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    • 1. 发明公开
    • 특히 코팅에서 샘플을 준비하기 위한 장치
    • 用于制备,特别是涂料,样品的装置
    • KR1020130136384A
    • 2013-12-12
    • KR1020130058851
    • 2013-05-24
    • 라이카 미크로시스테메 게엠베하
    • 부르징거파울랑안톤
    • G01N1/36H01J37/20
    • H01J37/261C23C14/24C23C14/54
    • The present invention relates to an apparatus for applying a coating to a sample (100, 200). The apparatus comprises: a vacuum chamber with a metal container shape (105, 205); at least one source of coating material which is connected to the vacuum chamber (105, 205); at least one sample holder (120) which is configured to arrange that at least one sample is prepared at the sample position inside the vacuum chamber (105, 205); an electronic control system; an operating console (103, 203) for inputting commands for the electronic control system; and a housing (101, 201) for covering at least the vacuum chamber (105, 205) and the electronic control system. The housing (101, 201) has a width (b, b') actually corresponding to the width (b') of the vacuum chamber (105, 205). The vacuum chamber (105, 205) includes a door (106, 206) which is located on the front side of the chamber. The operating console (103, 203) is located inside or in front of the base unit (102, 202) of the housing (101, 201) arranged under the vacuum chamber (105, 205). The at least one source can be installed on the top of the vacuum chamber (105, 205).
    • 本发明涉及一种将涂层施加到样品(100,200)上的装置。 该装置包括:具有金属容器形状(105,205)的真空室; 连接到真空室(105,205)的至少一个涂料源; 至少一个样品保持器(120),其构造成布置在所述真空室(105,205)内的样品位置处制备至少一个样品; 电子控制系统; 操作台(103,203),用于输入电子控制系统的命令; 以及用于至少覆盖真空室(105,205)和电子控制系统的壳体(101,201)。 壳体(101,201)具有实际上对应于真空室(105,205)的宽度(b')的宽度(b,b')。 真空室(105,205)包括位于室前侧的门(106,206)。 操作台(103,203)位于设置在真空室(105,205)下方的壳体(101,201)的基座单元(102,202)的内部或前侧。 至少一个源可以安装在真空室(105,205)的顶部。
    • 2. 发明公开
    • 증발 재료를 코팅하는 방법
    • 涂有蒸发材料的方法
    • KR1020130136385A
    • 2013-12-12
    • KR1020130059515
    • 2013-05-27
    • 라이카 미크로시스테메 게엠베하
    • 부르징거파울랑안톤
    • C23C14/24C23C14/54
    • C23C16/4485C23C14/0605C23C14/26C23C14/546
    • The present invention relates to an apparatus depositing a material layer on a sample inside a vacuum chamber and comprising: a sample stage (100) for arranging at least one sample (103a, 103b, 103c, 103d); evaporation sources (101, 201) connected to a current source for thread-shaped evaporation samples (102, 202); a quartz oscillator (105) for measuring the thickness of a deposition layer; and an evaluation device (113) connected to the quartz oscillator (105); and an electronic control system (112) which is formed to deliver the current, which is provided by two types of current pulses having the length of less than one second, to the evaporation sources (101, 201), wherein the evaluation device (113) is formed to consider the transient attenuating action of the quartz oscillator (105). The present invention also relates to a method for coating evaporated material using the apparatus depositing a material layer on a sample inside a vacuum chamber.
    • 本发明涉及一种在真空室内的样品上沉积材料层的装置,包括:用于布置至少一个样品(103a,103b,103c,103d)的样品台(100); 连接到用于螺纹形蒸发样品(102,202)的电流源的蒸发源(101,201); 用于测量沉积层的厚度的石英振荡器(105); 以及连接到所述石英振荡器(105)的评估装置(113)。 以及电子控制系统(112),其形成为将由两种长度小于一秒的电流脉冲提供的电流传送到蒸发源(101,201),其中评估装置(113) )形成以考虑石英振荡器(105)的瞬态衰减动作。 本发明还涉及使用在真空室内的样品上沉积材料层的装置来涂覆蒸发材料的方法。