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    • 8. 发明专利
    • Manufacturing process of antireflective organic substrate
    • 抗反应有机基质的制备方法
    • JP2004209973A
    • 2004-07-29
    • JP2003417955
    • 2003-12-16
    • Asahi Glass Co Ltd旭硝子株式会社
    • ISHIZEKI KENJIWAKABAYASHI HIROKAZUHIGUCHI TOSHIHIKO
    • G02B1/11B05D7/24B32B27/00C08G77/62
    • PROBLEM TO BE SOLVED: To offer a stable manufacturing process for providing an antireflective organic substrate which is improved in interface adhesion between a substrate, a hard coat and an antireflective layer, and excellent in scratch resistance and antireflection. SOLUTION: Layers are formed, on a surface of an organic substrate in the following order from the substrate side: a cured layer (A) of an active energy ray curable composition, a cured layer (B) of a coating composition containing fine particles with a refractive index of 1.55 or higher and a polysilazane, and a cured layer (C) of a coating composition containing a polysilazane; wherein the polysilazane in the cured layer (B) is a polysilazane having an alkyl and/or aryl radicals in its molecule. COPYRIGHT: (C)2004,JPO&NCIPI
    • 要解决的问题:提供一种稳定的制造方法,用于提供改善基材,硬涂层和抗反射层之间的界面粘合性,耐擦伤性和抗反射性优异的抗反射有机基材。 解决方案:从有机基板的表面依次从基板侧形成层:活性能量射线固化性组合物的固化层(A),涂布组合物的固化层(B),其含有 折射率为1.55以上的微粒和聚硅氮烷,以及含有聚硅氮烷的涂料组合物的固化层(C) 其中固化层(B)中的聚硅氮烷是其分子中具有烷基和/或芳基的聚硅氮烷。 版权所有(C)2004,JPO&NCIPI