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1. 发明专利

JPH0651740B2 失效
公开(公告)号：JPH0651740B2
公开(公告)日：1994-07-06
申请号：JP28098488
申请日：1988-11-07
IPC分类号： C08F212/08 , C08F8/04 , C08F32/00 , C08F212/00 , C08F232/02 , C08F232/08 , C08F240/00 , C09J145/00

2. 发明专利

JPH02127409A PRODUCTION OF HYDROGENATED PETROLEUM RESIN HAVING EXCELLENT TACKY ADHESIVE CHARACTERISTIC AND TACKY ADHESIVE COMPOSITION CONTAINING PRODUCED HYDROGENATED PETROLEUM RESIN 失效
公开(公告)号：JPH02127409A
公开(公告)日：1990-05-16
申请号：JP28098488
申请日：1988-11-07
申请人： MARUZEN PETROCHEM CO LTD
发明人： HAYASHIDA SUETAKA , SUZUKI AKIRA , KIMURA KYOICHIRO , SAKUMA AKIRA , MINOMIYA KATSUMI
IPC分类号： C08F212/08 , C08F8/04 , C08F32/00 , C08F212/00 , C08F232/02 , C08F232/08 , C08F240/00 , C09J145/00
摘要： PURPOSE:To obtain the subject resin having excellent tacky adhesive characteristics, heat-resistance, etc., and useful as a tacky adhesive by thermally polymerizing a cyclopentadiene compound and a specific aromatic hydrocarbon at a specific ratio under a specific condition and hydrogenating the resultant copolymer resin. CONSTITUTION:The objective resin can be produced by (1) thermally polymerizing (A) 1mol of a cyclopentadiene compound with (B) 0.42-0.65mol of a polymerizable aromatic hydrocarbon selected from monovinyl aromatic hydrocarbon (e.g., styrene) and indenes under a condition to satisfy the formula P>=11 wherein P is a value calculated by the formula HAROMA is number of hydrogen atoms determined by H-NMR on the aromatic carbon in the produced copolymer resin; HND+CD is sum of the hydrogen numbers determined by H-NMR on norbornene ring double bond carbon and cyclopentene ring double bond carbon in the copolymer resin; B is molar ratio of A/B) and (2) hydrogenating the obtained copolymer resin in the presence of a hydrogenation catalyst.

3. 发明专利

JPS62928B2 失效
公开(公告)号：JPS62928B2
公开(公告)日：1987-01-10
申请号：JP13840477
申请日：1977-11-17
申请人： STANDARD OIL CO OHIO
发明人： JOOJI SUUSHIAN RII
IPC分类号： C08F26/00 , C08F32/00 , C08F34/00 , C08F220/00 , C08F220/42 , C08F226/06 , C08F232/02 , C08F234/02

4. 发明专利

JPS62927B2 失效
公开(公告)号：JPS62927B2
公开(公告)日：1987-01-10
申请号：JP12294577
申请日：1977-10-13
申请人： STANDARD OIL CO OHIO
发明人： JOOJI SUUJIANGU RII
IPC分类号： C08F12/00 , C08F32/00 , C08F34/00 , C08F220/00 , C08F220/42 , C08F232/02 , C08F234/02

5. 发明专利

JP2012181427A Optical waveguide and electronic apparatus 审中-公开
标题翻译：光学波导和电子设备
公开(公告)号：JP2012181427A
公开(公告)日：2012-09-20
申请号：JP2011045164
申请日：2011-03-02
申请人： Sumitomo Bakelite Co Ltd , 住友ベークライト株式会社
发明人： MORI TETSUYA , TAKAYAMA SHOTARO , MORIYA KIMIO
IPC分类号： G02B6/122 , C08F232/02 , G02B6/12 , G02B6/13
摘要： PROBLEM TO BE SOLVED: To provide a reliable optical waveguide with high transmission efficiency and high optical coupling efficiency relative to light-emitting/receiving elements, and an electronic apparatus having such an optical waveguide.SOLUTION: An optical waveguide 1 includes: a region in the vicinity of a light incident end part 1A thereof composed of an SI portion with a refractive index profile of a step index type on a line on a cross section; and regions not in the vicinity of the light incident end part 1A composed of a GI portion with a refractive index profile of a graded index type. A refractive index profile of a step index type refers to distribution in which a refractive index changes stepwise, and a refractive index profile of a graded index type refers to distribution which has a region with a high refractive index and regions adjoining the both side thereof with a low refractive index, in which the refractive index changes gradually.
摘要翻译：要解决的问题：提供一种相对于发光/接收元件具有高传输效率和高耦合效率的可靠的光波导，以及具有这种光波导的电子设备。解决方案：光波导1包括：在光入射端部分1A附近的区域，其由在横截面上的线上具有阶跃折射率类型的SI部分组成; 以及不在由折射率分布为渐变折射率的GI部分构成的光入射端部1A附近的区域。阶梯折射率的折射率分布是指折射率逐步变化的分布，渐变折射率类型的折射率分布是指具有高折射率区域和与其两侧相邻的区域的分布，低折射率，折射率逐渐变化。版权所有（C）2012，JPO＆INPIT

