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31. 发明公开

KR1020100100128A 플라즈마 디스플레이 패널용 유전체 및 격벽 동시 제거제 조성물 无效
标题翻译：用于同时去除等离子体显示面板的电介质层和栅栏的组合物
公开(公告)号：KR1020100100128A
公开(公告)日：2010-09-15
申请号：KR1020090018834
申请日：2009-03-05
申请人： 주식회사 동진쎄미켐
发明人： 김병욱 , 윤석일 , 정종현 , 허순범 , 신성건 , 정세환 , 장두영 , 박선주 , 권오환
IPC分类号： C09K13/00 , C11D3/02 , H01J11/38
摘要： PURPOSE: A composition for simultaneously removing a dielectric layer and a barrier-rib of a plasma display panel is provided to remove the dielectric layer and the barrier-rib at a plastic state at the same time. CONSTITUTION: A composition for simultaneously removing a dielectric layer and a barrier-rib of a plasma display panel contains 15~25wt% of inorganic alkali metal compound, 0.0002~2wt% of ammonium compound, and the balance of water. The inorganic alkali metal compound is selected from the group consisting of potassium hydroxide, potassium acetate, potassium nitrate, potassium carbonate, potassium pyrophosphate, potassium oleate, and others.
摘要翻译：目的：提供用于同时除去等离子体显示面板的电介质层和阻挡肋的组合物，以同时去除塑料状态的电介质层和阻挡肋。构成：用于同时除去等离子体显示面板的电介质层和阻挡肋的组合物含有15〜25重量％的无机碱金属化合物，0.0002〜2重量％的铵化合物和余量的水。无机碱金属化合物选自氢氧化钾，乙酸钾，硝酸钾，碳酸钾，焦磷酸钾，油酸钾等。

32. 发明公开

KR1020100070087A 포토레지스트 박리제 조성물 및 박막 트랜지스터 어레이 기판의 제조 방법 无效
标题翻译：光电子剥离器的组合物和制造薄膜晶体管阵列基板的方法
公开(公告)号：KR1020100070087A
公开(公告)日：2010-06-25
申请号：KR1020080128684
申请日：2008-12-17
申请人： 삼성디스플레이 주식회사 , 주식회사 동진쎄미켐
发明人： 정종현 , 김봉균 , 박홍식 , 홍선영 , 최영주 , 이병진 , 서남석 , 김병욱 , 윤석일 , 정종현 , 신성건 , 허순범 , 정세환 , 장두영 , 박선주 , 권오환
IPC分类号： G03F7/42
CPC分类号： G03F7/425 , H01L27/124 , H01L27/1288
摘要： PURPOSE: A photoresist stripper composition and a method for manufacturing a thin film transistor array substrate using the same are provided to prevent the damage of an underlayer film when photoresist is stripped. CONSTITUTION: A photoresist stripper composition comprises: chain type amine compound 5 ~ 30 weight%; cyclic amine compound 0.5 ~ 10 weight%; glycol ether compound 10 ~ 80 weight%; distilled water 5 ~ 30 weight%; and anticorrosive agent 0.1 ~ 5 weight%. The chain type amine compound is selected from a group comprising monoethanolamine, diethanolamine, triethanolammine, propanolamin, dipropanolamine, tripropanolamine, isopropanol amine, diisopropanol, triisopropanol amine, 2-(2-aminoetoxy) ethanol.
摘要翻译：目的：提供光致抗蚀剂剥离剂组合物和使用其制造薄膜晶体管阵列基板的方法，以防止当光致抗蚀剂剥离时下层膜的损伤。构成：光致抗蚀剂剥离剂组合物包含：链型胺化合物5〜30重量％; 环胺化合物0.5〜10重量％; 乙二醇醚化合物10〜80重量％; 蒸馏水5〜30重量％; 和防腐剂0.1〜5重量％。链型胺化合物选自单乙醇胺，二乙醇胺，三乙醇胺，丙醇胺，二丙醇胺，三丙醇胺，异丙醇胺，二异丙醇，三异丙醇胺，2-（2-氨氧基）乙醇。

