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1. 发明公开

KR1020020009059A 테트라메틸 암모늄 하이드록사이드를 분해하는 신규한바실러스 세레우스 ＩＢＮ-Ｈ4 및 전기 균주를 이용한폐수처리방법 无效
标题翻译：用于分解三甲基氢氧化铵（TMAH）的新型巴豆酵母IBN-H4和使用菌株进行废水处理的方法
公开(公告)号：KR1020020009059A
公开(公告)日：2002-02-01
申请号：KR1020000042272
申请日：2000-07-22
申请人： (주)아이비진
发明人： 이대상 , 이미경 , 신철수 , 윤정환 , 염도영 , 이정기 , 박기돈 , 최호준 , 구본탁 , 강기정
IPC分类号： C12N1/20
摘要： PURPOSE: Novel bacillus cereus IBN-H4 (KCTC 0835BP) for decomposing trimethyl ammonium hydroxide (TMAH), which is useful for treating wastewater from etching process of silicon surface in semiconductor manufacturing facilities. CONSTITUTION: The bacillus cereus IBN-H4 (KCTC 0835BP) is shake-cultured in a culture medium containing (NH4)2SO4 3g/L, trace elements such as H3BO3 0.3g, CoSO 4·7H2O 0.2g, ZnSO4·H2O 0.1g, MnCl2·H2O 0.03g, NaMoO4·H2O 0.03g, NiCl2·H2O 0.02g, CuSO4·H2O 0.01g, FeSO4·H2O 20g, CaCl2·H2O 10g/L, MgSO4·7H2O(40%) 2mL/L, 1M phosphate buffer solution (pH 7), 1% TMAH acting as a carbon source at 30°C for 72hrs. Triple test (BOD) of the obtained culture solution show a BOD removal ratio higher than 90%. To culture the bacillus cereus IBN-H4 (KCTC 0835BP), such methods as batch culture, fed-batch culture, and continuous culture are preferably used.
摘要翻译：目的：分解三甲基氢氧化铵（TMAH）的新型蜡状芽孢杆菌IBN-H4（KCTC 0835BP），可用于处理半导体制造设施中硅表面蚀刻工艺的废水。构成：将含有（NH 4）2 SO 4 3g / L的培养基，H3BO3 0.3g，CoSO 4·7H 2 O 0.2g，ZnSO 4·H 2 O 0.1g等微量元素的培养基中的芽孢杆菌IBN-H4（KCTC 0835BP） MnCl2·H2O 0.03g，NaMoO4·H2O 0.03g，NiCl2·H2O 0.02g，CuSO4·H2O 0.01g，FeSO4·H2O 20g，CaCl2·H2O 10g / L，MgSO4·7H2O（40％）2mL / L，1M磷酸盐缓冲液溶液（pH7），1％TMAH作为碳源在30℃下72小时。所得培养液的三重试验（BOD）显示BOD去除率高于90％。为了培养蜡状芽孢杆菌IBN-H4（KCTC 0835BP），优选使用分批培养，补料分批培养和连续培养等方法。

2. 发明公开

KR1020020009060A 테트라메틸 암모늄 하이드록사이드를 분해하는 신규한아시네토박터 속 ＩＢＮ-Ｈ7 및 전기 균주를 이용한폐수처리방법 无效
标题翻译：新款ACINETOBACTER SP 用于分解三甲基氢氧化铵（TMAH）的IBN-H7以及使用该应变的废水处理方法
公开(公告)号：KR1020020009060A
公开(公告)日：2002-02-01
申请号：KR1020000042273
申请日：2000-07-22
申请人： (주)아이비진
发明人： 이대상 , 이미경 , 신철수 , 윤정환 , 염도영 , 이정기 , 박기돈 , 최호준 , 구본탁 , 강기정
IPC分类号： C12N1/20
摘要： PURPOSE: Novel acinetobacter sp. IBN-H7 (KCTC 0836BP) for decomposing trimethyl ammonium hydroxide (TMAH), which is useful for treating wastewater from etching process of silicon surface in semiconductor manufacturing facilities. CONSTITUTION: The acinetobacter sp. IBN-H7 (KCTC 0836BP) is shake-cultured in a culture medium containing (NH4)2SO4 3g/L, trace elements such as H3BO3 0.3g, CoSO 4·7H2O 0.2g, ZnSO4·H2O 0.1g, MnCl2·H2O 0.03g, NaMoO4·H2O 0.03g, NiCl2·H2O 0.02g, CuSO4·H2O 0.01g, FeSO4·H2O 20g, CaCl2·H2O 10g/L, MgSO4·7H2O(40%) 2mL/L, 1M phosphate buffer solution (pH 7), 1% TMAH acting as a carbon source at 30°C for 72hrs. Triple test (BOD) of the obtained culture solution show a BOD removal ratio higher than 90%. To culture the acinetobacter sp. IBN-H7 (KCTC 0836BP), such methods as batch culture, fed-batch culture, and continuous culture are preferably used. In the wastewater treatment method, one strain selected from kluvyeromyces delphinesis IBN-H1(KCTC 0834BP) or bacillus cereus IBN-H4(KCTC 0835BP) is added.
摘要翻译：目的：新型不动杆菌属用于分解三甲基氢氧化铵（TMAH）的IBN-H7（KCTC 0836BP），其可用于处理半导体制造设施中硅表面的蚀刻工艺的废水。构成：不动杆菌属将IBN-H7（KCTC 0836BP）在含有（NH 4）2 SO 4 3g / L，痕量元素如H3BO3 0.3g，CoSO 4·7H 2 O 0.2g，ZnSO 4·H 2 O 0.1g，MnCl 2·H 2 O 0.03g ，NaMoO4·H2O 0.03g，NiCl2·H2O 0.02g，CuSO4·H2O 0.01g，FeSO4·H2O 20g，CaCl2·H2O 10g / L，MgSO4·7H2O（40％）2mL / L，1M磷酸盐缓冲溶液（pH7），1％TMAH在30℃下作为碳源72小时。所得培养液的三重试验（BOD）显示BOD去除率高于90％。培养不动杆菌属 IBN-H7（KCTC 0836BP）优选使用分批培养，补料分批培养和连续培养等方法。在废水处理方法中，加入了选自德氏梭菌IBN-H1（KCTC 0834BP）或蜡状芽孢杆菌IBN-H4（KCTC 0835BP）的一种菌株。

