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    • 7. 发明专利
    • Particle array method, and film and particle array retaining method
    • 粒子阵列方法,以及薄膜和粒子阵列保留方法
    • JP2005186213A
    • 2005-07-14
    • JP2003430775
    • 2003-12-25
    • Kagawa Univ国立大学法人 香川大学
    • TANAKA KATSUSHIICHITSUBO SATORU
    • B82B3/00B81B1/00G11B5/84H01F1/00H01F41/16
    • B81B1/006G11B5/845H01F1/0027H01F41/16
    • PROBLEM TO BE SOLVED: To provide a particle array method, regularly arraying particles at desired spaces regardless of particle diameter, a film formed by the above particle array method, and a particle array holding method, keeping the particle array even if heat treatment is performed.
      SOLUTION: According to this array method of arraying particles MP on the surface of a basic material B, the particles MP are disposed on the surface of the basic material B, the disposed particles MP are bound on the surface of the basic material B by a binding means to move only along the surface, and a magnetic field whose angle made between the normal line direction of the surface of the basic material B and the line H of magnetic force is 0 to 45 degrees is applied to the particles MP. The respective particles MP can be arrayed at spaces corresponding to the repulsive force between the adjacent particles MP like a triangular grid-like on the surface of the basic material B.
      COPYRIGHT: (C)2005,JPO&NCIPI
    • 要解决的问题:为了提供一种粒子阵列方法,无论粒径如何,在期望的空间上规则地排列粒子,通过上述粒子阵列法形成的膜和粒子阵列保持法,即使加热也保持粒子阵列 进行治疗。 解决方案:根据在基材B的表面上排列颗粒MP的阵列方法,将颗粒MP设置在基材B的表面上,将布置的颗粒MP结合在基材的表面上 B通过仅沿表面移动的装订装置,并且在基体材料B的表面的法线方向和磁力线H之间形成的角度为0至45度的磁场施加到颗粒MP 。 各个颗粒MP可以排列在相当于相邻颗粒MP之间的排斥力的空间中,如基本材料B的表面上的三角形格栅。(C)2005,JPO和NCIPI