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2. 发明专利

JP2008177397A Method of measuring thin-film resistance, and method of manufacturing tunnel magnetoresistance element 审中-公开
标题翻译：测量薄膜电阻的方法及制造隧道磁阻元件的方法
公开(公告)号：JP2008177397A
公开(公告)日：2008-07-31
申请号：JP2007010102
申请日：2007-01-19
申请人： Fujitsu Ltd , 富士通株式会社
发明人： KAWAI KENICHI
IPC分类号： H01L43/12 , G11B5/39 , H01L43/08
CPC分类号： G11B5/3193 , B82Y10/00 , B82Y25/00 , G01R27/08 , G01R33/093 , G01R33/098 , G11B5/3906 , G11B5/3909 , G11B5/455 , H01F10/3254 , Y10T29/49036
摘要： PROBLEM TO BE SOLVED: To measure the electric resistance of a thin film formed on a substrate easily and highly accurately, with respect to a method for measuring the resistance of a tunnel magnetoresistance element (TMR element) formed on the substrate and with respect to a method for manufacturing the TMR element whose performance is enhanced. SOLUTION: The method is provided for measuring the resistance a tunnel magnetoresistance element wherein a first conductive layer, a resistance layer, and a second conductive layer are laminated in this order on a substrate, and the first conductive layer has a pin layer and the second conductive layer has a free layer, and further, a barrier layer interposed between the pin and free layers is made its resistance layer. In this resistance measuring method, a sample is created wherein on the substrate, a first low-resistance layer having a low resistance value, a thin film having the same constitution as that of the thin film constituting the tunnel magnetoresistance element and which comprises the first conductive layer, the resistance layer and the second conductive layer, and a second low-resistance layer having a lower resistance value than both the first and second conductive layers are laminated in this order, and further, resistance measuring probes are so applied to the surface of the sample as to measure the resistance of the thin film. COPYRIGHT: (C)2008,JPO&INPIT
摘要翻译：要解决的问题：为了容易且高精度地测量形成在基板上的薄膜的电阻，关于用于测量形成在基板上的隧道磁阻元件（TMR元件）的电阻和关于制造性能提高的TMR元件的方法。解决方案：提供了一种用于测量隧道磁阻元件的电阻的方法，其中第一导电层，电阻层和第二导电层依次层叠在衬底上，并且第一导电层具有引脚层并且第二导电层具有自由层，此外，插入在引脚和自由层之间的阻挡层被制成其电阻层。在这种电阻测量方法中，产生一个样品，其中在衬底上具有低电阻值的第一低电阻层，具有与构成隧道磁阻元件的薄膜相同结构的薄膜，并且包括第一导电层，电阻层和第二导电层，以及具有比第一和第二导电层都低的电阻值的第二低电阻层按顺序层叠，此外，将电阻测量用探针应用于表面以测量薄膜的电阻。版权所有（C）2008，JPO＆INPIT

3. 发明专利

JP2007280545A Thin film magnetic head substrate 审中-公开
标题翻译：薄膜磁头基板
公开(公告)号：JP2007280545A
公开(公告)日：2007-10-25
申请号：JP2006107397
申请日：2006-04-10
申请人： Alps Electric Co Ltd , アルプス電気株式会社
发明人： TAKAHASHI TORU , KOBAYASHI KIYOSHI
IPC分类号： G11B5/31
CPC分类号： G11B5/3193 , G11B5/3169 , G11B5/3967 , Y10T29/49021 , Y10T29/49037
摘要： PROBLEM TO BE SOLVED: To obtain a thin film magnetic head substrate which can reduce a space for allocating a monitor element to improve productivity and precisely define element heights of a reproducing element and a recording element respectively based on change of resistance of the monitor element. SOLUTION: The thin film magnetic head substrate has in line many head elements arranged therein including the reproducing element and recording element, and comprises a reproducing monitor element and a recording monitor element to be used as element resistance monitor when polishing to form the surface of the head element facing a medium between the adjacent head elements. The reproducing monitor element and recording monitor element have common electrode terminals which are connected to both of reproducing monitor element and recording monitor element and a pair of individual electrode terminals which are connected to each of the reproducing monitor element and recording monitor element. COPYRIGHT: (C)2008,JPO&INPIT
摘要翻译：要解决的问题：为了获得薄膜磁头基板，其能够基于基于电阻的变化而减小用于分配监视元件的空间以提高生产率并且精确地定义再现元件和记录元件的元件高度监视元素解决方案：薄膜磁头基板在其中布置有包括再现元件和记录元件的许多头部元件，并且包括再现监视元件和记录监视元件，用于在抛光时用作元件电阻监视器，以形成头元件的表面面向相邻头元件之间的介质。再现监视元件和记录监视器元件具有连接到再现监视元件和记录监视元件两者的公共电极端子和连接到再现监视元件和记录监视元件中的每一个的一对单独的电极端子。版权所有（C）2008，JPO＆INPIT

