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    • 9. 发明公开
    • 전기광학 장치의 제작방법
    • 制造电光器件的方法
    • KR1020010039644A
    • 2001-05-15
    • KR1020000030753
    • 2000-06-05
    • 가부시키가이샤 한도오따이 에네루기 켄큐쇼
    • 야마자키순페이고야마준야마모토쿠니타카고누마토시미츠
    • H01L29/786
    • H01L51/52H01L27/12H01L27/1214H01L27/3211H01L27/3244H01L27/3258H01L51/0005H01L51/0038H01L51/0042H01L51/0059H01L51/0062H01L51/0077H01L51/0078H01L51/0081H01L51/0085H01L51/0087H01L51/5237H01L51/524H01L51/5253H01L51/529
    • PURPOSE: A method for manufacturing an electro-optical device is provided to provide have good operation performance and high reliability and increase the quality of electronic equipment (an electronic device) having the electro-optical device as a display by increasing the image quality of the electro-optical device. CONSTITUTION: The gate electrodes(19a,19b) become a double gate structure electrically connected by a gate wiring(211) which is formed by a different material(a material having a lower resistance than the gate electrodes(19a,19b)). Of course, not only a double gate structure, but a so-called multi-gate structure (a structure containing an active layer having two or more channel forming regions connected in series), such as a triple gate structure, may also be used. The multi-gate structure is extremely effective in lowering the value of the off current, and by making the switching TFT of the pixel into a multi-gate structure with the present invention, a low off current value can be realized for the switching TFT. The active layer is formed by a semiconductor film containing a crystal structure. In other words, a single crystal semiconductor film may be used, and a polycrystalline semiconductor film or a microcrystalline semiconductor film may also be used. Further, the gate insulating film may be formed by an insulating film containing silicon. Additionally, any conducting film can be used for the gate electrodes, the source wiring, and the drain wiring. In addition, the LDD regions in the switching TFT are formed so as not to overlay with the gate electrodes(19a-19b) by interposing the gate insulating film.
    • 目的:提供一种制造电光装置的方法,通过提高电光装置的图像质量,具有良好的操作性能和高可靠性,并且提高了具有电光装置作为显示器的电子设备(电子装置)的质量 电光装置。 构成:栅电极(19a,19b)成为由栅极布线(211)电连接的双栅极结构,栅极布线由不同的材料(具有比栅电极(19a,19b)的电阻低的材料)形成。 当然,不仅可以使用双栅结构,而且可以使用所谓的多栅极结构(包含具有两个或更多个串联连接的沟道形成区的有源层的结构),例如三栅极结构。 多栅极结构在降低截止电流的值方面是非常有效的,并且通过将本发明的像素的开关TFT制成多栅极结构,可以实现开关TFT的低截止电流值。 有源层由含有晶体结构的半导体膜形成。 换句话说,可以使用单晶半导体膜,也可以使用多晶半导体膜或微晶半导体膜。 此外,栅绝缘膜可以由含硅的绝缘膜形成。 此外,任何导电膜可用于栅电极,源极布线和漏极布线。 此外,开关TFT中的LDD区域通过插入栅极绝缘膜而形成为不与栅电极(19a-19b)覆盖。