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    • 2. 发明公开
    • 글래스 기판의 제조 방법 및 글래스 기판 연마용 자성 유동체
    • 玻璃基板制作方法及抛光玻璃基板用磁性液体
    • KR1020140052901A
    • 2014-05-07
    • KR1020130127780
    • 2013-10-25
    • 아반스트레이트 가부시키가이샤
    • 이따꾸라사또루미스미다까라
    • B24B9/10
    • B24B9/10B24B1/005
    • The objective of the present invention is to polish an end surface of a glass substrate and to shorten time of the polishing process compared to a conventional process. In a polishing process to polish an end surface of a glass substrate, a rotating axis, a magnetic field forming unit configured with a magnet and including a first member and a second member that are disposed with a distance therebetween in an axial direction of the rotation axis and rotate together with the rotation axis, and a polishing wheel configured with abrasive grains and liquid and including a magnetic fluid held and supported by a magnetic field formed between the first member and the second member, are used. In the polishing process, the concentration of the abrasive grains in the magnetic fluid is controlled to be greater than or equal to 70%, the magnetic fluid is contacted with the end surface of the glass substrate while the rotation axis rotates, and the polishing wheel is moved relative to the glass substrate along an end edge of the glass substrate being polished.
    • 本发明的目的是抛光玻璃基板的端面并缩短与常规工艺相比的抛光工艺的时间。 在研磨玻璃基板的端面的抛光工序中,旋转轴,具有磁铁的磁场形成单元,其包括第一部件和第二部件,该第一部件和第二部件沿着旋转轴的方向与其间隔一段距离 轴与旋转轴一起旋转,并且配置有磨粒和液体并包括由在第一构件和第二构件之间形成的磁场保持和支撑的磁性流体的抛光轮。 在抛光过程中,磁性流体中磨粒的浓度被控制在大于或等于70%,磁性流体在旋转轴旋转时与玻璃基板的端面接触,抛光轮 沿着被抛光的玻璃基板的端缘相对于玻璃基板移动。