会员体验
专利管家(专利管理)
工作空间(专利管理)
风险监控(情报监控)
数据分析(专利分析)
侵权分析(诉讼无效)
联系我们
交流群
官方交流:
QQ群: 891211   
微信请扫码    >>>
现在联系顾问~
热词
    • 7. 发明专利
    • Coating method, coating device, and method of producing planographic printing plate
    • 涂料方法,涂料装置和生产平版印刷板的方法
    • JP2010234254A
    • 2010-10-21
    • JP2009084734
    • 2009-03-31
    • Fujifilm Corp富士フイルム株式会社
    • HAYASHI KENJIHASHIGAYA MANABUARIMURA KEISUKENISHINO TAKESHI
    • B05D3/02B05C9/14B05D1/36B41N1/14
    • B05D7/544B05D3/0209B05D3/0254B05D3/0413B05D7/534F26B13/10G03C1/74G03C2001/7451
    • PROBLEM TO BE SOLVED: To provide a coating method, a coating device, and a method of producing a planographic printing plate which prevent unintended interlayer mixing from occurring even when drying an upper layer applied to a lower layer which is a dry film. SOLUTION: A first coating liquid is applied to the surface of a support 12 by a first coating device 14 to form the lower layer. The lower layer is dried by first drying device 16 until the residual solvent becomes 100 mg/m 2 or less. A second coating liquid is applied to the dried lower layer by a second coating device 18 to form the upper layer. The moisture of the upper layer is dried by a second drying device 20. In the second drying device 20, the moisture of the upper layer is removed in drying zones 20A-20C within a range satisfying conditional expression (1), temperature of the support 12 (Tw)≤average softening temperature of the lower layer (T0)+10°C, until the water content of the upper layer becomes 10% or less of the water content in coating, and then the temperature of the support 12 (Tw) is raised in a drying zone 20D to remove the moisture remaining in the upper layer. COPYRIGHT: (C)2011,JPO&INPIT
    • 要解决的问题:提供一种涂布方法,涂布装置和制造平版印刷版的方法,即使干燥施加到作为干膜的下层的上层时也能发生意外的层间混合 。 解决方案:通过第一涂覆装置14将第一涂布液施加到支撑体12的表面以形成下层。 通过第一干燥装置16将下层干燥直到残留溶剂变为100mg / m 2 SPF以下。 通过第二涂布装置18将第二涂布液施加到干燥的下层,以形成上层。 通过第二干燥装置20干燥上层的水分。在第二干燥装置20中,在满足条件式(1)的范围内的干燥区域20A-20C中除去上层的水分,将载体的温度 12(Tw)≤下层(T0)的平均软化温度+ 10℃,直到上层的含水量成为涂膜中的含水量的10%以下,然后将支撑体12(Tw )在干燥区域20D中升高以去除残留在上层中的水分。 版权所有(C)2011,JPO&INPIT