4. 发明专利

JP2008217901A Measuring method of plated layer width, magnetic recording head and manufacturing method therefor 审中-公开
标题翻译：镀层厚度，磁记录头及其制造方法的测量方法
公开(公告)号：JP2008217901A
公开(公告)日：2008-09-18
申请号：JP2007053679
申请日：2007-03-05
申请人： Fujitsu Ltd , 富士通株式会社
发明人： HOSONO KAZUMASA , IKEGAWA YUKINORI , KATO MASAYA , YANAGAWA MASASHI , YAMAKAWA KAORU , ITO TAKASHI
IPC分类号： G11B5/31 , G11B5/455
CPC分类号： G11B5/3133 , G11B5/1278 , G11B5/3163 , G11B5/3193
摘要： PROBLEM TO BE SOLVED: To allow the width of a main magnetic pole manufactured by a semiconductor process to be accurately measured, by clarifying the boundary between the main magnetic pole and a stopper layer manufactured by the semiconductor process. SOLUTION: Stopper layers 76 are formed on both side faces in a core breadthwise direction of the main magnetic pole 72, formed as a plated layer in a perpendicular magnetic recording head through first inorganic insulating layers 74 made of SiO 2 , Al 2 O 3 , diamond-like carbon, and the like, and a first inorganic insulating layers 74 formed in between the main magnetic pole 72, and the stopper layers are made conspicuous during observation with a scan type electronic microscope, so that the interval of the first inorganic insulating layers 74 is measured with high accuracy as a core width W. COPYRIGHT: (C)2008,JPO&INPIT
摘要翻译：要解决的问题：通过澄清通过半导体工艺制造的主磁极和阻挡层之间的边界，允许准确地测量通过半导体工艺制造的主磁极的宽度。解决方案：阻挡层76形成在主磁极72的芯宽度方向的两个侧面上，通过由SiO 2制成的第一无机绝缘层74形成为垂直磁记录头中的镀层金刚石状碳等，形成在主磁极72之间的第一无机绝缘层74和/或在扫描式电子显微镜的观察期间使阻挡层明显，从而以高精度测量第一无机绝缘层74的间隔作为芯宽度W.版权所有（C）2008，JPO＆INPIT

5. 发明专利

JP2004264290A High-contrast inspection and close inspection of magnetic medium and of head 有权
公开(公告)号：JP2004264290A
公开(公告)日：2004-09-24
申请号：JP2004001754
申请日：2004-01-07
申请人： Kla-Tencor Technologies Corp , ケイエルエイ−テンコーテクノロジーズ,コーポレイション
发明人： MANKOS MARIAN , SOLTZ DAVID A , HESS HARALD F
IPC分类号： G01N23/225 , G01Q30/02 , G01Q30/04 , G01R33/028 , G11B5/012 , G11B5/09 , G11B5/127 , G11B5/31 , G11B5/455 , G11B5/84 , G11B27/36 , H01J37/29
CPC分类号： G11B5/455 , G01N23/2251 , G11B5/012 , G11B5/09 , G11B5/1272 , G11B5/3166 , G11B5/3193 , G11B27/36 , G11B2220/20
摘要： PROBLEM TO BE SOLVED: To provide a method for inspecting and closely inspecting a sample magnetized, using an automatic inspecting apparatus. SOLUTION: In the method, an electron source is used for generating incident electron beams; the sample is biased to the electron source so that incident electrons are decelerated, as they approach the surface of the sample; and one portion of the sample is irradiated with inclined incident electron beams. The sample moves below the incident electron beams by using the movable stage of the inspecting apparatus. Scattered electrons are detected to form the image data of the sample for showing separate contrast between regions with different magnetizations. The movement of the sample below the incident electron beams is continuous, and the data of a plurality of image pixels are acquired in parallel by using a time delay integrating detector. COPYRIGHT: (C)2004,JPO&NCIPI

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