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    • 7. 发明专利
    • Gas treatment device
    • 气体处理装置
    • JP2011075205A
    • 2011-04-14
    • JP2009227020
    • 2009-09-30
    • Mitsubishi Heavy Industries Compressor Corp三菱重工コンプレッサ株式会社
    • TAKEDA KAZUHIRONAKAGAWA YOSUKETAKEDA TOMOAKIMORI YASUSHI
    • F25B1/00
    • F04B49/06F04B49/065F04B2203/0209F04B2205/01F25J3/0223F25J3/0252F25J3/0257F25J3/0266F25J3/0295F25J2230/30F25J2240/02F25J2245/02F25J2280/02Y02C10/12Y02E60/34
    • PROBLEM TO BE SOLVED: To provide a gas treatment device enabling operation regardless of a flow rate of supplied process gas. SOLUTION: The gas treatment device including a compressor 1, a first process 2 arranged downstream of the compressor 1, an expander 3 arranged downstream of the first process 2, a second process 4 arranged downstream of the expander 3 and a driving means driving the compressor 1 includes: a first pressure gage 10 arranged at an inlet of the compressor 1; a second pressure gage 11 arranged at an outlet of the second process 4; a recirculation flow passage 24 connected from the outlet of the second process 4 to the inlet of the compressor 1; a first pressure control valve 12 arranged in the recirculation flow passage 24; a second pressure control valve 13 arranged downstream of the second pressure gage 11; a tachometer 14 measuring the rotating speed of the driving means; and a control means controlling the rotating speed of the driving means and at least either one of the first and second pressure control valves 12, 13 based on the measured pressure and rotating speed. COPYRIGHT: (C)2011,JPO&INPIT
    • 要解决的问题:提供一种气体处理装置,无论所提供的处理气体的流量如何,都能够进行操作。 解决方案:气体处理装置包括压缩机1,布置在压缩机1下游的第一过程2,布置在第一过程2下游的扩展器3,布置在膨胀器3下游的第二过程4和驱动装置 驱动压缩机1包括:设置在压缩机1的入口处的第一压力计10; 布置在第二处理4的出口处的第二压力表11; 从第二处理4的出口连接到压缩机1的入口的再循环流路24; 布置在再循环流路24中的第一压力控制阀12; 布置在第二压力表11的下游的第二压力控制阀13; 测量驱动装置的转速的转速计14; 以及控制装置,其基于测量的压力和转速来控制驱动装置和第一和第二压力控制阀12,13中的至少一个的转速。 版权所有(C)2011,JPO&INPIT