专利快速检索-快速检索全球专利，免费商用专利数据库-IPRDB

1. 发明公开

KR1020020026857A 내부의 습도 레벨을 제어하기 위한 반도체 처리 시스템 및방법 无效
标题翻译：半导体处理系统和控制水分含量的方法
公开(公告)号：KR1020020026857A
公开(公告)日：2002-04-12
申请号：KR1020010061031
申请日：2001-09-29
申请人： 레르 리키드 쏘시에떼 아노님 뿌르 레뜌드 에렉스뿔라따시옹 데 프로세데 조르즈 클로드
发明人： 지라르쟝마르끄 , 유르시크벤자민 , 프리드쟝 , 맥앤드류제임스제이에프
IPC分类号： H01L21/02
CPC分类号： C30B33/005 , C23C8/16 , G01N21/3554
摘要： PURPOSE: A semiconductor processing system and a method for controlling moisture level therein are provided to monitor and control the level of water vapor present as a process gas in an accurate and fast manner. The system and the method are also provided to control the moisture level in a semiconductor process chamber which can be practiced on the inventive system. CONSTITUTION: A system includes a process chamber(2) for treating a semiconductor substrate(3) with one or more process gases comprising water vapor, means for delivering the water vapor or one or more precursors thereof to the process chamber(2), an exhaust conduit(7) connected to the process chamber(2), an absorption spectroscopy system(8) for sensing water vapor in a sample region, and a control system(21) which controls water vapor content in the process chamber(2). Also provided is a method for controlling the water vapor level in a semiconductor process chamber. The system and method allow for measurement and control of the water vapor level in a semiconductor processing chamber in which water vapor is present as a process gas.
摘要翻译：目的：提供半导体处理系统和控制其中的水分含量的方法，以准确和快速的方式监测和控制作为工艺气体存在的水蒸气的水平。还提供了该系统和方法以控制可在本发明系统上实施的半导体处理室中的湿度水平。构成：系统包括用于用一种或多种包含水蒸气的工艺气体处理半导体衬底（3）的处理室（2），用于将水蒸汽或其一种或多种前体输送到处理室（2）的装置，连接到处理室（2）的排气导管（7），用于感测样品区域中的水蒸汽的吸收光谱系统（8），以及控制处理室（2）中的水蒸气含量的控制系统（21）。还提供了一种用于控制半导体处理室中的水蒸汽水平的方法。该系统和方法允许在存在水蒸气作为处理气体的半导体处理室中测量和控制水蒸汽水平。

IPRDB

热门服务

关于我们

友情链接

联系方式