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    • 5. 发明公开
    • 수직구조 질화갈륨계 발광다이오드 소자
    • 垂直结构的GAN型LED器件
    • KR1020090032211A
    • 2009-04-01
    • KR1020070097224
    • 2007-09-27
    • 삼성전자주식회사
    • 박정규정영준최승환주성아고건유
    • H01L33/00
    • A vertically structured GaN type LED device is provided to improve the heat radiating property by forming a structural support layer with the carbon nanotube. An n-type bonding pad(110) is formed on the top part of the vertical structure gallium nitride-based LED element. An n-type electrode(120) is formed on the bottom part of the n-type bonding pad. An n-type nitride gallium film(130) is formed in the bottom part of n-type electrode. The n-type nitride gallium film is formed with the GaN layer or the GaN/AlGaN layer doped by the n-type impurity. An active layer(140) and a p-type nitride gallium film(150) are formed on the bottom part of the n-type nitride gallium film. A p-type electrode(160) is formed in the bottom part of the p-type nitride gallium film of the gallium nitride-based LED structure. A structural support layer(180) supporting the gallium nitride-based LED structure is formed on the bottom part of p-type electrode. The structural support layer is made of the carbon nanotube. A bonding layer(170) is formed between the p-type electrode and the structural support layer. The bonding layer has the first Ohmic layer(170a), a bonding layer(170b) and a laminating structure of the second Ohmic layer(170c).
    • 提供垂直结构的GaN型LED器件,通过与碳纳米管形成结构支撑层来提高散热性能。 在垂直结构的氮化镓系LED元件的顶部形成有n型接合焊盘(110)。 n型电极(120)形成在n型接合焊盘的底部。 n型氮化镓膜(130)形成在n型电极的底部。 n型氮化镓膜形成有由n型杂质掺杂的GaN层或GaN / AlGaN层。 在n型氮化镓膜的底部形成有源层(140)和p型氮化镓膜(150)。 在氮化镓系LED结构的p型氮化镓膜的底部形成有p型电极(160)。 在p型电极的底部形成有支撑氮化镓系LED结构的结构支撑层(180)。 结构支撑层由碳纳米管制成。 在p型电极和结构支撑层之间形成结合层(170)。 接合层具有第一欧姆层(170a),接合层(170b)和第二欧姆层(170c)的层压结构。
    • 8. 发明公开
    • 발광 다이오드 패키지 및 그 제조방법
    • 发光二极管封装及其制造方法
    • KR1020100058769A
    • 2010-06-04
    • KR1020080117298
    • 2008-11-25
    • 삼성전자주식회사
    • 주성아박나나박일우
    • H01L33/56
    • H01L2224/48091H01L2224/48247H01L2224/48257H01L2924/00014
    • PURPOSE: A light emitting diode package and a manufacturing method thereof are provided to overcome limitation of appearance and design of the light emitting diode package by forming a thin film on the top of the package mold and covering the original color of fluorescent substance. CONSTITUTION: A pair of lead frames(110) is prepared. A package mold(120) comprises a molding material filling space. An LED chip(130) is mounted on the lead frame inside the package mold. A thin film(160) opens and shuts the molding material fill space of the package mold. A molding material(150) is filled in the molding material filling space of the package mold.
    • 目的:提供一种发光二极管封装及其制造方法,以通过在封装模具的顶部形成薄膜并覆盖荧光物质的原始颜色来克服对发光二极管封装的外观和设计的限制。 构成:准备一对引线框架(110)。 包装模具(120)包括模制材料填充空间。 LED芯片(130)安装在封装模具内的引线框架上。 薄膜(160)打开并关闭包装模具的成型材料填充空间。 成型材料(150)填充在包装模具的成型材料填充空间中。
    • 9. 发明公开
    • 발광다이오드 패키지
    • 发光二极管封装
    • KR1020090032775A
    • 2009-04-01
    • KR1020070098264
    • 2007-09-28
    • 삼성전자주식회사
    • 최승환고건유정영준주성아박정규
    • H01L33/58H01L33/62H01L33/52
    • H01L2224/48091H01L2924/00014
    • A light-emitting diode package is provided to obtain the efficient optical alignment by increasing the freedom degree for utilizing the wide lens surface. A package body(110) comprises a concave part(112) consisting of the cavity having the space of the constant size. A light emitting diode chip(130) is installed at the bottom surface of the concave part. The light emitting diode chip is electrically connected to the lead frame through the wire. A resin shield part(140) is formed in the concave part and seals the light emitting diode chip. The side wall(114) that surrounds the concave part is made of transparent materials. The side wall supports a lead frame(120).
    • 提供了一种发光二极管封装,以通过增加利用宽透镜表面的自由度来获得有效的光学对准。 包装体(110)包括由具有恒定尺寸的空间的空腔组成的凹部(112)。 发光二极管芯片(130)安装在凹部的底面。 发光二极管芯片通过导线电连接到引线框架。 树脂屏蔽部分(140)形成在凹部中并密封发光二极管芯片。 围绕凹部的侧壁(114)由透明材料制成。 侧壁支撑引线框架(120)。
    • 10. 发明公开
    • 플립칩용 질화물계 반도체 발광소자
    • 用于片芯的氮化物半导体发光器件
    • KR1020090032212A
    • 2009-04-01
    • KR1020070097226
    • 2007-09-27
    • 삼성전자주식회사
    • 고건유정영준최승환주성아박정규
    • H01L33/00H01L21/60
    • A nitride semiconductor light emitting device for the flip-chip is provided to improve the heat emitting characteristic by using the high thermal conductivity of the carbon nanotube. An LED chip(100) comprises a substrate(110) which is the optical permeability, a buffer layer, and an n-type nitride semiconductor layer(120). The n-type nitride semiconductor layer is made of semiconductor material having the composition expression of InxAlyGa1-x-yN. The light emitting structure is formed by successively laminating an active layer(130) and a p-type nitride semiconductor layer(140) on the first region of the n-type nitride semiconductor. The active layer is made of the InGaN/GaN layer of the multi-quantum well structure. A p-type electrode(150) is formed in the p-type nitride semiconductor layer. An n-type electrode(160) is formed in the second part of the n-type nitride semiconductor layer. A sub mount(200) is formed by using the silicon wafer with the superior thermal conductivity or the AlN ceramic substrate etc. A bonding layer(300) is made of a carbon nanotube(310).
    • 提供了一种用于倒装芯片的氮化物半导体发光器件,以通过使用碳纳米管的高热导率来改善发热特性。 LED芯片(100)包括作为光导率的衬底(110),缓冲层和n型氮化物半导体层(120)。 n型氮化物半导体层由具有In x Al y Ga 1-x-y N的组成表达的半导体材料制成。 发光结构通过在n型氮化物半导体的第一区域上依次层叠有源层(130)和p型氮化物半导体层(140)而形成。 有源层由多量子阱结构的InGaN / GaN层制成。 p型电极(150)形成在p型氮化物半导体层中。 n型电极(160)形成在n型氮化物半导体层的第二部分中。 通过使用具有优良导热性的硅晶片或AlN陶瓷基板等,形成副安装座(200)。接合层(300)由碳纳米管(310)制成。