33. 发明公开

KR1020100009409A 액정표시장치의 색 필터 온 어레이 제조공정의포토레지스트 박리제 조성물 有权
标题翻译：用于在液晶显示器阵列上制备彩色滤光片的光刻胶剥离组合物
公开(公告)号：KR1020100009409A
公开(公告)日：2010-01-27
申请号：KR1020080070280
申请日：2008-07-18
申请人： 주식회사 동진쎄미켐
发明人： 김병욱 , 윤석일 , 정종현 , 허순범 , 신성건 , 정세환 , 장두영 , 박선주 , 권오환
IPC分类号： G03F7/42 , G03F7/34
CPC分类号： G03F7/425 , G02F1/1335 , G02F1/133514 , G02F1/13458 , G02F1/136209 , G02F1/136227 , G03F7/32 , G03F7/422
摘要： PURPOSE: A photoresist stripper composition is provided to prevent display defects caused by the swelling of a color filter in a color filter on array structure, to minimize damage to an underlayer, and to ensure excellent releaseability of the photosensitive film. CONSTITUTION: A photoresist stripper composition for preparing a color filter on array of LCD comprises 1-40 weight% water-soluble organic amine compound, 3-40 weight% water, and the remaining amount of water-soluble organic solvent. The composition further includes 0.1-10 parts by weight of corrosion inhibitor based on 100.0 parts by weight of the composition.
摘要翻译：目的：提供光致抗蚀剂剥离剂组合物，以防止由阵列结构上的滤色器中的滤色器膨胀引起的显示缺陷，以使对底层的损伤最小化，并确保感光膜的优异的可剥离性。构成：用于在LCD阵列上制备滤色器的光致抗蚀剂剥离剂组合物包含1-40重量％的水溶性有机胺化合物，3-40重量％的水和剩余量的水溶性有机溶剂。该组合物还包含基于组合物100.0重量份的0.1-10重量份的防腐剂。

34. 发明公开

KR1020090085247A 케미컬의 재생 방법 无效
标题翻译：循环化学方法
公开(公告)号：KR1020090085247A
公开(公告)日：2009-08-07
申请号：KR1020080011048
申请日：2008-02-04
申请人： 주식회사 동진쎄미켐
发明人： 윤석일 , 김성배 , 신성건 , 이성현 , 장두영
IPC分类号： H01L21/02
CPC分类号： B01D11/0407 , B01D11/0403 , B01D11/0488 , B01D11/0492
摘要： A method of recycling chemical is provided to reduce the amount of chemical waste and prevent environmental contamination by removing the foreign material contained in the chemical. In a method of recycling chemical, the chemical containing the foreign material is precipitated by being reacted with a supercritical fluid(S110). The precipitated foreign material is separated from the chemical and the supercritical fluid(S120), and the supercritical fluid is separated from chemical and chemical is collected(S130). A chemical manufacturing process includes one of a semiconductor device manufacturing process and a flat panel display apparatus manufacturing process.
摘要翻译：提供一种回收化学品的方法，以减少化学废物的量，并通过去除化学品中所含的异物来防止环境污染。在回收化学品的方法中，含有异物的化学物质通过与超临界流体反应而沉淀（S110）。将析出的异物与化学物质和超临界流体分离（S120），并将超临界流体与化学物质分离，收集（S130）。化学制造方法包括半导体器件制造工艺和平板显示器件制造工艺中的一个。

35. 发明公开

KR1020090032640A 박리 조성물 및 박리 방법 有权
标题翻译：用于剥离和剥离方法的组合物
公开(公告)号：KR1020090032640A
公开(公告)日：2009-04-01
申请号：KR1020070098028
申请日：2007-09-28
申请人： 삼성디스플레이 주식회사 , 주식회사 동진쎄미켐
发明人： 이지선 , 박홍식 , 정종현 , 홍선영 , 김봉균 , 이병진 , 김병욱 , 정종현 , 윤석일 , 김성배 , 신성건 , 허순범 , 정세환 , 장두영
IPC分类号： G03F7/34
CPC分类号： G03F7/425
摘要： A stripping composition and a stripping method using the same are provided to prevent the damage of the thin film transistor when removing color resist or organic insulating film. A stripping composition comprises a hydroxide-based compound 0.5-45 weight%, alkylene glycol alkyl ether-based compound 10-89 weight%, an alkanolamine-based compound 5-45 weight% and inorganic salt compound 0.01-5 weight%. The hydroxide-based compound has C1-4 alkyl group. The alkylene glycol alkyl ether-based compound has C1-4 alkyl group.
摘要翻译：提供剥离组合物和使用其的剥离方法以防止当去除彩色抗蚀剂或有机绝缘膜时薄膜晶体管的损坏。剥离组合物包含0.5-45重量％的氢氧化物基化合物，10-89重量％的亚烷基二醇烷基醚基化合物，5-45重量％的链烷醇胺化合物和0.01-5重量％的无机盐化合物。基于氢氧化物的化合物具有C1-4烷基。亚烷基二醇烷基醚类化合物具有C1-4烷基。

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