3. 发明公开

KR1020020008356A 테트라메틸 암모늄 하이드록사이드를 분해하는 신규한클루이베로마이세스 델펜시스 ＩＢＮ-Ｈ1 및 전기 균주를이용한 폐수처리방법 无效
标题翻译：新型KLUYVEROMYCES DELPHENSIS IBN-H1分解四甲基氢氧化铵和使用该方法处理废水的方法
公开(公告)号：KR1020020008356A
公开(公告)日：2002-01-30
申请号：KR1020000042271
申请日：2000-07-22
申请人： (주)아이비진
发明人： 이대상 , 이미경 , 신철수 , 윤정환 , 염도영 , 이정기 , 박기돈 , 최호준 , 구본탁 , 강기정
IPC分类号： C12N1/16
摘要： PURPOSE: Provided are novel Kluyveromyces delphensis IBN-H1 decomposing tetramethyl ammonium hydroxide (TMAH) and a method for treating waste water using the same strain. TMAH is used in etching the surface of the silicon, and is accordingly contained in the waste water of a semiconductor plant. It is hardly decomposed and shows toxicity. This waste water containing TMAH is treated by the above novel strain eliminating 90% of TMAH therefrom. The process can be used in the industry as an environment-friendly waste water treatment. CONSTITUTION: The strain is prepared by: culturing strains in the waste water of semiconductor plants and culturing again the above strains in the medium containing TMAH; selecting 7 strains showing resistance to TMAH; and naming them as IBN H- 1-IBN H-7 and choosing IBN H-1, IBN H-4 and IBN H-7, which have excellent TMAH decomposability. They are identified as a novel strain belonging to Kluyveromyces delphensis, Bacillus cereus and Acinetobacter sp. by BIOLOG system, MIDI and partial base sequence of 16s RNA and named Kluyveromyces delphensis IBN H-1 (KCTC 0834BP), Bacillus cereus IBN H-4 (KCTC 0835BP) and Acinetobacter sp. IBN H-7 (KCTC 0836PB). The biological treatment of the waste water with TMAH is carried out by a batch culture, more preferably fed-batch culture or continuous culture.
摘要翻译：目的：提供新型克氏疏螺旋体IBN-H1分解四甲基氢氧化铵（TMAH）和使用相同菌株处理废水的方法。 TMAH用于蚀刻硅的表面，因此被包含在半导体工厂的废水中。它几乎不分解并显示毒性。含有TMAH的废水由上述新型菌株处理，消除了90％的TMAH。该工艺可作为环保废水处理在工业中使用。构成：菌株通过：在半导体植物的废水中培养菌株，并在含有TMAH的培养基中再次培养上述菌株; 选择显示耐TMAH的7株; 并命名为IBN H-1-IBN H-7，并选择具有优异TMAH分解性的IBN H-1，IBN H-4和IBN H-7。它们被鉴定为属于德国克鲁维酵母（Kluyveromyces delphensis），蜡样芽胞杆菌（Bacillus cereus）和不动杆菌属（Acinetobacter sp。）的新菌株。通过BIOLOG系统，16S RNA的MIDI和部分碱基序列，命名为Kluyveromyces delphensis IBN H-1（KCTC 0834BP），蜡状芽孢杆菌IBN H-4（KCTC 0835BP）和不动杆菌属。 IBN H-7（KCTC 0836PB）。使用TMAH对废水的生物处理通过分批培养进行，更优选补料分批培养或连续培养。

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