7. 发明专利

JP3912483B2 Polymer compound, resist material and pattern forming method 有权
公开(公告)号：JP3912483B2
公开(公告)日：2007-05-09
申请号：JP2001266772
申请日：2001-09-04
申请人：セントラル硝子株式会社 , 信越化学工業株式会社 , 松下電器産業株式会社
发明人：一彦前田 , 裕次原田 , 憲太郎堤 , 充孝大谷 , 覚宮澤 , 眞治岸村 , 義夫河合 , 淳渡辺 , 畠山　　潤 , 勝笹子 , 政孝遠藤
IPC分类号： C08F232/00 , G03F7/004 , C08F220/10 , C08F222/40 , C08F232/02 , C08F234/00 , G03F7/039 , H01L21/027
摘要： PROBLEM TO BE SOLVED: To provide a resist material which is sensitive to a high-energy ray being excellent in sensitivity, resolution and plasma-etching resistance for the wavelength of 200 nm or below, particularly 170 nm or below, and by these characteristics, to provide the resist material which has little absorption for the exposure wavelength particularly of F2 excimer laser, etc., and is suitable as a minute-pattern forming material for manufacturing very LSI because of being capable of forming readily patterns which are minute as well as vertical to the base. SOLUTION: A polymer compound comprises a repeating unit A represented by general formula (1) and a repeating unit B which has an acid-unstable group, (R1 to R6 may be same or different each other, each being a hydrogen atom, a fluorine atom, a chlorine atom or a 1-20C straight-, branched-chain or a cyclic alkyl group or a fluorinated alkyl group, while at least one of R1 to R6 contain a fluorine atom; a is in the range of 0

8. 发明专利

JP2005325325A Polymeric compound, photoresist composition containing it and method for forming resist pattern 有权
标题翻译：聚合化合物，含有它的光电组合物和形成电阻图案的方法
公开(公告)号：JP2005325325A
公开(公告)日：2005-11-24
申请号：JP2004181068
申请日：2004-06-18
申请人： Tokyo Ohka Kogyo Co Ltd , 東京応化工業株式会社
发明人： OGATA TOSHIYUKI , YOSHIDA MASAAKI , HANEDA HIDEO , MATSUMARU SHOGO
IPC分类号： G03F7/032 , C08F8/00 , C08F212/14 , C08F220/28 , C08F232/02 , G03F7/039 , H01L21/027
摘要： PROBLEM TO BE SOLVED: To provide a polymeric compound the alkali solubility of which changes in a large way before and after exposure in a chemically amplified positive resist, a photoresist composition containing the polymeric compound and capable of forming a precise pattern of high resolution, and a method for forming a resist pattern.
SOLUTION: This polymeric compound has an alkali soluble group (i). The alkali soluble group (i) is one selected from an alcoholic hydroxyl group, a carboxyl group or a phenolic group that have a substituent protected by an acid dissociative dissolution inhibiting group (ii) represented by general formula (1), wherein R represents a ≤20C organic group of ≥n valency and n represents an integer of 2-5. The photoresist composition and the method for forming the resist pattern are performed using the polymeric compound.
COPYRIGHT: (C)2006,JPO&NCIPI
摘要翻译：要解决的问题：提供一种聚合化合物，其碱溶解度在化学放大的正性抗蚀剂中暴露之前和之后以大的方式变化，含有聚合物的光致抗蚀剂组合物并且能够形成高精度图案分辨率和形成抗蚀剂图案的方法。解决方案：该聚合物具有碱溶性基团（i）。碱溶性基团（i）是选自具有通过通式（1）表示的酸解离溶解抑制基团（ii）保护的取代基的醇羟基，羧基或酚基，其中R表示 ≤20C有机基团，n表示2-5的整数。使用高分子化合物进行光致抗蚀剂组合物和形成抗蚀剂图案的方法。版权所有（C）2006，JPO＆NCIPI

9. 发明专利

JP2000122290A PHOTORESIST MONOMER AND ITS PRODUCTION, PHOTORESIST COPOLYMER AND ITS PRODUCTION, PHOTORESIST COMPOSITION, PHOTORESIST PATTERN FORMING METHOD, AND SEMICONDUCTOR DEVICE 失效
公开(公告)号：JP2000122290A
公开(公告)日：2000-04-28
申请号：JP29565699
申请日：1999-10-18
申请人： HYUNDAI ELECTRONICS IND
发明人： LEE GEUN SU , KOH CHA WON , JUNG JAE CHANG , JUNG MIN HO , BAIK KI HO
IPC分类号： C07C62/34 , C08F32/08 , C08F222/06 , C08F232/02 , C08L45/00 , G03F7/004 , G03F7/039
摘要： PROBLEM TO BE SOLVED: To obtain monomers having excellent etching durability, adhesion property and sensitivity which can be massproduced at a low production cost by using photoresist monomers expressed by a specified formula. SOLUTION: The photoresist monomers are expressed by the formula. In the formula, each of X1 and X2 is CH2, CH2CH2, O or S, Y is CH2 or O, R1 is H or CH3, each of R' and R" is a 0-3C substd. or unsubstd. alkyl group, and i is an integer 0 to 3. The compd. expressed by the formula has three hydroxyl groups per one molecule and shows excellent adhesion property with a substrate. Since the compd. contains carboxyl groups and has excellent sensitivity, it has characteristics suitable to be used for a photoresist. Since the compd. has no odor and can be easily synthesized by recrystallization without using plural separation means such as distillation or column chromatography, the compd. can be mass-produced at a low cost.

10. 发明专利

JP2781252B2 失效
公开(公告)号：JP2781252B2
公开(公告)日：1998-07-30
申请号：JP5728290
申请日：1990-03-08
IPC分类号： C08F2/06 , C08F4/60 , C08F4/68 , C08F32/00 , C08F36/00 , C08F210/00 , C08F210/02 , C08F232/00 , C08F232/02 , C08F232/08 , C08F236/20

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