外,可以防止由于碰撞而引起的轴与旋转辊之间的摩擦和磨损,由此减少设备维护时间并且提高设备保持时间和工艺生产率。