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    • 8. 发明专利
    • Raw material vaporization and supply device
    • 原料气化和供应装置
    • JP2014114463A
    • 2014-06-26
    • JP2012267021
    • 2012-12-06
    • Fujikin Inc株式会社フジキン
    • HIDAKA ATSUSHINAGASE MASAAKIYAMASHITA SATORUNISHINO KOJIIKEDA SHINICHI
    • C23C16/448H01L21/31
    • C23C16/4485C23C16/4481C23C16/4482C23C16/52F17C9/02F22B1/284F22B1/285
    • PROBLEM TO BE SOLVED: To stably supply a raw material gas with high purity and desired concentration to a process chamber while performing flow rate control with high precision by making substantially any raw material gas into a raw material gas with desired high temperature and high vapor pressure without causing any thermal decomposition irrelevantly to whether the raw material is solid or liquid.SOLUTION: In a raw material gas supply device comprising a raw material receiving tank, a vaporizer which vaporizes a liquid pressure-fed from the liquid receiving tank, a flow rate control device which controls the flow rate of a raw material gas from the vaporizer, and a heating device which heats desired parts of the vaporizer, high-temperature and pressure type flow rate control device, and a pipeline connected thereto, respective liquid contact parts or gas contact parts of metal surfaces of any of at least the raw material receiving tank, vaporizer, flow rate control device, pipeline connecting the devices to one another, and an on/off valve interposed in the pipeline are subjected to AlOpassive-state processing, CrOpassive state processing, or FeFpassive state processing.
    • 要解决的问题:通过将基本上任何原料气体基本上成为具有期望的高温和高蒸气压的原料气体,来将高纯度和期望浓度的原料气体稳定地供应到处理室,同时以高精度进行流量控制 不会对原料是固体还是液体造成任何热分解。解决方案:在原料气体供给装置中,包括原料接收罐,蒸发从液体接收罐供给的液体的蒸发器, 控制装置,其控制来自蒸发器的原料气体的流量;以及加热装置,其加热蒸发器,高温和压力型流量控制装置的所需部分以及与其连接的管道,各自的液体接触部分或 至少原料接收罐,蒸发器,流量控制装置,管道c中任何一个的金属表面的气体接触部分 将设备彼此连接,并且插入管道中的开/关阀进行AlOpassive状态处理,CrOpassive状态处理或FeFpassive状态处理。