会员体验
专利管家(专利管理)
工作空间(专利管理)
风险监控(情报监控)
数据分析(专利分析)
侵权分析(诉讼无效)
联系我们
交流群
官方交流:
QQ群: 891211   
微信请扫码    >>>
现在联系顾问~
热词
    • 46. 发明公开
    • 표시 기판 및 이의 제조 방법
    • 显示基板及其制造方法
    • KR1020120014609A
    • 2012-02-20
    • KR1020100076673
    • 2010-08-10
    • 삼성디스플레이 주식회사
    • 최영주이우근김도현
    • G02F1/1368H01L27/12G02F1/1362G02F1/1333H01L29/45H01L29/49H01L21/465
    • H01L27/1225G02F1/1368G02F1/133345G02F1/136227G02F1/136286H01L21/465H01L27/1274H01L29/458H01L29/4908
    • PURPOSE: A display substrate and a manufacturing method thereof are provided to increase the electric property of a switching element with an oxide semiconductor. CONSTITUTION: A gate pattern comprises a gate electrode(123) on a substrate. A gate insulating layer(131) is formed on the substrate with the gate electrode. An insulating layer(133) comprises a first thick unit(132a) which is formed on the gate insulating layer of a first area overlapped with the gate electrode, and a second thick unit(132b) which is thinner than the first thick unit forming on the gate insulating layer of a second area neighboring the first area. An oxide semiconductor pattern(140) is formed on the first thick unit of the first area. An etch stopper(150) is arranged on the oxide semiconductor pattern. A source pattern includes a source electrode and a drain electrode which contact with the oxide semiconductor pattern. A pixel electrode contacts with the drain electrode.
    • 目的:提供显示基板及其制造方法,以增加开关元件与氧化物半导体的电性能。 构成:栅极图案包括在基板上的栅电极(123)。 栅极绝缘层(131)与栅电极形成在衬底上。 绝缘层(133)包括形成在与栅电极重叠的第一区域的栅极绝缘层上的第一厚单元(132a)和比形成在第一厚单元上的第一厚单元更薄的第二厚单元(132b) 第二区域的栅极绝缘层与第一区域相邻。 在第一区域的第一厚单元上形成氧化物半导体图案(140)。 在氧化物半导体图案上布置有蚀刻停止层(150)。 源图案包括与氧化物半导体图案接触的源电极和漏电极。 像素电极与漏电极接触。