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    • 2. 发明授权
    • 스티프너 로딩시스템
    • KR102241732B1
    • 2021-04-19
    • KR1020200024838
    • 2020-02-28
    • (주)유한엔씨아이주식회사 백광테크
    • 김석태임성식
    • B65G47/90B65G60/00B65G35/00B65G37/00
    • 본발명은간단한구조에의해트레이상에스티프너를용이하게적재하도록구비되어효율적인작동이가능한스티프너로딩시스템에관한것이다. 본발명에따르면, 상호나란하게배열되는제1 라인(33)과제2 라인(34)으로구성된이송라인(32)과; 상기이송라인(32)의일측에위치되어빈 트레이(20)를공급하도록된 트레이공급수단(40)과; 상기트레이공급수단(40)에의해공급되는트레이(20)를거치하기위한제1 받침대(52)와제2 받침대(53)가각각구비되어상기제1 라인(33)과제2 라인(34) 상에서각각전후진되는제1 로딩슬라이더(50) 및제2 로딩슬라이더(51)와; 상기트레이공급수단(40) 측에근접되어복수개의스티프너(10)를정렬된상태로연속적으로진행시키도록된 스티프너공급수단(60)과; 상기스티프너공급수단(60)에의해공급되는스티프너(10)를픽업하여상기트레이(20) 상에적재하도록된 부품픽업수단(61)과; 상기스티프너공급수단(60)의일측에위치되어트레이(20)에적재된스티프너(10)를커버하는금속판(11)을공급하도록된 패널공급수단(70)과; 상기이송라인(32)의타측에위치되어상기각 로딩슬라이더(50,51) 상의트레이(20)를언로딩하여적재하도록트레이반출수단(80)을포함하는스티프너로딩시스템이제공된다.
    • 3. 发明授权
    • 바렐을 이용한 3가크롬 도금장치
    • 使用BARREL的TRIVALENT铬镀层设备
    • KR101265156B1
    • 2013-05-27
    • KR1020120139151
    • 2012-12-03
    • 주식회사 백광테크
    • 임이근
    • C25D17/20C25D17/02
    • C25D17/20C25D3/06C25D17/12
    • PURPOSE: A trivalent chromium plating apparatus using a barrel is provided to obtain excellent product quality with a smooth surface on a plated object due to excellent current efficiency of a plating solution for trivalent chromium plating. CONSTITUTION: A trivalent chromium plating apparatus using a barrel includes a barrel(8) which is dipped into a plating tub(2) when the inside of the barrel is filled with a conductive ball and a plated body. A shaft rod(28) is connected to a rotary transferring shaft(32) by a lifting belt(30) so that a lifted body(18) moves vertically along a transfer guide(26). A supply bath supplies a plating solution to the plating tub in order to maintain the plating condition including the concentration, temperature, and pH at a constant level. An iridium anode rod(6) is dipped into the plating bath, and a cathode copper bus bar which is positioned with an interval from the bottom of the barrel is dipped into the plating solution inside the barrel. A plated object is installed with a film by flowing a current in the plating solution by applying a 450-600A current to the iridium anode rod and the cathode copper bus bar.
    • 目的:提供一种使用圆筒的三价镀铬装置,由于三价镀铬电镀液的电流效率优异,从而获得优异的产品质量,镀层物体表面光滑。 构成:使用筒的三价镀铬装置包括当桶的内部填充有导电球和电镀体时,该桶(8)浸入电镀槽(2)中。 轴杆(28)通过提升带(30)连接到旋转传递轴(32),使得升起的主体(18)沿着传送引导件(26)垂直移动。 供给浴将电镀液供给到电镀槽中,以将包括浓度,温度和pH在内的电镀条件保持在一定水平。 将铱阳极棒(6)浸入镀浴中,并且将从筒的底部间隔开的阴极铜母线浸入筒内的镀液中。 通过向铱阳极棒和阴极铜母线施加450-600A的电流,通过在电镀液中流过电流来安装电镀对象。
    • 5. 发明授权
    • 3가크롬을 사용하는 바렐도금방법
    • 使用TRIVALENT CHROMIUM的BARREL镀层方法
    • KR101291556B1
    • 2013-08-08
    • KR1020120137672
    • 2012-11-30
    • 주식회사 백광테크
    • 임이근
    • C25D17/20
    • C25D17/20C25D3/06C25D21/12
    • PURPOSE: A barrel plating method using trivalent chromium is provided to obtain an environment-friendly effect and an excellent yield by performing trivalent chromium plating, thereby reducing manufacturing costs. CONSTITUTION: A barrel plating method using trivalent chromium is as follows. A plating tub (2) is filled with trivalent chromium plating solution (4) including trivalent chromium, humectants, and a nickel material. An anode body (6) is installed in the plating tub so that a copper cathode bus bar (10), which is extended across a space between rotary shafts of both ends of a barrel (8), is fixed transversely by being spaced from the bottom surface of the barrel which is axially rotated. A conductive ball (12) and an object (14) to be plated are input inside the barrel, and an electric current is applied to the barrel. The object to be plated inside the plating solution in which electric current is applied is plated so that the continuous growth of plating is possible.
    • 目的:提供使用三价铬的滚镀方法,通过进行三价镀铬来获得环境友好效果和良好的收率,从而降低制造成本。 构成:使用三价铬的滚镀方法如下。 电镀槽(2)用三价铬,保湿剂和镍材料填充三价镀铬液(4)。 阳极体(6)安装在电镀槽中,使得横过筒体(8)的两端的旋转轴之间的空间延伸的铜阴极汇流条(10)横向地与 筒的底表面轴向旋转。 导电球(12)和被镀物体(14)被输入到枪管内部,并且电流被施加到枪管。 镀敷在其中施加电流的电镀溶液中的物体被镀覆,使得镀层的连续生长成为可能。